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公开(公告)号：US06828164B2
公开(公告)日：2004-12-07
申请号：US10402995
申请日：2003-04-01
IPC分类号： H01L2166
CPC分类号： B81C99/004 , H01L22/34
摘要： The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
摘要翻译： 该说明书公开了一种用于测量蚀刻速度的结构和方法。 测试层与几个电阻相连。 金属层的蚀刻使电阻与电路顺序断开。 测量感测电阻器系统的等效电阻以获得蚀刻速度。 考虑到电阻器的误差，本发明还提供一种利用IC布局技术将交错式虚拟电阻器放置在感测电阻器旁边的结构。 通过获取感测电阻器和虚拟电阻器的等效电阻的比率，本发明可以计算以获得蚀刻速度。
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公开(公告)号：US07208065B2
公开(公告)日：2007-04-24
申请号：US10875306
申请日：2004-06-25
IPC分类号： H01L21/306
CPC分类号： B81C99/004 , H01L22/34
摘要： The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
摘要翻译： 该说明书公开了一种用于测量蚀刻速度的结构和方法。 测试层与几个电阻相连。 金属层的蚀刻使电阻与电路顺序断开。 测量感测电阻器系统的等效电阻以获得蚀刻速度。 考虑到电阻器的误差，本发明还提供一种利用IC布局技术将交错式虚拟电阻器放置在感测电阻器旁边的结构。 通过获取感测电阻器和虚拟电阻器的等效电阻的比率，本发明可以计算以获得蚀刻速度。
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3.发明申请Liquid-based gravity-driven etching-stop technique for controlling structure dimension 有权液体重力驱动蚀刻停止技术，用于控制结构尺寸公开(公告)号：US20060264058A1
公开(公告)日：2006-11-23
申请号：US11242866
申请日：2005-10-05
申请人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
发明人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
IPC分类号： H01L21/302
CPC分类号： H01L21/02052 , B81B2201/12 , B81C1/00626 , B81C2201/0142 , G01Q60/38
摘要： A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an embodiment, opposite trenches surrounding the microstructure are respectively etched on sides of the wafer, and the trench depth on the side of the wafer, on which the microstructure is, is equal to the design dimension of the microstructure. Contrarily, it is unnecessary to define the trench depth on the back-side of the chip. In the final step of the fabrication process, when the device is etched, such that the trenches on the sides communicate with each other to separate the microstructure from the whole wafer automatically and thereby shift from the etchant into the etching-stop solution to stop etching.
摘要翻译： 提供了一种用于控制结构尺寸的液体重力驱动蚀刻停止技术，其中与蚀刻停止溶液配合的相反蚀刻沟槽用于控制晶片级上的微结构的尺寸。 在一个实施例中，围绕微结构的相对的沟槽分别蚀刻在晶片的侧面上，并且在其上的晶片侧面上的沟槽深度等于微结构的设计尺寸。 相反，不需要在芯片的背面限定沟槽深度。 在制造过程的最后步骤中，当器件被蚀刻时，使得侧面上的沟槽彼此连通以自动地将微结构与全部晶片分离，从而从蚀刻剂移动到蚀刻停止溶液中以停止蚀刻 。
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公开(公告)号：US20110037911A1
公开(公告)日：2011-02-17
申请号：US12696505
申请日：2010-01-29
申请人： Shang-Chia CHEN , Heng-Yin Chen , Chao-Chiun Liang
发明人： Shang-Chia CHEN , Heng-Yin Chen , Chao-Chiun Liang
IPC分类号： G02F1/135
CPC分类号： G09G3/3603 , G09G3/02 , G09G2300/023 , G09G2300/0486
摘要： A driving method for a panel structure including at least two liquid crystal layers is disclosed. The liquid crystal layers display different colors. When the panel structure includes a first liquid crystal layer and a second liquid crystal layer, the first and the second liquid crystal layers are initialized. A light source is utilized to emit the first and the second liquid crystal layers to write data to at least one of the first and the second liquid crystal layers. When the panel structure further includes a third liquid crystal layer, the first, the second and the third liquid crystal layers are first initialized. A light source is utilized to emit the first, the second and the third liquid crystal layers to write data to at least one of the first, the second and the third liquid crystal layers.
