摘要:
A photopolymerizable composition is described, which comprises a polymerizable compound containing at least one ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator is a combination of a 3-keto-substituted cumarin compound and an active halogeno compound. This composition can be easily cured by irradiation with radiation and, therefore, is very useful in the preparation of light-sensitive materials.
摘要:
A photopolymerizable composition having an improved sensitivity, which comprises a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator, wherein said photopolymerization initiator comprises a compound represented by general formula I ##STR1## wherein R.sup.1 and R.sup.2 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or an aralkyl group; X represents a substituent having a Hammett's value of not more than 0.7; and Y represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, or an alkoxycarbonyl group and a 1,3,5-triazine compound represented by general formula II ##STR2## wherein R.sup.3, R.sup.4, and R.sup.5 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or an aralkyl group; at least one of them being a mono-, di-, or tri-halogen-substituted methyl group.
摘要:
A positive-working light-sensitive composition whose solubility in a developer is increased by irradiation of light, which comprises:(a) a vinyl ether compound having at least one group represented by the following formula (A); ##STR1## wherein R.sup.3 represents a linear or branched alkylene group having 1 to 10 carbon atoms and n represents an integer of 0 or 1;(b) a compound capable of being decomposed by irradiation of an actinic light ray or a radiant ray and releasing an acid; and(c) an alkali-soluble polymer, the light-sensitive composition having high sensitivity to light and permitting the use of light of a wide wavelength range.
摘要:
A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.
摘要:
A positive working photosensitive composition comprising a polymeric compound insoluble in water but soluble in an aqueous alkaline solution and an aromatic sulfonic acid salt of an onium compound. The positive working photosensitive composition having high sensitivity and being capable of forming high-contrast images.
摘要:
A positive-working light-sensitive composition comprising (a) a compound having at least two enol ether groups, represented by the following general formula (I); (b) a linear polymer having acidic groups; and (c) a compound capable of generating an acid through irradiation with actinic light rays or radiant rays, the component (a) and the component (b) being thermally crosslinked:(R.sup.2)(R.sup.1)C.dbd.C(R.sup.3)--O-- (I)wherein R.sup.1, R.sup.2 and R.sup.3 may be the same or different and each represents a hydrogen atom, an alkyl group or an aryl group, provided that each two of R.sup.1, R.sup.2 and R.sup.3 may be linked together to form a saturated or olefinically unsaturated ring. The positive-working light-sensitive composition has high light-sensitivity and permits the use of light rays extending over a wide range of wavelengths. Therefore, the positive-working light-sensitive composition of the present invention can provide clear positive images and has a wide development latitude.
摘要:
A photopolymerizable composition is described, comprising a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator represented by formula (I) ##STR1## wherein Z represents a non-metallic atomic group forming a nitrogen-containing heterocyclic ring; and R represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic ring. The photopolymerization initiator (I) greatly improves the sensitivity of the composition.
摘要:
A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.
摘要:
A photopolymerizable composition containing an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator is disclosed, wherein the photopolymerizable composition contains at least one compound represented by following general formula (I) or (II) as the photopolymerization initiator: ##STR1## wherein, R.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.5 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group or a substituted allyl group, said R.sub.1 and R.sub.2 may combine with each other to form a ring together with the carbon atoms to which they are bonded; Y represents --O--, --S--, --Se--, --C(CH.sub.3).sub.2 -- or --CH.dbd.CH--; X.sub.1 represents an oxygen atom or a sulfur atom; R.sub.11, R.sub.12, R.sub.17, and R.sub.18 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group, or a substituted allyl group; R.sub.13, R.sub.14, R.sub.15, and R.sub.16 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, a halogen atom, a carboalkoxy group, or an alkoxy group; said R.sub.11 and R.sub.15, said R.sub.12 and R.sub.13, said R.sub.15 and R.sub.16, and said R.sub.13 and R.sub.14 each may combine with each other to form a ring together with the carbon atoms to which they are bonded; and X.sub.2 represents an oxygen atom or a sulfur atom.
摘要翻译:公开了含有具有至少一个烯属不饱和双键的加成聚合性化合物和光聚合引发剂的光聚合性组合物,其中,所述光聚合性组合物含有至少一种下述通式(I)或(II)表示的化合物作为光聚合引发剂: (I)其中,R1,R2,R3,R4和R5各自表示氢原子,烷基,取代的烷基,芳基,取代的芳基,烯丙基 或取代的烯丙基,所述R 1和R 2可以彼此结合形成与它们所键合的碳原子一起形成的环; Y表示-O - , - S - , - S - , - C(CH 3)2 - 或-CH = CH-; X1表示氧原子或硫原子; R 11,R 12,R 17和R 18各自表示氢原子,烷基,取代的烷基,芳基,取代的芳基,烯丙基或取代的烯丙基; R 13,R 14,R 15和R 16各自表示氢原子,烷基,取代的烷基,芳基,取代的芳基,卤素原子,碳烷氧基或烷氧基; 所述R11和R15表示R12和R13表示R15和R16,并且所述R13和R14各自可以彼此结合形成与它们所键合的碳原子一起形成的环; X2表示氧原子或硫原子。
摘要:
A photopolymerizable composition is disclosed, comprising a polymerizable compound having at least one ethylenic unsaturated double bond and a photopolymerization initiator, where the photopolymerization initiator is a combination of (A) acridine having a substituted or unsubstituted phenyl group at 9-position and (B) a heterocyclic compound having a thiol group connected to a 5- to 7-membered heterocyclic ring containing at least one nitrogen atom. The photopolymermizable composition is useful for preparation of lithographic plates and photoresists and as an adhesive, printing ink or coating material.