公开(公告)号：US06700916B1

公开(公告)日：2004-03-02

申请号：US10259212

申请日：2002-09-26

申请人： Matthias Kramer ,  Günter Nowinski ,  Juergen Kleinschmidt ,  Marcus Serwazi

发明人： Matthias Kramer ,  Günter Nowinski ,  Juergen Kleinschmidt ,  Marcus Serwazi

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  G03F7/70525 ,  H01S3/036 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/225

摘要： An E-Diagnostic system for monitoring a state of an excimer laser or molecular fluorine laser system includes a processing device and an interface. The processing device runs a program for outputting parameter requests to the laser system, receiving parameter values from the laser system in response to the parameter requests, and storing the parameter values such that a record of the state of the excimer or molecular fluorine laser system is kept. The interface signal-couples the processing device with the laser system permitting the outputting of the parameter requests and the receiving of the parameter values between the processing device and the laser system.

摘要翻译： 用于监测准分子激光或分子氟激光系统的状态的电子诊断系统包括处理装置和界面。 处理装置运行用于向激光系统输出参数请求的程序，响应于参数请求从激光系统接收参数值，并存储参数值，使得准分子或分子氟激光系统的状态记录为 保持 接口将处理装置与激光系统进行信号耦合，允许输出参数请求和接收处理装置与激光系统之间的参数值。

公开(公告)号：US06563853B2

公开(公告)日：2003-05-13

申请号：US09842281

申请日：2001-04-24

申请人： Peter Heist ,  Matthias Kramer ,  Juergen Kleinschmidt ,  Sergei Govorkov ,  Marcus Serwazi ,  Thomas Jünemann

发明人： Peter Heist ,  Matthias Kramer ,  Juergen Kleinschmidt ,  Sergei Govorkov ,  Marcus Serwazi ,  Thomas Jünemann

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/038 ,  H01S3/134 ,  H01S3/22 ,  H01S3/225 ,  H01S3/2258

摘要： An excimer or molecular fluorine laser system includes a discharge chamber containing a gas mixture, multiple electrodes connected to a power supply circuit for energizing the gas mixture, a resonator for generating a laser beam, a processor, and means for monitoring an amplified spontaneous emission (ASE) signal of the laser, such as preferably an ASE detector. The processor receives a signal from the preferred ASE detector indicative of the ASE signal of the laser. Based on the signal from the ASE detector, the processor determines whether to initiate a responsive action for adjusting a parameter of the laser system.

公开(公告)号：US06476987B1

公开(公告)日：2002-11-05

申请号：US09629256

申请日：2000-07-31

申请人： Juergen Kleinschmidt ,  Peter Heist ,  Matthias Kramer

发明人： Juergen Kleinschmidt ,  Peter Heist ,  Matthias Kramer

IPC分类号： G02B504

CPC分类号： G02B5/04 ,  H01S3/0811 ,  H01S3/223 ,  H01S3/225

摘要： A line narrowing unit for use within an excimer or molecular fluorine laser resonator includes a dispersive prism having antireflection coatings on entrance and exit surfaces. Entrance and exit angles and an apex angle are increased to enhance the dispersive power of the prism, while the antireflective coatings limit reflective losses. Preferably, a laser beam makes a non-symmetric pass through said prism. The apex angle is preferably greater than 65°, or even 75°, and the angle of incidence and the exit angle of the beam are each preferably greater than 65°. A beam expanding prism configured for enhanced beam expansion has an apex angle between within a range of 37.5° and 42.5°, and a beam incidence angle at the entrance surface of more than 65°, and an antireflection coating on preferably both the entrance and exit surfaces.

