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公开(公告)号:US20230209829A1
公开(公告)日:2023-06-29
申请号:US18176656
申请日:2023-03-01
申请人: KIOXIA CORPORATION
发明人: Toshifumi MINAMI , Atsuhiro SATO , Keisuke YONEHAMA , Yasuyuki BABA , Hiroshi SHINOHARA , Hideyuki KAMATA , Teppei HIGASHITSUJI
IPC分类号: H10B43/27 , H01L29/792 , H10B41/20 , H10B41/27 , H10B43/00 , H10B43/10 , H10B43/20 , H10B43/35
CPC分类号: H10B43/27 , H01L29/7926 , H10B41/20 , H10B41/27 , H10B43/00 , H10B43/10 , H10B43/20 , H10B43/35
摘要: A semiconductor memory device includes a conducting layer and an insulating layer that are disposed above a semiconductor substrate, a plurality of pillars that extend in a direction which crosses a surface of the semiconductor substrate, and a plate that is disposed between the plurality of pillars and extends in the same direction as the pillars. A surface of the plate, which faces the pillars, has convex portions and non-convex portions.
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公开(公告)号:US20240306393A1
公开(公告)日:2024-09-12
申请号:US18666035
申请日:2024-05-16
申请人: Kioxia Corporation
发明人: Toshifumi MINAMI , Atsuhiro SATO , Keisuke YONEHAMA , Yasuyuki BABA , Hiroshi SHINOHARA , Hideyuki KAMATA , Teppei HIGASHITSUJI
IPC分类号: H10B43/27 , H01L29/792 , H10B41/20 , H10B41/27 , H10B43/00 , H10B43/10 , H10B43/20 , H10B43/35
CPC分类号: H10B43/27 , H01L29/7926 , H10B41/20 , H10B41/27 , H10B43/00 , H10B43/10 , H10B43/20 , H10B43/35
摘要: A semiconductor memory device includes a conducting layer and an insulating layer that are disposed above a semiconductor substrate, a plurality of pillars that extend in a direction which crosses a surface of the semiconductor substrate, and a plate that is disposed between the plurality of pillars and extends in the same direction as the pillars. A surface of the plate, which faces the pillars, has convex portions and non-convex portions.
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公开(公告)号:US20220216232A1
公开(公告)日:2022-07-07
申请号:US17700951
申请日:2022-03-22
申请人: KIOXIA CORPORATION
发明人: Toshifumi MINAMI , Atsuhiro SATO , Keisuke YONEHAMA , Yasuyuki BABA , Hiroshi SHINOHARA , Hideyuki KAMATA , Teppei HIGASHITSUJI
IPC分类号: H01L27/11582 , H01L27/11565 , H01L27/1157 , H01L27/11578 , H01L27/11551 , H01L29/792 , H01L27/11563 , H01L27/11556
摘要: A semiconductor memory device includes a conducting layer and an insulating layer that are disposed above a semiconductor substrate, a plurality of pillars that extend in a direction which crosses a surface of the semiconductor substrate, and a plate that is disposed between the plurality of pillars and extends in the same direction as the pillars. A surface of the plate, which faces the pillars, has convex portions and non-convex portions.
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公开(公告)号:US20230317173A1
公开(公告)日:2023-10-05
申请号:US18326587
申请日:2023-05-31
申请人: Kioxia Corporation
发明人: Masanobu SHIRAKAWA , Takuya FUTATSUYAMA , Kenichi ABE , Hiroshi NAKAMURA , Keisuke YONEHAMA , Atsuhiro SATO , Hiroshi SHINOHARA , Yasuyuki BABA , Toshifumi MINAMI
IPC分类号: G11C16/14 , G11C16/04 , G11C11/56 , H10B43/27 , H10B43/35 , G11C16/08 , G11C16/10 , G11C16/26 , G11C29/42
CPC分类号: G11C16/14 , G11C16/0483 , G11C11/5635 , H10B43/27 , H10B43/35 , G11C16/08 , G11C16/10 , G11C16/26 , G11C29/42 , G11C16/3445
摘要: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.
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公开(公告)号:US20220148657A1
公开(公告)日:2022-05-12
申请号:US17585370
申请日:2022-01-26
申请人: KIOXIA CORPORATION
发明人: Masanobu SHIRAKAWA , Takuya FUTATSUYAMA , Kenichi ABE , Hiroshi NAKAMURA , Keisuke YONEHAMA , Atsuhiro SATO , Hiroshi SHINOHARA , Yasuyuki BABA , Toshifumi MINAMI
IPC分类号: G11C16/14 , G11C16/04 , H01L27/1157 , H01L27/11582 , G11C11/56 , G11C16/08 , G11C16/10 , G11C16/26 , G11C29/42
摘要: A semiconductor memory device includes a first memory cell, a second memory cell above the first memory cell, a first word line electrically connected to a gate of the first memory cell, a second word line electrically connected to a gate of the second memory cell, and a control unit that performs an erasing operation on the first and second memory cells. During the erasing operation, the control unit applies a first voltage to a first word line and a second voltage higher than the first voltage to a second word line.
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