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    SPATIALLY CONTROLLED ATOMIC LAYER DEPOSITION IN POROUS MATERIALS
    1.
    发明申请
    SPATIALLY CONTROLLED ATOMIC LAYER DEPOSITION IN POROUS MATERIALS 有权
    空间控制原子层沉积在多孔材料中

    公开(公告)号：US20090304920A1

    公开(公告)日：2009-12-10

    申请号：US12478578

    申请日：2009-06-04

    申请人： Jeffrey W. ELAM ,  Joseph A. Libera ,  Michael J. Pellin ,  Peter C. Stair

    发明人： Jeffrey W. ELAM ,  Joseph A. Libera ,  Michael J. Pellin ,  Peter C. Stair

    IPC分类号： B05D3/00 ,  B05D7/00 ,  B01J8/02 ,  B05D7/22

    CPC分类号： B01J37/0226 ,  B01J35/065 ,  C23C16/042 ,  C23C16/045 ,  C23C16/403 ,  C23C16/405 ,  C23C16/407 ,  C23C16/45525 ,  C23C16/45555

    摘要： Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.

    摘要翻译： 在多孔基材内选择性沉积材料的方法。 该方法使用掩蔽前体施加到多孔基材上的钝化作用。 通过将衬底暴露于一个或多个掩模前体来掩蔽衬底内的孔表面的一部分。 被掩蔽的孔表面的深度可通过调节衬底对掩蔽前体的曝光来控制。 掩蔽前体的应用防止一个或多个随后施加的金属前体在被掩蔽前体涂覆的孔表面的一部分附近吸附。 小于整个未掩模的孔表面被金属前体涂覆，在孔表面的一部分上形成金属条纹。 通过调节多孔基材对金属前体的曝光来控制金属条纹的深度。 随后将底物暴露于饱和水中，使沉积的前体氧化。

    Spatially controlled atomic layer deposition in porous materials
    3.
    发明授权
    Spatially controlled atomic layer deposition in porous materials 有权
    多孔材料中的空间控制原子层沉积

    公开(公告)号：US08318248B2

    公开(公告)日：2012-11-27

    申请号：US12478578

    申请日：2009-06-04

    申请人： Jeffrey W. Elam ,  Joseph A. Libera ,  Michael J. Pellin ,  Peter C. Stair

    发明人： Jeffrey W. Elam ,  Joseph A. Libera ,  Michael J. Pellin ,  Peter C. Stair

    IPC分类号： C23C16/00

    CPC分类号： B01J37/0226 ,  B01J35/065 ,  C23C16/042 ,  C23C16/045 ,  C23C16/403 ,  C23C16/405 ,  C23C16/407 ,  C23C16/45525 ,  C23C16/45555

    摘要： Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.

    摘要翻译： 在多孔基材内选择性沉积材料的方法。 该方法使用掩蔽前体施加到多孔基材上的钝化作用。 通过将衬底暴露于一个或多个掩模前体来掩蔽衬底内的孔表面的一部分。 被掩蔽的孔表面的深度可通过调节衬底对掩蔽前体的曝光来控制。 掩蔽前体的应用防止一个或多个随后施加的金属前体在被掩蔽前体涂覆的孔表面的一部分附近吸附。 小于整个未掩模的孔表面被金属前体涂覆，在孔表面的一部分上形成金属条纹。 通过调节多孔基材对金属前体的曝光来控制金属条纹的深度。 随后将底物暴露于饱和水中，使沉积的前体氧化。

    Catalytic nanoporous membranes
    9.
    发明授权
    Catalytic nanoporous membranes 有权
    催化纳米多孔膜

    公开(公告)号：US08518845B2

    公开(公告)日：2013-08-27

    申请号：US12610897

    申请日：2009-11-02

    申请人： Michael J. Pellin ,  John N. Hryn ,  Jeffrey W. Elam

    发明人： Michael J. Pellin ,  John N. Hryn ,  Jeffrey W. Elam

    IPC分类号： B01J20/28 ,  B01J35/00 ,  B01J27/22 ,  B01J27/224 ,  B01J27/24 ,  B01J23/00 ,  B01J23/02 ,  B01J21/04 ,  B01J20/00

    CPC分类号： C23C16/045 ,  B01J23/22 ,  B01J23/26 ,  B01J23/42 ,  B01J23/462 ,  B01J23/755 ,  B01J35/065 ,  B01J35/1057 ,  B01J35/1061 ,  B01J37/0226 ,  B01J37/0238 ,  B01J37/0244 ,  C23C16/18 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/407 ,  C23C16/45525 ,  C23C16/45555