摘要翻译： 公开了一种包括至少两个液晶层的面板结构的驱动方法。 液晶层显示不同的颜色。 当面板结构包括第一液晶层和第二液晶层时，第一和第二液晶层被初始化。 使用光源来发射第一和第二液晶层以将数据写入至第一和第二液晶层中的至少一个。 当面板结构还包括第三液晶层时，首先初始化第一，第二和第三液晶层。 利用光源发射第一，第二和第三液晶层以将数据写入至第一，第二和第三液晶层中的至少一个。
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5.发明申请System for dynsmic gamma correction of multi-scaled clocks and method therefor 有权多尺度时钟的动态伽马校正系统及其方法公开(公告)号：US20080111836A1
公开(公告)日：2008-05-15
申请号：US11707918
申请日：2007-02-20
申请人： Chiao-Nan Huang , Chao-Chiun Liang
发明人： Chiao-Nan Huang , Chao-Chiun Liang
IPC分类号： G09G5/10
CPC分类号： G09G3/2096 , G09G2320/0276 , G09G2320/0673 , G09G2360/02
摘要： A system for dynamic gamma correction of multi-scaled clocks and method therefor are provided, wherein multi-scaled clocks are applied to control the grayscale upon only one set of ramp voltage, so that the linearity of the gamma curve can be adjusted freely or to adjust the gamma correction strategy based on the image content or the user preference.
摘要翻译： 提供了一种用于多尺度时钟的动态伽马校正的系统及其方法，其中施加多尺度时钟以仅在一组斜坡电压上控制灰度，使得伽马曲线的线性可以自由调节或 根据图像内容或用户偏好调整伽马校正策略。
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公开(公告)号：US08791537B2
公开(公告)日：2014-07-29
申请号：US13457442
申请日：2012-04-26
IPC分类号： H01L31/0232 , H01L31/045 , H01L31/0216 , H01L31/055 , H01L31/115
CPC分类号： H01L31/02322 , H01L27/14632 , H01L27/14663 , H01L31/02162 , H01L31/0232 , H01L31/055 , H01L31/115 , H02S30/20 , Y02E10/52
摘要： Disclosed is a flexible radiation detector including a substrate, a switching device on the substrate, an energy conversion layer on the switching device, a top electrode layer on the energy conversion layer, a first phosphor layer on the top electrode layer, and a second phosphor layer under the substrate.
摘要翻译： 公开了一种灵活的辐射检测器，包括基板，基板上的开关装置，开关装置上的能量转换层，能量转换层上的顶部电极层，顶部电极层上的第一荧光体层，以及第二荧光体 底层下方。
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公开(公告)号：US20130100011A1
公开(公告)日：2013-04-25
申请号：US13414728
申请日：2012-03-08
IPC分类号： G09G5/00
CPC分类号： G06F1/1613 , G06F1/1652 , G06F1/1694 , G06F3/016 , G06F3/017
摘要： A human-machine interface device suitable for being electrically connected to an electronic device. The human-machine interface device includes a flexible carrier having at least one flexible portion, a bending sensor, and a control module. The bending sensor is disposed on the flexible portion of the flexible carrier. The control module is disposed on the carrier, connected to the bending sensor, and electrically connected to the electronic device. A first operation signal from the bending sensor is transmitted to the electronic device through the control module so that the electronic device performs according to the first operation signal.
摘要翻译： 适于电连接到电子设备的人机界面装置。 人机界面装置包括具有至少一个柔性部分的柔性载体，弯曲传感器和控制模块。 弯曲传感器设置在柔性载体的柔性部分上。 控制模块设置在载体上，连接到弯曲传感器，并电连接到电子设备。 来自弯曲传感器的第一操作信号通过控制模块传送到电子设备，使得电子设备根据第一操作信号执行。
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公开(公告)号：US08330882B2
公开(公告)日：2012-12-11
申请号：US12392371
申请日：2009-02-25
申请人： Johnsee Lee , Chao-Chiun Liang , Tzeng-Shii Tsai
发明人： Johnsee Lee , Chao-Chiun Liang , Tzeng-Shii Tsai
IPC分类号： G02F1/133 , G02F1/1334
CPC分类号： E06B9/24 , E06B2009/2417 , E06B2009/247 , G02B26/005 , G02F1/133305 , G02F1/133365 , G02F1/133555 , G02F1/1347 , G02F1/13718 , G02F2001/13324 , G02F2001/133342 , G02F2201/44 , G02F2203/62
摘要： An image display comprises at least one display device having a first pair of transparent conductive layers, a second pair of transparent conductive layers spaced apart from the first pair transparent conductive layers, a display layer disposed between the first pair of transparent conductive layers, the display layer configured to display an image in response to a first set of voltages applied to the first pair of transparent conductive layers, and a light control layer disposed between the second pair of transparent conductive layers, the light control layer configured to operate in one of a transmissive mode to allow an incident light to pass toward the display layer and a reflective mode to reflect an incident light away from the display layer in response to a second set of voltages applied to the second pair of transparent conductive layers.
