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    Barrier seal for electrostatic chuck
    1.
    发明授权
    Barrier seal for electrostatic chuck 失效
    静电卡盘阻隔密封

    公开(公告)号：US5636098A

    公开(公告)日：1997-06-03

    申请号：US439010

    申请日：1995-05-11

    申请人： Joseph Salfelder ,  Dennis Grimard ,  John F. Cameron ,  Chandra Deshpandey ,  Robert Ryan ,  Michael G. Chafin

    发明人： Joseph Salfelder ,  Dennis Grimard ,  John F. Cameron ,  Chandra Deshpandey ,  Robert Ryan ,  Michael G. Chafin

    IPC分类号： H02N13/00 ,  H01L21/683

    CPC分类号： H01L21/6833 ,  H01L21/6831

    摘要： An erosion resistant electrostatic chuck 20 for holding a substrate 45 having a peripheral edge 50, in an erosive environment, comprises an electrostatic member 25 including (i) an electrode 30, and (ii) an insulator 35 covering the electrode. A barrier 55 is circumferentially disposed about the electrostatic member 25. The barrier 55 comprises a first contact surface 60 capable of being pressed against the peripheral edge 50 of the substrate 45 to form a seal around the substrate 45 to reduce exposure of the electrostatic member 25 of the chuck 20 to the erosive environment.

    摘要翻译： 用于在侵蚀环境中保持具有周边边缘50的基板45的防腐蚀静电卡盘20包括静电部件25，静电部件25包括（i）电极30和（ii）覆盖电极的绝缘体35。 阻挡件55围绕静电部件25周向设置。阻挡件55包括第一接触表面60，该第一接触表面60能够抵靠基板45的周边边缘50，以围绕基板45形成密封，以减少静电部件25的暴露 的卡盘20到腐蚀环境。

    ELECTROSTATIC CHUCK
    2.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开
    静电卡

    公开(公告)号：US20100326602A1

    公开(公告)日：2010-12-30

    申请号：US12495252

    申请日：2009-06-30

    申请人： Terry BLUCK ,  Terry Pederson ,  Dennis Grimard

    发明人： Terry BLUCK ,  Terry Pederson ,  Dennis Grimard

    IPC分类号： H01L21/683 ,  H01L21/3065 ,  B05C13/02

    CPC分类号： H01L21/6831

    摘要： An isolator for heat transfer gas conduits of an electrostatic chuck is described. The isolator includes a sleeve and a body positioned in the sleeve to form an annulus between the body and sleeve that allows for flow of the heat transfer gas. The body is positioned against the puck of the chuck, and may be supported in this position by a spring. A silicon seal may be provided between the sleeve and the puck to prevent plasma from forming in the conduits.

    摘要翻译： 描述了用于静电卡盘的传热气体导管的隔离器。 隔离器包括套筒和定位在套筒中的主体，以在主体和套筒之间形成允许传热气体流动的环形空间。 主体抵靠卡盘的圆盘定位，并且可以通过弹簧支撑在该位置。 可以在套筒和圆盘之间设置硅密封件，以防止等离子体在导管中形成。

    ELECTROSTATIC CHUCK APPARATUS
    3.
    发明申请
    ELECTROSTATIC CHUCK APPARATUS 审中-公开
    静电卡装置

    公开(公告)号：US20090086400A1

    公开(公告)日：2009-04-02

    申请号：US11864225

    申请日：2007-09-28

    申请人： Tugrul Samir ,  Dennis Grimard

    发明人： Tugrul Samir ,  Dennis Grimard

    IPC分类号： H01L21/683 ,  H01L21/67 ,  H02N13/00

    CPC分类号： H01L21/68735 ,  H01L21/6833

    摘要： An electrostatic chuck for holding a substrate has a circular dielectric member having a top surface configured to support the substrate, the top surface having a plurality of mesas consisting of n subsets, wherein mesas of each subset are distributed along one of a plurality of concentric bolt circles of increasing radii, and wherein all of the concentric bolt circles center about the center of the circular dielectric member.

