Method for microstructuring flat glass substrates
    10.
    发明授权
    Method for microstructuring flat glass substrates 失效
    平板玻璃基板的微结构化方法

    公开(公告)号:US07476623B2

    公开(公告)日:2009-01-13

    申请号:US11243443

    申请日:2005-10-04

    IPC分类号: H01L21/302

    CPC分类号: C03C15/00

    摘要: In the method for microstructuring flat glass substrates a substrate surface of a glass substrate is coated with at least one structured mask layer and subsequently exposed to a chemically reactive ion etching process (RIE) with at least one chemical etching gas. In order to provide the same or a higher quality etching and etching rate even for economical types of glass the chemical etching gas is mixed with at least one noble gas, so that the proportion of sputtering etching in the ion etching process is significantly increased.

    摘要翻译: 在用于微结构化平板玻璃基板的方法中,玻璃基板的基板表面涂覆有至少一个结构化掩模层,随后用至少一种化学蚀刻气体暴露于化学反应离子蚀刻工艺(RIE)。 为了提供相同或更高质量的蚀刻和蚀刻速率,即使对于经济类型的玻璃,化学蚀刻气体与至少一种惰性气体混合,使得离子蚀刻工艺中溅射蚀刻的比例显着增加。