摘要:
A photovoltaic cell having a transparent first substrate (61) having semiconductor electrodes (7) supporting a photosensitizing dye, a second substrate (62) having counter electrodes (4) disposed so as to face the semiconductor electrodes (7), and an electrolyte layer disposed between the semiconductor electrode (7) and the counter electrode (4); the electrolyte layer (1) being sealed by a sealing member (2) lying between the first substrate (61) and the second substrate (62); the first substrate (61), the second substrate (62) and the sealing member (2) being formed of similar materials, and the portions of the first substrate and the second substrate that are in contact with the sealing member (2) being ultrasonically welded to the sealing member. This photovoltaic cell can maintain excellent cell performance for a long time.
摘要:
A negative type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm and a large spectral luminous efficiency; the composition being a liquid or a solid resin composition containing a photocurable resin, a photoreaction initiator and if necessary, a photosensitizing dye; an absorbancy of an unexposed film formed from this composition being 0.5 or less within the range of the maximum wavelength .+-.30 nm selected from the range of the maximum wavelength of the safelight. By the use of this negative type photosensitive resin composition, it is possible to form a resist pattern which is excellent in safe operativity, operational efficiency, the quality stability of products, and the like.
摘要:
A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising:(A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s),(B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.
摘要:
The invention provides a film-formable, chelate-forming resin having, per 1000 g of the resin, about 0.2 to about 3.5 moles of chelate-forming group represented by the formula [1], [2], [3] or [4]: ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and each represents a hydrogen atom, a halogen atom, a nitro group, a nitroso group, a cyano group, a hydrocarbon group having up to 18 carbon atoms, or an alkoxyalkyl group having up to 12 carbon atoms, and a process for preparing the resin.The invention also provides a metal surface treating composition and a corrosion preventive coating composition both containing the above chelate-forming resin, and a chelate-forming resin composition comprising the resin and a crosslinking agent.The invention further provides a method for forming an electrophoretic coating, comprising the steps of bringing the metal surface treating composition into contact with a metal surface before electrodeposition on the metal surface to accomplish pretreatment, and conducting electrodeposition on the pretreated metal surface.
摘要:
According to one of the two aspects of the present invention, a metal surface treatment liquid having pH of less than 6 and containing oxytitanic ion and/or peroxytitanic ion therein is provided. The second aspect of the present invention is to provide a rust preventive paint, in which oxytitanic ion and/or peroxytitanic ion is(are) contained.
摘要:
A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.
摘要:
The present invention provides a method of forming a conductive pattern, comprising the steps of: (1) depositing a conductive coating-forming resin layer and an energy beam-sensitive coating layer on a substrate in this order; (2) irradiating a surface of the energy beam-sensitive coating layer with an active energy beam or heat rays directly or through a mask, so as to obtain a desired pattern; (3) developing the energy beam-sensitive coating layer to form a resist pattern coating from the energy beam-sensitive coating layer; and (4) removing revealed portions of the conductive coating-forming resin layer by development. The present invention also provides a method of forming a conductive pattern, comprising the step (1), the step (2), and the step of: (3′) developing the energy beam-sensitive coating layer and the conductive coating-forming resin layer simultaneously.
摘要:
The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.
摘要:
An electromagnetic wave absorber comprising at least one of a unit film as a multilayered film comprising a resin layer (A) optionally containing a pigment and a layer (B) applied onto the resin layer (A), selected from a group consisting of a metal layer, an alloy layer and a partly oxidized layer of the metal layer or the alloy layer, and having a film thickness of 1 nm to 50 nm.
摘要:
The invention provides a method for forming a pattern coating, the method including the steps of:applying to a substrate a radiation curable composition containing a resin (a) which contains, per kilogram of said resin (a) about 1.5 to about 4.5 moles of a polyermizable unsaturated group, about 0.4 to about 2.5 moles of a carboxyl group and 0.2 to about 3.5 moles of a thioether group, the resin having a number average molecular weight of about 500 to about 50,000; selectively irradiating a portion of the applied coating with actinic rays; and subjecting the coating to development with an alkali aqueous solution.