公开(公告)号：US08384029B2

公开(公告)日：2013-02-26

申请号：US12994344

申请日：2009-06-16

Applicant: Rainer Knippelmeyer ,  Lawrence Scipioni ,  Christoph Riedesel ,  John Morgan ,  Ulrich Mantz ,  Ulrich Wagemann

Inventor： Rainer Knippelmeyer ,  Lawrence Scipioni ,  Christoph Riedesel ,  John Morgan ,  Ulrich Mantz ,  Ulrich Wagemann

IPC: G01N1/28 ,  G01N23/00 ,  H01L21/44

CPC classification number: G01N1/286 ,  H01J2237/0807 ,  H01J2237/304 ,  H01J2237/31745 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A first instrument (230) is used to image a first semiconductor article having a trench (110) of defined cross-section, while a second instrument (220) is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench (110) of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.

Abstract translation: 第一仪器（230）用于对具有限定横截面的沟槽（110）的第一半导体产品成像，而第二器械（220）用于同时制备具有限定横截面的沟槽的第二半导体产品 。 此外，公开了一种通过粗铣和随后的精细铣削在半导体制品中制备具有限定横截面的沟槽（110）的方法。

公开(公告)号：US20050035291A1

公开(公告)日：2005-02-17

申请号：US10889967

申请日：2004-07-13

Applicant: Raymond Hill ,  Colin Sanford ,  Lawrence Scipioni ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Colin Sanford ,  Lawrence Scipioni ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/141 ,  H01J37/02 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作，使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号，不管产生的磁场的强度如何，使得当磁场改变时，系统不需要时间稳定。

公开(公告)号：US20120068067A1

公开(公告)日：2012-03-22

申请号：US13276879

申请日：2011-10-19

Applicant: Lawrence Scipioni

Inventor： Lawrence Scipioni

IPC: H01J37/26

CPC classification number: H01J37/08 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/0453 ,  H01J2237/0653 ,  H01J2237/0802 ,  H01J2237/31732 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: The disclosure relates to ion beams systems, such as gas field ion microscopes, having multiple modes of operation, as well as related methods. In some embodiments, the disclosure provides a method of operating a gas field ion microscope system that includes a gas field ion source, where the gas field ion source includes a tip including a plurality of atoms.

Abstract translation: 本公开涉及具有多种操作模式的离子束系统，例如气体离子显微镜，以及相关方法。 在一些实施例中，本公开提供了一种操作包括气体离子源的气体场离子显微镜系统的方法，其中气体场离子源包括具有多个原子的尖端。

公开(公告)号：US06838668B2

公开(公告)日：2005-01-04

申请号：US10679100

申请日：2003-10-03

Applicant: Steve Berger ,  Lawrence Scipioni

Inventor： Steve Berger ,  Lawrence Scipioni

IPC: G01N23/225 ,  G01Q30/02 ,  H01J37/30 ,  H01J37/305 ,  H01L21/66 ,  G21K7/00 ,  G02N23/00

CPC classification number: H01J37/3005 ,  H01J37/3056

Abstract: A system for obtaining an image of a cross-sectional surface of a workpiece includes a shaped beam ion projection column oriented along a first axis. The ion projection column projects an image of an aperture on the workpiece surface, thereby excavating a portion of the surface and exposing a cross-sectional surface. Because the ion beam is not focused on the surface, a low brightness ion source can be used. A focused particle beam column, typically a scanning electron microscope, is oriented along a second axis that intersects the first axis at a selected angle. This focused particle beam column generates a particle beam that is used to image the cross-sectional surface exposed by the ion projection column.

公开(公告)号：US06727500B1

公开(公告)日：2004-04-27

申请号：US09513826

申请日：2000-02-25

Applicant: Steve Berger ,  Lawrence Scipioni

Inventor： Steve Berger ,  Lawrence Scipioni

IPC: G01N2300

CPC classification number: H01J37/3005 ,  H01J37/3056

Abstract: A system for obtaining an image of a cross-sectional surface of a workpiece includes a shaped beam ion projection column oriented along a first axis. The ion projection column projects an image of an aperture on the workpiece surface, thereby excavating a portion of the surface and exposing a cross-sectional surface. Because the ion beam is not focused on the surface, a low brightness ion source can be used. A focused particle beam column, typically a scanning electron microscope, is oriented along a second axis that intersects the first axis at a selected angle. This focused particle beam column generates a particle beam that is used to image the cross-sectional surface exposed by the ion projection column.