    摘要： A nanoporous catalytic membrane which displays several unique features Including pores which can go through the entire thickness of the membrane. The membrane has a higher catalytic and product selectivity than conventional catalysts. Anodic aluminum oxide (AAO) membranes serve as the catalyst substrate. This substrate is then subjected to Atomic Layer Deposition (ALD), which allows the controlled narrowing of the pores from 40 nm to 10 nm in the substrate by deposition of a preparatory material. Subsequent deposition of a catalytic layer on the inner surfaces of the pores reduces pore sizes to less than 10 nm and allows for a higher degree of reaction selectivity. The small pore sizes allow control over which molecules enter the pores, and the flow-through feature can allow for partial oxidation of reactant species as opposed to complete oxidation. A nanoporous separation membrane, produced by ALD is also provided for use in gaseous and liquid separations. The membrane has a high flow rate of material with 100% selectivity. Also provided is a method for producing a catalytic membrane having flow-through pores and discreet catalytic clusters adhering to the inside surfaces of the pores.

    摘要翻译： 纳米多孔催化膜，显示几个独特的特征包括可以穿过膜的整个厚度的孔。 该膜具有比常规催化剂更高的催化和产物选择性。 阳极氧化铝（AAO）膜用作催化剂底物。 然后将该衬底经受原子层沉积（ALD），其允许通过沉积预备材料在衬底中将孔的受控变窄从40nm至10nm。 随后在孔的内表面上沉积催化剂层将孔径减小到小于10nm，并允许较高程度的反应选择性。 小孔径允许控制哪些分子进入孔隙，而与完全氧化相反，流通特征可以允许反应物物质的部分氧化。 还提供由ALD生产的纳米多孔分离膜，用于气相和液体分离。 该膜具有高流速的材料，具有100％的选择性。 还提供了一种制备具有粘附到孔的内表面的流通孔和分散催化剂簇的催化膜的方法。

    Catalytic nanoporous membranes
    10.
    发明授权
    Catalytic nanoporous membranes 有权
    催化纳米多孔膜

    公开(公告)号：US07625840B2

    公开(公告)日：2009-12-01

    申请号：US10941800

    申请日：2004-09-14

    申请人： Michael J. Pellin ,  John N. Hryn ,  Jeffrey W. Elam

    发明人： Michael J. Pellin ,  John N. Hryn ,  Jeffrey W. Elam

    IPC分类号： B01J20/08 ,  B01J20/28 ,  B01J20/284 ,  B01J20/32 ,  B01J35/10 ,  B01J37/00 ,  B01J37/02 ,  B05D1/36 ,  B05D3/04 ,  B05D3/10 ,  B05D7/00 ,  B82B3/00

    CPC分类号： C23C16/403 ,  B01J23/22 ,  B01J23/26 ,  B01J23/42 ,  B01J23/462 ,  B01J23/755 ,  B01J35/065 ,  B01J35/1057 ,  B01J35/1061 ,  B01J37/0226 ,  B01J37/0238 ,  B01J37/0244 ,  C23C16/045 ,  C23C16/18 ,  C23C16/402 ,  C23C16/405 ,  C23C16/407 ,  C23C16/45525 ,  C23C16/45555 ,  Y10S977/89 ,  Y10T428/249953

    摘要： A nanoporous catalytic membrane which displays several unique features including pores which can go through the entire thickness of the membrane. The membrane has a higher catalytic and product selectivity than conventional catalysts. Anodic aluminum oxide (AAO) membranes serve as the catalyst substrate. This substrate is then subjected to Atomic Layer Deposition (ALD), which allows the controlled narrowing of the pores from 40 nm to 10 nm in the substrate by deposition of a preparatory material. Subsequent deposition of a catalytic layer on the inner surfaces of the pores reduces pore sizes to less than 10 nm and allows for a higher degree of reaction selectivity. The small pore sizes allow control over which molecules enter the pores, and the flow-through feature can allow for partial oxidation of reactant species as opposed to complete oxidation. A nanoporous separation membrane, produced by ALD is also provided for use in gaseous and liquid separations. The membrane has a high flow rate of material with 100% selectivity.

    摘要翻译： 纳米多孔催化膜，其显示出几个独特的特征，包括可以穿过膜的整个厚度的孔。 该膜具有比常规催化剂更高的催化和产物选择性。 阳极氧化铝（AAO）膜用作催化剂底物。 然后将该衬底经受原子层沉积（ALD），其允许通过沉积预备材料在衬底中将孔的受控变窄从40nm至10nm。 随后在孔的内表面上沉积催化剂层将孔径减小到小于10nm，并允许较高程度的反应选择性。 小孔径允许控制哪些分子进入孔隙，而与完全氧化相反，流通特征可以允许反应物物质的部分氧化。 还提供由ALD生产的纳米多孔分离膜，用于气相和液体分离。 该膜具有高流速的材料，具有100％的选择性。