摘要翻译： 图像显示器包括至少一个具有第一对透明导电层的显示装置，与第一对透明导电层间隔开的第二对透明导电层，设置在第一对透明导电层之间的显示层，显示器 层，被配置为响应于施加到第一对透明导电层的第一组电压而显示图像;以及光控制层，其设置在第二对透明导电层之间，光控制层被配置为在 透射模式以允许入射光通向显示层，以及反射模式，以响应于施加到第二对透明导电层的第二组电压而将入射光反射离开显示层。
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公开(公告)号：US20100214501A1
公开(公告)日：2010-08-26
申请号：US12392371
申请日：2009-02-25
申请人： Johnsee Lee , Chao-Chiun Liang , Tzeng-Shii Tsai
发明人： Johnsee Lee , Chao-Chiun Liang , Tzeng-Shii Tsai
CPC分类号： E06B9/24 , E06B2009/2417 , E06B2009/247 , G02B26/005 , G02F1/133305 , G02F1/133365 , G02F1/133555 , G02F1/1347 , G02F1/13718 , G02F2001/13324 , G02F2001/133342 , G02F2201/44 , G02F2203/62
摘要： An image display comprises at least one display device having a first pair of transparent conductive layers, a second pair of transparent conductive layers spaced apart from the first pair transparent conductive layers, a display layer disposed between the first pair of transparent conductive layers, the display layer configured to display an image in response to a first set of voltages applied to the first pair of transparent conductive layers, and a light control layer disposed between the second pair of transparent conductive layers, the light control layer configured to operate in one of a transmissive mode to allow an incident light to pass toward the display layer and a reflective mode to reflect an incident light away from the display layer in response to a second set of voltages applied to the second pair of transparent conductive layers.
摘要翻译： 图像显示器包括至少一个具有第一对透明导电层的显示装置，与第一对透明导电层间隔开的第二对透明导电层，设置在第一对透明导电层之间的显示层，显示器 层，被配置为响应于施加到第一对透明导电层的第一组电压而显示图像;以及光控制层，其设置在第二对透明导电层之间，光控制层被配置为在 透射模式以允许入射光通向显示层，以及反射模式，以响应于施加到第二对透明导电层的第二组电压而将入射光反射离开显示层。
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10.发明授权Liquid-based gravity-driven etching-stop technique for controlling structure dimension 有权液体重力驱动蚀刻停止技术，用于控制结构尺寸公开(公告)号：US07435355B2
公开(公告)日：2008-10-14
申请号：US11242866
申请日：2005-10-05
申请人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
发明人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
IPC分类号： B44C1/22 , H01L21/302
CPC分类号： H01L21/02052 , B81B2201/12 , B81C1/00626 , B81C2201/0142 , G01Q60/38
摘要： A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an embodiment, opposite trenches surrounding the microstructure are respectively etched on sides of the wafer, and the trench depth on the side of the wafer, on which the microstructure is, is equal to the design dimension of the microstructure. Contrarily, it is unnecessary to define the trench depth on the back-side of the chip. In the final step of the fabrication process, when the device is etched, such that the trenches on the sides communicate with each other to separate the microstructure from the whole wafer automatically and thereby shift from the etchant into the etching-stop solution to stop etching.
摘要翻译： 提供了一种用于控制结构尺寸的液体重力驱动蚀刻停止技术，其中与蚀刻停止溶液配合的相反蚀刻沟槽用于控制晶片级上的微结构的尺寸。 在一个实施例中，围绕微结构的相对的沟槽分别蚀刻在晶片的侧面上，并且在其上的晶片侧面上的沟槽深度等于微结构的设计尺寸。 相反，不需要在芯片的背面限定沟槽深度。 在制造过程的最后步骤中，当器件被蚀刻时，使得侧面上的沟槽彼此连通以自动地将微结构与全部晶片分离，从而从蚀刻剂移动到蚀刻停止溶液中以停止蚀刻 。
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