    摘要翻译： 用于保持基板的静电卡盘具有圆形电介质构件，其具有构造成支撑基板的顶表面，顶表面具有由n个子组成的多个台面，其中每个子集的台面沿着多个同心螺栓 圆的半径增加，并且其中所有同心螺栓圆围绕圆形电介质构件的中心围绕。

    ELECTROSTATIC CHUCK APPARATUS
    5.
    发明申请
    ELECTROSTATIC CHUCK APPARATUS 审中-公开
    静电卡装置

    公开(公告)号：US20090086401A1

    公开(公告)日：2009-04-02

    申请号：US11864288

    申请日：2007-09-28

    申请人： Tugrul Samir ,  Terry Bluck ,  Dennis Grimard

    发明人： Tugrul Samir ,  Terry Bluck ,  Dennis Grimard

    IPC分类号： H01L21/683 ,  H01L21/67 ,  H02N13/00

    CPC分类号： H01L21/6831

    摘要： An electrostatic chuck includes an angled conduit, or an angled laser drilled passage, through which a heat transfer gas is provided. A segment of the angled conduit and/or the angled laser drilled passage extends along an axis different from an axis of the electric field generated to hold a substrate to the chuck, thereby minimizing plasma arcing and backside gas ionization. A first plug may be inserted into the conduit, wherein a segment of a first exterior channel thereof extends along an axis different from an axis of the electric field. A first and second plug may be inserted into a ceramic sleeve which extends through at least one of the dielectric member and the electrode. Finally, the surface of the dielectric member may comprise embossments arranged at radial distances from the center of the dielectric member so as to improve heat transfer and gas distribution.

    摘要翻译： 静电卡盘包括成角度的导管或成角度的激光钻孔通道，通过该通道提供传热气体。 成角度的管道和/或成角度的激光钻孔通道的一段沿着不同于将基板保持在卡盘上的电场的轴线不同的轴线延伸，从而最小化等离子体电弧放电和背侧气体电离。 第一塞子可以插入导管中，其中第一外部通道的一段沿着不同于电场的轴线的轴线延伸。 第一和第二插头可以插入延伸穿过电介质构件和电极中的至少一个的陶瓷套管中。 最后，电介质构件的表面可以包括布置在离电介质构件的中心的径向距离处的凸起，以便改善传热和气体分布。

    Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber
    6.
    发明授权
    Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber 失效
    用于调节半导体晶片处理室中的处理套件的温度的装置

    公开(公告)号：US06795292B2

    公开(公告)日：2004-09-21

    申请号：US09861984

    申请日：2001-05-15

    申请人： Dennis Grimard ,  Arnold Kholodenko ,  Alex Veytser ,  Senh Thach ,  Wing Cheng

    发明人： Dennis Grimard ,  Arnold Kholodenko ,  Alex Veytser ,  Senh Thach ,  Wing Cheng

    IPC分类号： H01G2300

    CPC分类号： H01L21/67109 ,  H01L21/67103

    摘要： An apparatus for reducing by-product formation in a semiconductor wafer-processing chamber. In a first embodiment, the apparatus comprises a chuck having a chucking electrode and a radially extending peripheral flange. A collar is disposed over the peripheral flange defining a first gap therebetween, and circumscribes the chuck. A heater element is embedded within the collar and adapted for connection to a power source. In a second embodiment, the apparatus comprises a chuck having a chucking electrode and a radially extending peripheral flange, and a collar having a heater element embedded therein. The collar is disposed over the peripheral flange to define a gap therebetween, and circumscribes the chuck. Moreover, a pedestal having a gas delivery system therein is disposed below the chuck and collar. In a third embodiment, the apparatus comprises a chuck having a chucking electrode and a radially extending peripheral flange, a collar, and a waste ring having a heater element embedded therein. The waste ring is disposed over the peripheral flange defining a gap therebetween, and circumscribes the chuck. The collar is chucked to the waste ring, and the waste ring is chucked to a pedestal support. Moreover, the waste ring and pedestal each have a gas delivery system therein for regulating the temperature of the collar.

    摘要翻译： 一种用于减少半导体晶片处理室中副产物形成的装置。 在第一实施例中，该装置包括具有夹紧电极和径向延伸的周边凸缘的卡盘。 套环设置在周边凸缘之上，限定了它们之间的第一间隙，并限制卡盘。 加热器元件嵌入在轴环内并且适于连接到电源。 在第二实施例中，该装置包括具有夹紧电极和径向延伸的周边凸缘的卡盘以及嵌入其中的加热器元件的套环。 套环设置在周边凸缘上方以在其间形成间隙并限制卡盘。 此外，其中具有气体输送系统的基座设置在卡盘和轴环的下方。 在第三实施例中，该装置包括具有夹紧电极和径向延伸的周边凸缘，套环和具有嵌入其中的加热器元件的废料环的卡盘。 废环设置在周边凸缘之上，限定了它们之间的间隙，并且围绕卡盘。 将衣领卡在废物环上，将废物环卡在基座支架上。 此外，废环和底座各自具有用于调节套环温度的气体输送系统。

    Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners
    9.
    发明授权
    Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners 失效
    电感耦合RF等离子体反应器，具有架空螺线管天线和模块化限制磁铁衬垫

