公开(公告)号：US5281449A

公开(公告)日：1994-01-25

申请号：US742232

申请日：1991-08-08

申请人： Naozumi Iwasawa ,  Hideo Kogure ,  Heihachi Murase

发明人： Naozumi Iwasawa ,  Hideo Kogure ,  Heihachi Murase

IPC分类号： G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H05K3/00 ,  B05D3/06 ,  G03C1/705

CPC分类号： G03F7/038 ,  H05K3/0076

摘要： The invention provides a method for forming a pattern coating, the method including the steps of:applying to a substrate a radiation curable composition containing a resin (a) which contains, per kilogram of said resin (a) about 1.5 to about 4.5 moles of a polyermizable unsaturated group, about 0.4 to about 2.5 moles of a carboxyl group and 0.2 to about 3.5 moles of a thioether group, the resin having a number average molecular weight of about 500 to about 50,000; selectively irradiating a portion of the applied coating with actinic rays; and subjecting the coating to development with an alkali aqueous solution.

摘要翻译： 本发明提供一种形成图案涂层的方法，该方法包括以下步骤：向基材施加含有树脂（a）的可辐射固化组合物，该树脂（a）每千克所述树脂（a）含有约1.5至约4.5摩尔 约0.4至约2.5摩尔的羧基和0.2至约3.5摩尔的硫醚基团，所述树脂的数均分子量为约500至约50,000; 用光化射线选择性地照射所涂敷的涂层的一部分; 并用碱性水溶液对涂层进行显影。

公开(公告)号：US5196487A

公开(公告)日：1993-03-23

申请号：US712279

申请日：1991-06-10

申请人： Hideo Kogure ,  Heihachi Murase ,  Naozumi Iwasawa

发明人： Hideo Kogure ,  Heihachi Murase ,  Naozumi Iwasawa

IPC分类号： C07F7/18 ,  C08F2/46 ,  C08F299/00 ,  C09D5/08 ,  C09D183/07 ,  C09D183/08

CPC分类号： C07F7/1836 ,  C08F299/00 ,  C09D183/08 ,  C09D5/08

摘要： A corrosion preventive resin having in the molecule at least one chelate forming group selected from among groups represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and are each a hydrogen atom or alkyl having 1 to 8 carbon atoms, and groups represented by teh general formula ##STR2## wherein R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are the same or different and are each a hydrogen atom, alkyl having 1 to 8 carbon atoms or a group forming a bivalent o-phenylene group along with two carbon atoms attached thereto. A photopolymerizable composition which includes (a) a resin having in the molecule at least one mole of polymerizable double bond per 1000 g of the resin and having per molecule at least one chelate forming group selected from among the groups represented by formula (II) and formula (III), and (b) a photopolymerization initiator is also disclosed.

摘要翻译： 一种防腐树脂，其在分子中具有至少一种螯合形成基团，其选自由式（I）表示的基团，其中R 1和R 2相同或不同，各自为氢原子或具有1至8个碳原子的烷基 原子和由通式（II）表示的基团，其中R 3，R 4，R 5和R 6相同或不同，各自为氢原子，具有1至8个碳原子的烷基或形成二价o- 亚苯基以及与其连接的两个碳原子。 一种可光聚合组合物，其包含（a）分子中每1000克所述树脂具有至少1摩尔可聚合双键并且每分子具有选自式（II）表示的基团中的至少一种螯合形成基团和 式（III）和（b）光聚合引发剂也被公开。

公开(公告)号：US5455116A

公开(公告)日：1995-10-03

申请号：US140556

申请日：1993-10-25

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Tetsu Maki ,  Naozumi Iwasawa

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Tetsu Maki ,  Naozumi Iwasawa

IPC分类号： G21F1/12 ,  H05K9/00 ,  B32B9/00

CPC分类号： H05K9/0086 ,  G21F1/125 ,  G21Y2002/301 ,  G21Y2004/10 ,  G21Y2004/30 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic wave reflecting material layer, if needed, (B) a supporting layer, (C) a resin layer, if needed, (D) a supporting layer, and (E) a metallic pattern layer prepared by arranging at least one of a pattern unit comprising a geometrical pattern formed by use of a continuous metallic band, or comprising a multi-figured structure formed by combining a plurality of band-shaped metallic figures so as not to contact with each other; and an electromagnetic wave reflection-preventing method by use of the electromagnetic wave reflection-preventing material.

