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    Multiple step ionized metal plasma deposition process for conformal step coverage
    1.
    发明授权
    Multiple step ionized metal plasma deposition process for conformal step coverage 失效
    多步电离金属等离子体沉积工艺，用于保形台阶覆盖

    公开(公告)号：US6080285A

    公开(公告)日：2000-06-27

    申请号：US152651

    申请日：1998-09-14

    申请人： Joanna Liu ,  Zheng Xu

    发明人： Joanna Liu ,  Zheng Xu

    IPC分类号： C23C14/04 ,  C23C14/34 ,  C23C14/35 ,  H01L21/285 ,  H01L21/768

    CPC分类号： C23C14/35 ,  C23C14/046 ,  C23C14/345 ,  C23C14/3471 ,  C23C14/3492 ,  H01L21/2855 ,  H01L21/76843

    摘要： A multiple step process sputter deposits material of uniform thickness on stepped surfaces of an integrated circuit substrate such as the surfaces of a high aspect ratio via or a narrow trench. Material is first sputter deposited at the bottom of the opening at high pressure using a source of high power RF energy connected to a coil in the deposition chamber to couple energy into the plasma. A high power RF bias is applied to the substrate, and a low power DC bias is applied to the sputtering target. The same parameters are repeated in a second step except that the high power RF bias on the substrate support is either reduced to a low power level or reduced to zero (by the end of the second step) to deposit on the lowest quarter of the sidewall of the opening. In a third step, no RF bias is applied to the pedestal remains and the pressure is reduced to a medium pressure state, resulting in a deposition on the second quarter of the sidewall of the opening. In a fourth step, the RF power coupled to the plasma is reduced to a low level, resulting in deposition on the third quarter of sidewall of the opening. Finally, the last quarter of the sidewall of the opening is deposited upon by lowering the pressure further to a low pressure state and applying a high power DC bias to the target.

    摘要翻译： 多步骤工艺在诸如高纵横比通孔或窄沟槽的表面的集成电路基板的台阶表面上溅射沉积具有均匀厚度的材料。 首先使用连接到沉积室中的线圈的高功率RF能量的源在高压下在材料的底部溅射沉积材料，以将能量耦合到等离子体中。 向衬底施加高功率RF偏压，并且向溅射靶施加低功率DC偏压。 在第二步骤中重复相同的参数，除了衬底支撑件上的高功率RF偏压被降低到低功率水平或者减小到零（到第二步骤结束）以沉积在侧壁的最低四分之一上 的开幕。 在第三步骤中，没有RF偏压施加到基座保持件并且压力降低到中等压力状态，导致在开口的侧壁的第二个四分之一上的沉积。 在第四步骤中，耦合到等离子体的RF功率被降低到低水平，导致在开口的侧壁的第三季度上沉积。 最后，通过将压力进一步降低到低压状态并向目标施加高功率DC偏压来沉积开口侧壁的最后四分之一。

    Computer system to control multiple step ionized metal plasma deposition process for conformal step coverage
    2.
    发明授权
    Computer system to control multiple step ionized metal plasma deposition process for conformal step coverage 失效
    计算机系统，用于控制多级电离金属等离子体沉积工艺，以保证适形阶梯覆盖

    公开(公告)号：US06449525B1

    公开(公告)日：2002-09-10

    申请号：US09558457

    申请日：2000-04-25

    申请人： Joanna Liu ,  Zheng Xu

    发明人： Joanna Liu ,  Zheng Xu

    IPC分类号： G06F1900

    CPC分类号： C23C14/35 ,  C23C14/046 ,  C23C14/345 ,  C23C14/3471 ,  C23C14/3492 ,  H01L21/2855 ,  H01L21/76843

    摘要： A multiple step process sputter deposits material of uniform thickness on stepped surfaces of an integrated circuit substrate such as the surfaces of a high aspect ratio via or a narrow trench. Material is first sputter deposited at the bottom of the opening at high pressure using a high power RF source connected to a coil in the deposition chamber to couple energy into the plasma. A high power RF bias is applied to the substrate, and a low power DC bias is applied to the sputtering target. The same parameters are repeated in a second step except that the high power RF bias on the substrate support is either reduced to a low power level or reduced to zero (by the end of the second step) to deposit on the lowest quarter of the sidewall of the opening. In a third step, no RF bias is applied to the pedestal remains and the pressure is reduced to a medium pressure state, resulting in a deposition on the second quarter of the sidewall of the opening. In a fourth step, the RF power coupled to the plasma is reduced to a low level, resulting in deposition on the third quarter of sidewall of the opening. Finally, the last quarter of the sidewall of the opening is deposited upon by lowering the pressure further to a low pressure state and applying a high power DC bias to the target.

