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22 条记录 (耗时 0.014 秒)

    Volume-optimized reactor for simultaneously coating eyeglasses on both sides
    2.
    发明授权
    Volume-optimized reactor for simultaneously coating eyeglasses on both sides 有权
    体积优化的反应器，用于同时在两侧涂上眼镜

    公开(公告)号：US07533628B2

    公开(公告)日：2009-05-19

    申请号：US10319754

    申请日：2002-12-13

    申请人： Lars Bewig ,  Thomas Küpper

    发明人： Lars Bewig ,  Thomas Küpper

    IPC分类号： C23C16/00 ,  H01L21/306

    CPC分类号： H01J37/32192

    摘要： A reactor for simultaneous coating of eyeglasses on both sides thereof. Two partial devices are provided, each with a microwave energy waveguide, a gas supply and an apparatus for evacuating the coating chamber where the first and second devices can be moved relative to each other to open and close the coating chamber. The coating chamber itself is removable from the device and includes two gas supply connections and two connections for evacuating the coating chamber as well as microwave windows for coupling in microwave energy.

    摘要翻译： 用于同时在其两侧涂覆眼镜的反应器。 提供两个部分装置，每个部件具有微波能量波导，气体供应装置和用于抽出涂层室的装置，其中第一和第二装置可相对于彼此移动以打开和关闭涂覆室。 涂层室本身可以从设备中移除，并且包括两个气体供应连接和两个用于抽真空涂层室的连接以及用于以微波能量耦合的微波窗口。

    Gas supply method in a CVD coating system for precursors with a low vapor pressure
    3.
    发明授权
    Gas supply method in a CVD coating system for precursors with a low vapor pressure 有权
    用于具有低蒸气压的前体的CVD涂覆系统中的气体供应方法

    公开(公告)号：US07413767B2

    公开(公告)日：2008-08-19

    申请号：US11014488

    申请日：2004-12-16

    申请人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Küpper

    发明人： Hartmut Bauch ,  Lars Bewig ,  Lutz Klippe ,  Thomas Küpper

    IPC分类号： C23C16/00

    CPC分类号： C23C16/448

    摘要： A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature T1 and a first pressure p1. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided. The mixture is maintained in the intermediate storage device at a constant second pressure p2 lower than the first pressure p1 and at a second temperature T2 lower than the first temperature T1, and the mixture is supplied from the intermediate storage device through a second gas line.

    摘要翻译： 一种通过在CVD涂覆系统中提供低蒸气压的前体气体来制造包括铌，钽，钛或铝的光学功能涂层的方法。 选自具有蒸气压的Nb，Ta，Ti和Al化合物的前体的前体在第一温度T 1和第一压力p 1下保持在第一供应容器内。 前体的前体蒸气通过与第一供给容器和中间储存装置流体连通的第一气体管线从第一供给容器供给到中间储存装置。 向第一气体管线供给载气或反应气体，使得前体与载体气体或反应气体的混合物被提供。 将混合物以比第一压力p 1低的恒定的第二压力p 2和低于第一温度T 1的第二温度T 2保持在中间储存装置中，并且将混合物从中间储存装置通过 第二条天然气线。

    Method for coating the quartz burner of an HID lamp
    7.
    发明授权
    Method for coating the quartz burner of an HID lamp 失效
    用于涂覆HID灯的石英燃烧器的方法

    公开(公告)号：US07306830B2

    公开(公告)日：2007-12-11

    申请号：US10502408

    申请日：2003-01-28

    申请人： Wolfgang Moehl ,  Lars Bewig ,  Thomas Kuepper ,  Wolfram Maring ,  Christopher Moelle

    发明人： Wolfgang Moehl ,  Lars Bewig ,  Thomas Kuepper ,  Wolfram Maring ,  Christopher Moelle

    IPC分类号： H05H1/24 ,  H01J61/40

    CPC分类号： C03C17/3417 ,  H01J61/35

    摘要： In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

    摘要翻译： 为了提高HID灯的能量平衡，石英燃烧器，优选其内部，通过交替地施加至少由氧化钛和氧化硅制成的非晶薄层，涂覆有一般的化学计量的TiO 通过等离子体脉冲化学气相沉积（PICVD）方法在高功率密度和100°至400°C范围内提高的衬底温度下， 使用范围从1nm /秒到100nm / sec的小增长率，以便形成厚度小于1200nm的干涉层系统和0.1至1％范围内的最小化UV有源缺陷点率。

    Coating system and method for coating, as well as coated articles
    8.
    发明授权
    Coating system and method for coating, as well as coated articles 有权
    涂层系统和涂层方法以及涂层制品

    公开(公告)号：US08268410B2

    公开(公告)日：2012-09-18

    申请号：US11937279

    申请日：2007-11-08

    申请人： Christoph Moelle ,  Lars Bewig ,  Thomas Kuepper

    发明人： Christoph Moelle ,  Lars Bewig ,  Thomas Kuepper

    IPC分类号： H05H1/24

    CPC分类号： C23C16/515 ,  C23C16/45512 ,  C23C16/45523 ,  C23C16/45591

    摘要： In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

    摘要翻译： 在包括PECVD和PICVD方法的CVD方法的情况下，本发明的目的是改进目标层系统的无杂质，并且尽可能地临时和定量地精确地供给工艺气体。 为此，本发明提供一种涂覆系统和用交替层涂覆制品的方法，在这种情况下，工艺气体以交替的方式引入气体混合点并与另外的气体混合并被引导到反应室 ，其中通过产生等离子体进行沉积。

    Method and apparatus for plasma enhanced chemical vapor deposition
    10.
    发明申请
    Method and apparatus for plasma enhanced chemical vapor deposition 有权
    等离子体增强化学气相沉积的方法和装置

    公开(公告)号：US20080124488A1

    公开(公告)日：2008-05-29

    申请号：US11937280

    申请日：2007-11-08

    申请人： Thomas Kuepper ,  Lars Bewig ,  Christoph Moelle ,  Lars Brandt ,  Thomas Niklos

    发明人： Thomas Kuepper ,  Lars Bewig ,  Christoph Moelle ,  Lars Brandt ,  Thomas Niklos

    IPC分类号： H05H1/24 ,  B05C11/00

    CPC分类号： C23C16/405 ,  C23C16/402 ,  C23C16/505 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32266

    摘要： The invention is based on the object of reducing the heating of substrates during plasma enhanced chemical vapor deposition. For this purpose, a method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in in the form of a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

    摘要翻译： 本发明基于在等离子体增强化学气相沉积期间减少衬底的加热的目的。 为此，提供了一种通过等离子体增强气相沉积来涂覆基板的方法和装置，其中待涂覆的基板的基板表面的至少部分周围环境被抽真空，并且具有起始物质的处理气体 对于涂层是允许的，其中通过在填充有工艺气体的衬底表面的周围的电磁能中辐射的等离子体来沉积涂层。 电磁能以多种脉冲序列的形式辐射，优选为微波或射频脉冲，其中多个脉冲通过第一次间隔在时间上间隔开，其中辐射的电磁能在中断期间被关闭，并且其中 脉冲序列之间的间隔至少比脉冲序列内脉冲之间的第一次间隔长3倍，优选至少5倍。