    公开(公告)号：US06454898B1

    公开(公告)日：2002-09-24

    申请号：US09482261

    申请日：2000-01-11

    申请人： Kenneth Collins ,  Michael Rice ,  Douglas Buchberger ,  Craig Roderick ,  Eric Askarinam ,  Gerhard Schneider ,  John Trow ,  Joshua Tsui ,  Dennis Grimard ,  Gerald Yin ,  Robert Wu

    发明人： Kenneth Collins ,  Michael Rice ,  Douglas Buchberger ,  Craig Roderick ,  Eric Askarinam ,  Gerhard Schneider ,  John Trow ,  Joshua Tsui ,  Dennis Grimard ,  Gerald Yin ,  Robert Wu

    IPC分类号： C23C1434

    CPC分类号： H01J37/32522 ,  C23C16/517 ,  H01F2029/143 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01L21/31116 ,  H01L21/6831

    摘要： In accordance with a first aspect of the invention, a plasma reactor having a chamber for containing a plasma and a passageway communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passageway including a first module housing and a first plasma confinement magnet inside the housing. It may further include a second removable plasma confinement magnet module placed adjacent the passageway including a second module housing, and a second plasma confinement magnet. Preferably, the first and second modules are located on opposite sides of the passageway. Moreover, the first and second plasma confinement magnets have magnetic orientations which tend to oppose plasma transport or leakage through the passageway. Preferably, the module housing includes a relatively non-magnetic thermal conductor such as aluminum and is in thermal contact with said chamber body. Cooling apparatus can be thermally coupled to the chamber body, whereby to maintain the first plasma confinement magnet below its Curie temperature. If the reactor includes a pumping annulus adjacent of a periphery of the chamber, then the passageway can be one which communicates between the chamber and the pumping annulus. Also, the passageway can be a wafer slit valve or a gas feed inlet. Such a gas feed inlet can be a center gas feed through a ceiling of the chamber. The module housing can rest upon the chamber side wall and the chamber ceiling can rest upon the module housing.

    摘要翻译： 根据本发明的第一方面，具有用于容纳等离子体的腔室和与腔室连通的通路的等离子体反应器通过与通道相邻放置的第一可移除等离子体约束磁体模块而增强，该模块包括第一模块壳体和第一等离子体 限制磁体在壳体内。 其还可以包括邻近通道设置的第二可移除等离子体限制磁体模块，包括第二模块壳体和第二等离子体限制磁体。 优选地，第一和第二模块位于通道的相对侧上。 此外，第一和第二等离子体限制磁体具有倾向于抵抗等离子体输送或通过通道的泄漏的磁性取向。 优选地，模块壳体包括诸如铝的相对非磁性的热导体，并​​且与所述室主体热接触。 冷却装置可以热耦合到室主体，从而将第一等离子体限制磁体保持在其居里温度以下。 如果反应器包括邻近室的周边的泵送环，则通道可以是在室和泵送环之间连通的通道。 此外，通道可以是晶片狭缝阀或气体进料口。 这种气体进料口可以是通过室的天花板的中心气体进料。 模块壳体可以搁置在腔室侧壁上，并且室顶板可以靠在模块壳体上。

    Plasma generation and control using a dual frequency RF source
    10.
    发明授权
    Plasma generation and control using a dual frequency RF source 有权
    使用双频RF源的等离子体发生和控制

    公开(公告)号：US07431857B2

    公开(公告)日：2008-10-07

    申请号：US10843914

    申请日：2004-05-12

    申请人： Steven C. Shannon ,  Alex Paterson ,  Theodoros Panagopoulos ,  John P. Holland ,  Dennis Grimard ,  Yashushi Takakura

    发明人： Steven C. Shannon ,  Alex Paterson ,  Theodoros Panagopoulos ,  John P. Holland ,  Dennis Grimard ,  Yashushi Takakura

    IPC分类号： G01R31/00

    CPC分类号： H01J37/32082 ,  H01J37/32165 ,  H01J37/32706

    摘要： A method and apparatus for generating and controlling a plasma in a semiconductor substrate processing chamber using a dual frequency RF source is provided. The method includes the steps of supplying a first RF signal from the source to an electrode within the processing chamber at a first frequency and supplying a second RF signal from the source to the electrode within the processing chamber at a second frequency. The second frequency is different from the first frequency by an amount equal to a desired frequency. Characteristics of a plasma formed in the chamber establish a sheath modulation at the desired frequency.

    摘要翻译： 提供了一种使用双频RF源在半导体衬底处理室中产生和控制等离子体的方法和装置。 该方法包括以第一频率将来自源的第一RF信号提供给处理室内的电极的步骤，并以第二频率将来自源的第二RF信号提供给处理室内的电极。 第二频率与第一频率不等于期望频率的量。 在腔室中形成的等离子体的特性以期望的频率建立护套调制。