    摘要翻译： 多步骤工艺在诸如高纵横比通孔或窄沟槽的表面的集成电路基板的台阶表面上溅射沉积具有均匀厚度的材料。 首先使用连接到沉积室中的线圈的高功率RF源在高压下在开口的底部溅射沉积材料，以将能量耦合到等离子体中。 向衬底施加高功率RF偏压，并且向溅射靶施加低功率DC偏压。 在第二步骤中重复相同的参数，除了衬底支撑件上的高功率RF偏压被降低到低功率水平或者减小到零（到第二步骤结束）以沉积在侧壁的最低四分之一上 的开幕。 在第三步骤中，没有RF偏压施加到基座保持件并且压力降低到中等压力状态，导致在开口的侧壁的第二个四分之一上的沉积。 在第四步骤中，耦合到等离子体的RF功率被降低到低水平，导致在开口的侧壁的第三季度上沉积。 最后，通过将压力进一步降低到低压状态并向目标施加高功率DC偏压来沉积开口侧壁的最后四分之一。

    System and method for conditional task switching during ordering scope transitions
    3.
    发明授权
    System and method for conditional task switching during ordering scope transitions 有权
    在订购范围转换期间进行条件任务切换的系统和方法

    公开(公告)号：US09372724B2

    公开(公告)日：2016-06-21

    申请号：US14231789

    申请日：2014-04-01

    申请人： Zheng Xu ,  Tommi M. Jokinen ,  William C. Moyer

    发明人： Zheng Xu ,  Tommi M. Jokinen ,  William C. Moyer

    IPC分类号： G06F9/48

    CPC分类号： G06F9/4843 ,  G06F9/461 ,  G06F9/48

    摘要： A data processing system includes a processor core and a hardware module. The processor core performs tasks on data packets. The hardware module stores a first ordering scope identifier at a first storage location of the ordering scope manager. The first ordering scope identifier indicates a first ordering scope that a first task is operating in. The ordering scope manager increments the first ordering scope identifier to create a new ordering scope identifier. In response to determining that the processor core is authorized to transition the first task from the first ordering scope to a second ordering scope associated with the new ordering scope identifier, the ordering scope manager provides hint information to the processor core. The processor core transitions from the first ordering scope to the second ordering scope without completing a task switch in response to the hint information.

    摘要翻译： 数据处理系统包括处理器核心和硬件模块。 处理器内核在数据包上执行任务。 硬件模块在订购范围管理器的第一存储位置处存储第一订购范围标识符。 第一个订购范围标识符指示第一个任务正在操作的第一个订购范围。订购范围管理器增加第一个订购范围标识符以创建新的订购范围标识符。 响应于确定处理器核被授权将第一任务从第一排序范围转换到与新排序范围标识符相关联的第二排序范围，订购范围管理器向处理器核提供提示信息。 处理器核心从第一订购范围转换到第二订购范围，而不响应于提示信息完成任务切换。

    Event triggered memory mapped access
    4.
    发明授权
    Event triggered memory mapped access 有权
    事件触发内存映射访问

    公开(公告)号：US08700878B2

    公开(公告)日：2014-04-15

    申请号：US12485190

    申请日：2009-06-16

    申请人： William D. Schwarz ,  Joseph P. Gergen ,  Jason T. Nearing ,  Zheng Xu

    发明人： William D. Schwarz ,  Joseph P. Gergen ,  Jason T. Nearing ,  Zheng Xu

    IPC分类号： G06F12/00

    CPC分类号： G06F12/0292 ,  G06F11/3636

    摘要： In one or more embodiments, a data processing system can include at least one core capable of executing instructions of an instruction set architecture and a triggered memory map access (tMMA) system coupled to the at least one core. The tMMA system can receive one or more events and, in response, perform one or more actions. For example, the actions can include transactions which can include a write to a an address of the memory map, a read from an address of the memory map, a read followed by write to two respective addresses of the memory map, and/or a fetch transaction. A result of a transaction (e.g., data read, data written, error, etc.) can be used in generating a trace message. For example, the tMMA system can generate a trace message that includes the result of the transaction and send the trace message to a trace message bus.

    摘要翻译： 在一个或多个实施例中，数据处理系统可以包括能够执行指令集架构的指令的至少一个核心以及耦合到所述至少一个核心的触发的存储器映射访问（tMMA）系统。 tMMA系统可以接收一个或多个事件，并作为响应执行一个或多个动作。 例如，动作可以包括可以包括对存储器映射的地址的写入，从存储器映射的地址的读取，随后写入存储器映射的两个相应地址的读取的事务，和/或 提取事务。 事务的结果（例如，数据读取，数据写入，错误等）可用于生成跟踪消息。 例如，tMMA系统可以生成包含事务结果的跟踪消息，并将跟踪消息发送到跟踪消息总线。

    System and method for performing handover in WiMAX mobile communication system
    6.
    发明授权
    System and method for performing handover in WiMAX mobile communication system 有权
    用于在WiMAX移动通信系统中执行切换的系统和方法

    公开(公告)号：US08588176B2

    公开(公告)日：2013-11-19

    申请号：US12034706

    申请日：2008-02-21

    申请人： Seong-Taek Hwang ,  Shuangfeng Han ,  Chunhui Zhou ,  Jing Wang ,  Ming Zhao ,  Zheng Xu

    发明人： Seong-Taek Hwang ,  Shuangfeng Han ,  Chunhui Zhou ,  Jing Wang ,  Ming Zhao ,  Zheng Xu

    IPC分类号： H04W4/00

    CPC分类号： H04W36/06 ,  H04W88/085

    摘要： Disclosed is a system and a method for performing handover in a Worldwide interoperability for Microwave Access (WiMAX) mobile communication system supporting broadband wireless access. The system includes a plurality of Mobile Stations (MSs); at least one distributed antenna having the ability to perform simultaneous communications with the plurality of MSs; and a base station connected to the at least one distributed antenna through optical fibers for performing communications and handovers with the multiple MSs.