摘要翻译： 一种电磁波反射防止材料，具有如下需要，依次层叠（A）电磁波反射材料层，（B）支撑层，（C）树脂层，（D）支撑层 和（E）通过布置包括通过使用连续金属带形成的几何图案的图案单元中的至少一个而制备的金属图案层，或者包括通过组合多个带状金属图形而形成的多构造结构 以免彼此接触; 以及使用电磁波防反射材料的电磁波反射防止方法。

公开(公告)号：US5624781A

公开(公告)日：1997-04-29

申请号：US250623

申请日：1994-05-27

申请人： Keisuke Naruse ,  Yukari Takeda ,  Naozumi Iwasawa ,  Hideo Kogure

发明人： Keisuke Naruse ,  Yukari Takeda ,  Naozumi Iwasawa ,  Hideo Kogure

IPC分类号： C09D5/44 ,  G03F7/023 ,  G03F7/16 ,  C25D13/00 ,  G03F7/38 ,  G03F7/40

CPC分类号： C09D5/4484 ,  G03F7/0233 ,  G03F7/164

摘要： A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising:(A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s),(B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.

摘要翻译： 一种正型阴离子电沉积光致抗蚀剂组合物，其包含作为主要成分的通过用碱中和混合物获得的分散体，所述混合物包含：（A）含有羧基和羟基的丙烯酸树脂，（B） 含有基于树脂的至少25重量％的羟基苯乙烯单元的乙烯基酚树脂和（C）多羟基二苯甲酮与1,2-萘醌二叠氮化物磺酸或苯醌二叠氮磺酸之间的酯，并将所得 中和产品在水中。 该组合物在电沉积中的运行稳定性优异，并且可用于形成高度可靠的抗蚀剂图案或导体图案。

公开(公告)号：US5576148A

公开(公告)日：1996-11-19

申请号：US382155

申请日：1995-02-01

申请人： Genji Imai ,  Yukari Takeda ,  Hideo Kogure ,  Naozumi Iwasawa

发明人： Genji Imai ,  Yukari Takeda ,  Hideo Kogure ,  Naozumi Iwasawa

IPC分类号： H05K3/42 ,  H05K3/00 ,  H05K3/06 ,  H05K3/46 ,  G03F7/00

CPC分类号： H05K3/0094 ,  H05K2201/09581 ,  H05K2203/0582 ,  H05K2203/107 ,  H05K2203/135 ,  H05K3/0082 ,  H05K3/064

摘要： The present invention provides a process for producing a high-density printed wiring board with plated throughholes, at high productivity and reliability by a direct drawing method. The process comprises making throughholes in a substrate having an electro-conductive layer on each side; conducting plating on at least the walls of the substrate throughholes; forming a photosensitive resist film on each side of the substrate; applying an actinic radiation onto the resist film by a direct drawing method in the shape of a pattern to be obtained when the resist film is a negative type, or in the shape of a pattern reverse to a pattern to be obtained when the resist film is a positive type; forming, on the uncoated portion inside the throughholes by electrodeposition, an electrodeposition film which is insoluble in a developing solution used later and an etching solution used later but is removable with a peeling solution used later; conducting development with an appropriate developing solution to remove the resist film; removing the exposed plating layer portion and the electro-conductive layer portion present therebeneath, by etching; and then peeling the remaining resist film and the electrodeposition film inside the throughholes, with an appropriate peeling solution.

摘要翻译： 本发明提供一种通过直接拉伸法以高生产率和可靠性制造具有电镀通孔的高密度印刷线路板的方法。 该方法包括在每个侧面上具有导电层的基板中形成通孔; 至少在基板通孔的壁上进行电镀; 在基板的每一侧上形成光敏抗蚀剂膜; 通过直接拉伸法将光化辐射施加到抗蚀剂膜为负型时获得的图案的形状，或者与抗蚀剂膜为 积极的类型 通过电沉积在通孔内的未涂覆部分上形成不溶于稍后使用的显影液的电沉积膜和稍后使用的可用随后使用的剥离溶液除去的蚀刻溶液; 用合适的显影液进行显影以除去抗蚀剂膜; 通过蚀刻去除暴露的镀层部分和存在于其中的导电层部分; 然后用适当的剥离溶液将剩余的抗蚀剂膜和电沉积膜剥离到通孔内。