公开(公告)号：US08399864B2

公开(公告)日：2013-03-19

申请号：US13222536

申请日：2011-08-31

Applicant: Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/26 ,  H01J37/141

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

公开(公告)号：US20120085906A1

公开(公告)日：2012-04-12

申请号：US12994344

申请日：2009-06-16

Applicant: Rainer Knippelmeyer ,  Lawrence Scipioni ,  Christoph Riedesel ,  John Morgan ,  Ulrich Mantz ,  Ulrich Wagemann

Inventor： Rainer Knippelmeyer ,  Lawrence Scipioni ,  Christoph Riedesel ,  John Morgan ,  Ulrich Mantz ,  Ulrich Wagemann

IPC: G01N23/00 ,  G21K5/00 ,  G01N1/28

CPC classification number: G01N1/286 ,  H01J2237/0807 ,  H01J2237/304 ,  H01J2237/31745 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A first instrument (230) is used to image a first semiconductor article having a trench (110) of defined cross-section, while a second instrument (220) is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench (110) of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.

Abstract translation: 第一仪器（230）用于对具有限定横截面的沟槽（110）的第一半导体产品成像，而第二器械（220）用于同时制备具有限定横截面的沟槽的第二半导体产品 。 此外，公开了一种通过粗铣和随后的精细铣削在半导体制品中制备具有限定横截面的沟槽（110）的方法。

公开(公告)号：US08013311B2

公开(公告)日：2011-09-06

申请号：US12576914

申请日：2009-10-09

Applicant: Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/30 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作，使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号，不管产生的磁场的强度如何，使得当磁场改变时，系统不需要时间稳定。

公开(公告)号：US20110163068A1

公开(公告)日：2011-07-07

申请号：US12812221

申请日：2009-01-09

Applicant: Mark Utlaut ,  Noel Smith ,  Paul P. Tesch ,  Tom Miller ,  David H. Narum ,  David Tuggle ,  Lawrence Scipioni

Inventor： Mark Utlaut ,  Noel Smith ,  Paul P. Tesch ,  Tom Miller ,  David H. Narum ,  David Tuggle ,  Lawrence Scipioni

IPC: C23F1/08 ,  C23F1/00

CPC classification number: H01L21/0279 ,  G03F1/84 ,  H01J37/228 ,  H01J37/3007 ,  H01J37/3056 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/2633

Abstract: A multibeam system in which a charged particle beam and one or more additional beams can be directed to the target within a single vacuum chamber. A first beam colunm preferably produces a beam for rapid processing, and a second beam column produces a beam for more precise processing. A third beam column can be used to produce a beam useful for forming an image of the sample while producing little or no change in the sample.

Abstract translation: 多光束系统，其中带电粒子束和一个或多个附加光束可以在单个真空室内被引导到目标物。 第一光束镜筒优选地产生用于快速处理的光束，并且第二光束柱产生用于更精确处理的光束。 可以使用第三光束柱来产生用于形成样品图像的光束，同时产生很少或没有变化的样品。

公开(公告)号：US20090314939A1

公开(公告)日：2009-12-24

申请号：US12470316

申请日：2009-05-21

Applicant: Lewis A. Stern ,  Louis S. Farkas, III ,  Billy W. Ward ,  William DiNatale ,  John A. Notte, IV ,  Lawrence Scipioni

Inventor： Lewis A. Stern ,  Louis S. Farkas, III ,  Billy W. Ward ,  William DiNatale ,  John A. Notte, IV ,  Lawrence Scipioni

IPC: G01N23/225

CPC classification number: G01N23/2202 ,  G01N1/34 ,  G01N23/2255 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/2067

Abstract: Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less.

Abstract translation: 本文公开的方法包括：（a）将室中的样品暴露于第一气体，其中第一气体与样品上的表面污染物反应以形成第二气体; （b）从所述室中去除所述第二气体的至少一部分; 和（c）将样品暴露于带电粒子束以使多个颗粒离开样品并检测多个颗粒中的至少一些。 带电粒子束可以包括分子量为40原子质量以下的粒子。