利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

13 条记录 (耗时 0.029 秒)

    METHOD OF AND APPARATUS FOR SEPARATING MICROORGANISMS FROM SAMPLE USING ELECTRODIALYSIS AND MICROORGANISM CAPTURING MEANS
    1.
    发明申请
    METHOD OF AND APPARATUS FOR SEPARATING MICROORGANISMS FROM SAMPLE USING ELECTRODIALYSIS AND MICROORGANISM CAPTURING MEANS 审中-公开
    使用电化学和微生物捕获方法从样品中分离微生物的方法和装置

    公开(公告)号：US20080044880A1

    公开(公告)日：2008-02-21

    申请号：US11841191

    申请日：2007-08-20

    申请人： Jung-im HAN ,  Joon-ho KIM ,  Sung-young JEONG ,  Young-sun LEE ,  Kyu-youn HWANG ,  Hun-joo LEE

    发明人： Jung-im HAN ,  Joon-ho KIM ,  Sung-young JEONG ,  Young-sun LEE ,  Kyu-youn HWANG ,  Hun-joo LEE

    IPC分类号： C12N13/00 ,  C12M1/00

    CPC分类号： C12N1/02 ,  B01D61/48

    摘要： A method of separating microorganisms from a sample includes introducing a sample into an apparatus which controls a concentration of at least one salt, the apparatus includes a reaction chamber defined between a cation exchange membrane and an anion exchange membrane, a first electrode chamber defined between the anion exchange membrane and a first electrode, the first electrode chamber containing a first ion exchange medium, a second electrode chamber defined between the cation exchange membrane and a second electrode, the second electrode chamber containing a second ion exchange medium, applying a voltage between the first electrode and the second electrode to electrodialyze the sample in the reaction chamber and reduce the concentration of the at least one salt in the sample and allowing the sample having the reduced concentration of the at least one salt to contact a microorganism capturing means.

    摘要翻译： 从样品中分离微生物的方法包括将样品引入到控制至少一种盐浓度的装置中，该装置包括界定在阳离子交换膜和阴离子交换膜之间的反应室，第一电极室 阴离子交换膜和第一电极，第一电极室包含第一离子交换介质，第二电极室限定在阳离子交换膜和第二电极之间，第二电极室包含第二离子交换介质， 第一电极和第二电极，使反应室中的样品电渗析，并降低样品中至少一种盐的浓度，并允许具有降低的至少一种盐浓度的样品接触微生物捕获装置。

    METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE
    2.
    发明申请
    METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE 审中-公开
    从基板剥离光电离膜的方法和与第二基板结合的光电隔膜

    公开(公告)号：US20070148588A1

    公开(公告)日：2007-06-28

    申请号：US11613629

    申请日：2006-12-20

    申请人： Chin-sung PARK ,  Kyu-youn HWANG ,  Jin-tae KIM ,  Young-sun LEE

    发明人： Chin-sung PARK ,  Kyu-youn HWANG ,  Jin-tae KIM ,  Young-sun LEE

    IPC分类号： G03C1/00

    CPC分类号： G03F7/165 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C1/00071 ,  B81C2201/0191 ,  B82Y30/00 ,  G03F7/11 ,  G03F7/161 ,  G03F7/40

    摘要： Disclosed herein is a method of releasing a photoresist film from a substrate, which includes forming a self-assembled monolayer (SAM) on a substrate; coating the SAM with a photoresist film; and rinsing the substrate with an alcohol or an acid. According to the photoresist film releasing method, a photoresist film can be easily released from a substrate without damage after patterning. A method of bonding a released photoresist film with a substrate includes arraying a second substrate and the photoresist film released from a first substrate, and baking the second substrate. According to the bonding method, the photoresist film can be perfectly bonded with a second substrate without generating a crevice even though an additional adhesive is not used.

    摘要翻译： 本文公开了一种从衬底上释放光致抗蚀剂膜的方法，其包括在衬底上形成自组装单层（SAM）; 用光致抗蚀剂膜涂覆SAM; 并用醇或酸冲洗底物。 根据光致抗蚀剂膜的释放方法，在图案化之后，光致抗蚀剂膜可以容易地从衬底上释放而不损坏。 将释放的光致抗蚀剂膜与基板接合的方法包括排列第二基板和从第一基板释放的光致抗蚀剂膜，并烘烤第二基板。 根据接合方法，即使没有使用另外的粘合剂，也可以使光致抗蚀剂膜与第二基板完全粘合而不产生缝隙。

    METHOD OF REDUCING TEMPERATURE DIFFERENCE BETWEEN A PAIR OF SUBSTRATES AND FLUID REACTION DEVICE USING THE SAME
    7.
    发明申请
    METHOD OF REDUCING TEMPERATURE DIFFERENCE BETWEEN A PAIR OF SUBSTRATES AND FLUID REACTION DEVICE USING THE SAME 失效
    降低基板对流与使用其的流体反应装置之间的温度差异的方法

    公开(公告)号：US20110033919A1

    公开(公告)日：2011-02-10

    申请号：US12904557

    申请日：2010-10-14

    申请人： Kak NAMKOONG ,  Su-hyeon KIM ,  Jin-tae KIM ,  Chin-sung PARK ,  Young-sun LEE

    发明人： Kak NAMKOONG ,  Su-hyeon KIM ,  Jin-tae KIM ,  Chin-sung PARK ,  Young-sun LEE

    IPC分类号： C12M1/40

    CPC分类号： B81B3/0081 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00822 ,  B01J2219/00873 ,  B01L3/5027 ,  B01L7/5255 ,  B01L2200/14 ,  B01L2200/147 ,  B01L2300/1805 ,  B01L2300/1827 ,  B81B2201/051 ,  F28F21/02 ,  F28F2013/006

    摘要： A method of reducing a temperature difference between a high-temperature and a low-temperature substrate includes interposing a heat transfer facilitating layer which has a higher thermal conductivity than air and can hold particles between the substrates, and maintaining close contact between the high-temperature substrate, the heat transfer facilitating layer, and the low-temperature substrate, wherein formation of an air layer can be at least substantially prevented between the high-temperature substrate and the heat transfer facilitating layer, and between the low-temperature substrate and the heat transfer facilitating layer. A fluid reaction device includes a microfluidic reaction chip which accommodates a fluid, a heater, and a heat transfer facilitating layer which is interposed between the microfluidic reaction chip and the heater, the heat transfer facilitating layer has a higher thermal conductivity than air and can hold particles, wherein formation of an air layer can be prevented.

    摘要翻译： 降低高温和低温基板之间的温度差的方法包括：介于热传导率高于空气的传热促进层，并且可以在基板之间保持颗粒，并且保持高温 基板，传热促进层和低温基板，其中至少可以在高温基板和传热促进层之间以及在低温基板和热量之间基本上防止空气层的形成 转移促进层。 流体反应装置包括容纳流体的微流体反应芯片，加热器和介于微流体反应芯片和加热器之间的传热促进层，传热促进层具有比空气更高的导热性并且可以保持 颗粒，其中可以防止空气层的形成。