公开(公告)号：US5455117A

公开(公告)日：1995-10-03

申请号：US140564

申请日：1993-10-25

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

IPC分类号： G21F1/12 ,  H05K9/00 ,  B32B9/00

CPC分类号： G21F1/125 ,  H05K9/0088 ,  G21Y2002/301 ,  G21Y2004/10 ,  G21Y2004/30 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic have reflecting metallic material layer, if needed, (B) a substrate layer, (C) a resin layer containing a powder of at least one selected from ferrite, carbon, metal powder and an electrically conductive metallic oxide, and, if needed, a good dielectric material, if needed, (D) a supporting film layer, and (E) a pattern coating layer prepared in the form of a geometrical pattern, containing a metal powder and having a volume resistivity of 10.sup.-3 to 10.sup.10 .OMEGA..multidot.cm, preferably further laminating (F) a clear or colored coating layer; and an electromagnetic wave reflection-preventing material which is obtained by substituting (G) a molded sheet layer formed by coating a coating composition prepared by dispersing the above powder into a binder onto a substrate having void, and molding under pressure for (C) a resin layer; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying a laminate obtained by removing the electromagnetic wave reflecting metallic material layer (A) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.

摘要翻译： 具有通过依次层叠（A）电磁体形成的结构的电磁波反射防止材料具有反射金属材料层，如果需要，（B）基底层，（C）含有选自以下的至少一种的粉末的树脂层 铁素体，碳，金属粉末和导电金属氧化物，如果需要，如果需要，可以使用良好的介电材料（D）支撑膜层，和（E）以几何图案形式制备的图案涂层 ，含有金属粉末，体积电阻率为10-3至1010欧米加×厘米，优选进一步层压（F）透明或有色涂层; 和（G）通过将（G）通过将通过将上述粉末分散在粘合剂中而制备的涂料组合物形成的模塑片层而获得的模塑片层而获得，并且在压力下成型（C） 树脂层; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括将从电磁波反射防止材料除去电磁波反射金属材料层（A）获得的层压体施加到 具有金属表面的电磁波反射结构。

公开(公告)号：US5453328A

公开(公告)日：1995-09-26

申请号：US183763

申请日：1994-01-21

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

IPC分类号： H05K9/00 ,  B32B9/00

CPC分类号： H05K9/0086 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern having a volume resistivity of 10.sup.3 .OMEGA. . cm or less, if needed, (B) a supporting layer, (C) a resin layer, and, if needed, (D) a supporting layer, to form a laminate unit, laminating a pluralitry of the laminate unit so that the layer (A) may face on the layer (C) or (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer so that the layer (C) or (D) of the multiple laminate unit structure may face on the layer (E), preferably further laminating a clear or colored coating layer onto the uppermost metallic pattern layer of the electromagnetic wave, reflection-preventing material; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying the multiple laminate unit structure obtained by removing the electromagnetic wave reflecting material layer (E) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.

摘要翻译： 一种电磁波反射防止材料，其具有通过以下工序形成的结构形成的工艺：连续地层叠（A）形成为体积电阻率为103欧姆时的几何图案形式的图案层。 cm以下，如果需要，（B）支撑层，（C）树脂层，如果需要，（D）支撑层，形成层叠单元，层叠多层叠单元，使层 （A）可以在层（C）或（D）上面对以形成多层压单元结构，并将多层压单元结构层压到（E）电磁波反射材料层上，使得层（C）或（D 多层压单元结构可以在层（E）上面对，优选将透明或着色的涂层进一步层叠到电磁波的最上层的金属图案层上，防反射材料; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括施加通过从电磁波反射防止中除去电磁波反射材料层（E）而获得的多层叠单元结构 材料到具有金属表面的电磁波反射结构。

公开(公告)号：US5702872A

公开(公告)日：1997-12-30

申请号：US610237

申请日：1996-03-04

申请人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

发明人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/027

CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/164 ,  G03F7/168 ,  Y10S430/12 ,  Y10S430/122

摘要： A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxy-phenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.

