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    APPARATUS AND METHODS FOR CONTINUOUSLY DEPOSITING A PATTERN OF MATERIAL ONTO A SUBSTRATE
    9.
    发明申请
    APPARATUS AND METHODS FOR CONTINUOUSLY DEPOSITING A PATTERN OF MATERIAL ONTO A SUBSTRATE 审中-公开
    将材料图案连续沉积到基材上的装置和方法

    公开(公告)号：US20080011225A1

    公开(公告)日：2008-01-17

    申请号：US11456687

    申请日：2006-07-11

    申请人： Donald J. McClure ,  Jeffrey H. Tokie ,  Daniel H. Carlson ,  James N. Dobbs ,  John T. Strand ,  Ronald P. Swanson

    发明人： Donald J. McClure ,  Jeffrey H. Tokie ,  Daniel H. Carlson ,  James N. Dobbs ,  John T. Strand ,  Ronald P. Swanson

    IPC分类号： B05C1/00 ,  B05C11/11

    CPC分类号： H05K3/143 ,  C23C14/042 ,  C23C14/54 ,  C23C14/562 ,  H05K1/0393 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0134 ,  H05K2203/0143 ,  H05K2203/1545

    摘要： A pattern of material is continuously deposited onto a substrate. The substrate and a mask are continuously brought together over a portion of a drum where a deposition source emits material. The mask includes apertures that form a pattern, and the material from the deposition source passes through the pattern of the mask and collects onto the substrate to form the pattern of material. The elongation and the transverse position of the substrate and the mask may be controlled. Pattern elements of the substrate and of the mask may be sensed in order to adjust the elongation and/or the transverse position of the substrate and/or mask to maintain a precise registration. Furthermore, the apertures may have a least dimension on the order of 100 microns or less to thereby create features on the substrate having least dimensions on the order of 100 microns or less.

    摘要翻译： 材料的图案被连续沉积到基底上。 衬底和掩模在沉积源发射材料的鼓的一部分上连续地接合在一起。 掩模包括形成图案的孔，并且来自沉积源的材料穿过掩模的图案并收集到基底上以形成材料图案。 可以控制衬底和掩模的伸长率和横向位置。 可以感测衬底和掩模的图案元件以调节衬底和/或掩模的伸长率和/或横向位置以保持精确的配准。 此外，孔可以具有大约100微米或更小的最小尺寸，从而在基底上产生具有小于或等于100微米的最小尺寸的特征。