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    Nanobio device of imitative anatomy structure
    1.
    发明授权
    Nanobio device of imitative anatomy structure 有权
    模拟解剖结构的Nanobio装置

    公开(公告)号：US07736893B2

    公开(公告)日：2010-06-15

    申请号：US11353603

    申请日：2006-02-14

    申请人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

    发明人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

    IPC分类号： C12N5/00

    CPC分类号： G01N33/5088 ,  Y10T436/11

    摘要： Objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.

    摘要翻译： 通过本发明实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织在高水平，并提供使用模拟解剖结构的纳米装置的方法。 本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。 在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

    Nanobio device of imitative anatomy structure
    2.
    发明申请
    Nanobio device of imitative anatomy structure 有权
    模拟解剖结构的Nanobio装置

    公开(公告)号：US20060188946A1

    公开(公告)日：2006-08-24

    申请号：US11353603

    申请日：2006-02-14

    申请人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

    发明人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

    IPC分类号： G01N33/567 ,  G01N33/53

    CPC分类号： G01N33/5088 ,  Y10T436/11

    摘要： objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.

    摘要翻译： 本发明要实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织成高水平，并且提供使用模拟解剖结构的纳米装置的方法。 本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。 在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

    Charged particle beam apparatus
    4.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US07442942B2

    公开(公告)日：2008-10-28

    申请号：US11509520

    申请日：2006-08-24

    申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    IPC分类号： H01J37/20

    CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

    Composite focused ion beam device, and processing observation method and processing method using the same
    6.
    发明授权
    Composite focused ion beam device, and processing observation method and processing method using the same 有权
    复合聚焦离子束装置及其加工方法及处理方法

    公开(公告)号：US08269194B2

    公开(公告)日：2012-09-18

    申请号：US12733089

    申请日：2008-08-06

    申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    IPC分类号： H01J49/00

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

    摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

    摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

    Charged particle beam apparatus
    8.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20070045560A1

    公开(公告)日：2007-03-01

    申请号：US11509520

    申请日：2006-08-24

    申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    IPC分类号： H01J37/20 ,  G01N1/28

    CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。