    摘要翻译： 公开了一种在支持宽带无线接入的全球微波接入（WiMAX）移动通信系统互操作性中进行切换的系统和方法。 该系统包括多个移动站（MS）; 至少一个具有与所述多个MS同时通信的能力的分布式天线; 以及通过光纤连接到所述至少一个分布式天线的基站，用于执行与所述多个MS的通信和切换。

    Electrically tunable liquid crystal lens set with central electrode
    8.
    发明授权
    Electrically tunable liquid crystal lens set with central electrode 有权
    配有中心电极的电可调液晶透镜

    公开(公告)号：US08451408B2

    公开(公告)日：2013-05-28

    申请号：US13530128

    申请日：2012-06-22

    申请人： Chi-Yuan Chin ,  Kuei-Jyun Chen ,  Yong Cao ,  Rong-Li Liu ,  Geng Zhong ,  Zheng Xu ,  Ling-Yuan Tseng

    发明人： Chi-Yuan Chin ,  Kuei-Jyun Chen ,  Yong Cao ,  Rong-Li Liu ,  Geng Zhong ,  Zheng Xu ,  Ling-Yuan Tseng

    IPC分类号： G02F1/1337 ,  G02F1/13

    CPC分类号： G02B3/14 ,  G02F1/29 ,  G02F2001/294

    摘要： A liquid crystal lens cell set includes a plurality of liquid crystal lenses overlapping to each other. Each of the liquid crystal lenses is supported between a pair of flat layers. One of the layers supports a planar electrode made of ITO. The other electrode, also formed of ITO, is supported in the center of the opposing substrate and projects toward the center of the liquid crystal layer. A power supply creates a potential difference between the electrodes and imposes a non-uniform electric field on the liquid crystal modules which aligns them in which a way as to act as a lens. By varying voltage between the electrodes the focal length of the lens may be controlled. A central electrode may be in the form of a beam or of a pointed tip. An electrode having a central hole may be associated with the central electrode or the planar electrode.

    摘要翻译： 液晶透镜单元组包括彼此重叠的多个液晶透镜。 每个液晶透镜被支撑在一对平面层之间。 其中一层支撑由ITO制成的平面电极。 也由ITO形成的另一个电极被支撑在相对基板的中心并朝向液晶层的中心突出。 电源产生电极之间的电位差，并在液晶模块上施加不均匀的电场，使得它们成为透镜的方式。 通过改变电极之间的电压，可以控制透镜的焦距。 中心电极可以是梁或尖尖的形式。 具有中心孔的电极可以与中心电极或平面电极相关联。

    SOLAR CELL WITH SHADE-FREE FRONT ELECTRODE
    10.
    发明申请
    SOLAR CELL WITH SHADE-FREE FRONT ELECTRODE 审中-公开
    太阳能电池与无电镀前电极

    公开(公告)号：US20110277816A1

    公开(公告)日：2011-11-17

    申请号：US13048804

    申请日：2011-03-15

    申请人： Zheng Xu ,  Jianming Fu ,  Jiunn Benjamin Heng ,  Chentao Yu

    发明人： Zheng Xu ,  Jianming Fu ,  Jiunn Benjamin Heng ,  Chentao Yu

    IPC分类号： H01L31/052 ,  H01L31/0232 ,  H01L31/18 ,  H01L31/0224

    CPC分类号： H01L31/022425 ,  H01L31/02363 ,  H01L31/056 ,  H01L31/0747 ,  Y02E10/52

    摘要： One embodiment of the present invention provides a solar cell with shade-free front electrode. The solar cell includes a photovoltaic body, a front-side ohmic contact layer situated above the photovoltaic body, a back-side ohmic contact layer situated below the photovoltaic body, a front-side electrode situated above the front-side ohmic contact layer, and a back-side electrode situated below the back-side ohmic contact layer. The front-side electrode includes a plurality of parallel metal grid lines, and the surface of at least one metal grid line is curved, thereby allowing incident light hitting the curved surface to be reflected downward and absorbed by the solar cell surface adjacent to the metal grid line.

    摘要翻译： 本发明的一个实施例提供一种具有无遮蔽的前电极的太阳能电池。 太阳能电池包括光电体，位于光电体上方的前侧欧姆接触层，位于光伏体下方的背面欧姆接触层，位于前侧欧姆接触层上方的前侧电极，以及 位于背侧欧姆接触层下方的背面电极。 前侧电极包括多个平行的金属网格线，并且至少一个金属网格线的表面是弯曲的，从而允许入射到该曲面的入射光向下反射并被靠近金属的太阳能电池表面吸收 网格线。