摘要翻译： 正型电沉积光致抗蚀剂组合物包括作为必要组分的（A）100重量份的具有羧基的聚合物，其量为每当所述聚合物为0.5至10当量，并且任选地具有羟基苯基 至少1当量/ kg聚合物或（A'）含羧基聚合物和（A“）含羟基苯基的聚合物的量; （B）5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和（C）每100重量份聚合物（A）或聚合物（A'）和聚合物（A“）和含乙烯基醚基化合物（B）的总量为0.1〜40重量份 ），当用光化射线照射时产生酸。 通过用碱性化合物中和聚合物（A）或（A'）中的羧基，将组合物溶解或分散在水性介质中。 正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。 还公开了使用这种组合物的抗蚀剂图案形成方法。

公开(公告)号：US5527656A

公开(公告)日：1996-06-18

申请号：US233443

申请日：1994-04-26

申请人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

发明人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03C1/73

CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/164 ,  G03F7/168 ,  Y10S430/12 ,  Y10S430/122

摘要： A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxyphenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.

摘要翻译： 正型电沉积光致抗蚀剂组合物包括作为必要组分的（A）100重量份的具有羧基的聚合物，其量为每当所述聚合物为0.5至10当量，并且任选地具有羟基苯基 或（A'）含有羧基的聚合物和（A“）含羟基苯基的聚合物的量为每千克聚合物至少1当量; （B）5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和（C）每100重量份聚合物（A）或聚合物（A'）和聚合物（A“）和含乙烯基醚基化合物（B）的总量为0.1〜40重量份 ），当用光化射线照射时产生酸。 通过用碱性化合物中和聚合物（A）或（A'）中的羧基，将组合物溶解或分散在水性介质中。 正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。 还公开了使用这种组合物的抗蚀剂图案形成方法。

公开(公告)号：US5389727A

公开(公告)日：1995-02-14

申请号：US112311

申请日：1993-08-27

申请人： Noboru Nakai ,  Osamu Isozaki ,  Naozumi Iwasawa

发明人： Noboru Nakai ,  Osamu Isozaki ,  Naozumi Iwasawa

IPC分类号： C08G59/40 ,  C07F7/08 ,  C07F7/18 ,  C08G59/00 ,  C08G59/02 ,  C08G59/04 ,  C08G59/30 ,  C08G59/32 ,  C08G59/70 ,  C08K5/00 ,  C08K5/07 ,  C08K5/1515 ,  C08K5/5415 ,  C08L33/06 ,  C08L43/04 ,  C08L63/00 ,  C08L75/04 ,  C08L101/06 ,  C09D133/06 ,  C09D133/14 ,  C09D143/04 ,  C09D163/00 ,  C08F8/00

CPC分类号： C08L63/00 ,  C07F7/0836 ,  C07F7/0858 ,  C07F7/0859 ,  C07F7/182 ,  C07F7/1836 ,  C07F7/1844 ,  C07F7/1896 ,  C08G59/02 ,  C08G59/04 ,  C08G59/306 ,  C08G59/3254 ,  C08G59/70 ,  C08K5/00 ,  C08K5/0091 ,  C08K5/07 ,  C08K5/1515 ,  C08K5/5415 ,  C08L101/06 ,  C08L75/04 ,  C09D133/064 ,  C09D133/068 ,  C09D143/04 ,  C09D163/00 ,  C08L33/068 ,  C08L43/04

摘要： A resin composition comprising a high molecular weight compound containing an average of 2 or more hydroxyl groups and an average of 1 or more functional groups selected from the class consisting of alkoxysilane, silanol and acyloxysilane groups per molecule and having a number average molecular weight of 3,000 to 200,000; a low molecular weight compound containing an average of 2 or more epoxy groups per molecule and having a number average molecular weight of 240 to 5,000; and, as a curing catalyst, a metal chelate compound, is curable at a relatively low temperature to yield a film having excellent resistance to weathering.

摘要翻译： 一种树脂组合物，其包含平均分子量为2以上且平均分子量为1以上的官能团的高分子量化合物，每分子含有烷氧基硅烷，硅烷醇和酰氧基硅烷基，数均分子量为3000 到20万; 每分子平均含有2个以上环氧基且数均分子量为240〜5000的低分子量化合物; 作为固化催化剂，作为固化催化剂，金属螯合物在相对较低的温度下可固化，得到耐候性优异的膜。