摘要翻译： 在准分子或分子氟激光谐振器内使用的线窄化单元包括在入射和出射表面上具有抗反射涂层的分散棱镜。 增加出入角和顶角以增强棱镜的分散力，而抗反射涂层则限制了反射损耗。 优选地，激光束使不对称通过所述棱镜。 顶角优选大于65°或甚至75°，并且梁的入射角和出射角各自优选地大于65°。 配置用于增强光束膨胀的光束扩张棱镜具有在37.5°和42.5°之间的范围内的顶角和大于65°的入射面处的光束入射角，并且优选地，入射和出射两者的抗反射涂层 表面。

公开(公告)号：US07075963B2

公开(公告)日：2006-07-11

申请号：US09771366

申请日：2001-01-25

申请人： Dirk Basting ,  Wolfgang Zschocke ,  Thomas Schröeder ,  Juergen Kleinschmidt ,  Matthias Kramer ,  Uwe Stamm

发明人： Dirk Basting ,  Wolfgang Zschocke ,  Thomas Schröeder ,  Juergen Kleinschmidt ,  Matthias Kramer ,  Uwe Stamm

IPC分类号： H01S3/22

CPC分类号： H01S3/08009 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/1062 ,  H01S3/225

摘要： A line-narrowing module for a laser includes a prism beam expander and a grating preferably attached to a heat sink. A pressure-controlled enclosure filled with an inert gas seals the grating and/or other elements of the line-narrowing module. The pressure in the enclosure is adjusted for tuning the wavelength. Preferably, the pressure is controlled by controlling the flow of an inert gas through the enclosure. A pump may be used, or an overpressure flow may be used. Alternatively, a prism of the beam expander or an etalon may be rotatable for tuning the wavelength.

公开(公告)号：US08410422B2

公开(公告)日：2013-04-02

申请号：US13436923

申请日：2012-03-31

申请人： Denis Bolshukhin ,  Alexander Christian Keller ,  Max Christian Schuermann ,  Guido Schriever ,  Imtiaz Ahmad ,  Juergen Kleinschmidt

发明人： Denis Bolshukhin ,  Alexander Christian Keller ,  Max Christian Schuermann ,  Guido Schriever ,  Imtiaz Ahmad ,  Juergen Kleinschmidt

IPC分类号： G12B13/00 ,  G01D18/00

CPC分类号： G03F7/70133 ,  G01J1/4257 ,  G01J1/429 ,  G03F7/70141 ,  G03F7/70166 ,  G03F7/7085 ,  H05G2/001

摘要： The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.

摘要翻译： 本发明涉及从等离子体发射的高能辐射的束束的特性的调整，特别是在半导体光刻中的应用。 为了获取和调整从等离子体发射并通过集光器光学聚焦的高能辐射束束的特性，在与垂直于等离子体的测量平面中的会聚束束的横截面上获取辐射的强度分布 光轴在收集器光学器件的中间焦点前方，并且强度值被记录在与光轴同心的不同半径对准的测量装置的接收区域的数量的限定扇区中，并且测量的量和控制变量是 由不同扇区的强度值的比较确定，用于对准收集器光学器件。

公开(公告)号：US07974321B2

公开(公告)日：2011-07-05

申请号：US11949924

申请日：2007-12-04

申请人： Jesko Brudermann ,  Juergen Kleinschmidt

发明人： Jesko Brudermann ,  Juergen Kleinschmidt

IPC分类号： H01S3/10

CPC分类号： G03B27/72 ,  G01J1/18 ,  G01J1/4257 ,  G01J11/00 ,  G03F7/70041 ,  G03F7/70558

摘要： The invention is directed to a method and an arrangement for stabilizing the average emitted radiation output of a pulsed radiation source. It is the object of the invention to find a novel possibility for stabilizing the average emitted radiation output of a pulsed radiation source which enables a reliable regulation even when there is no sufficiently reliable manipulated variable for influencing the emitted pulse energy (Ei). According to the invention, this object is met in that the individual pulse energy (Ei) of the current radiation pulse is measured, the deviation of the current individual pulse energy (Ei) from a previously determined target value (E0) is determined, and the pulse interval (Δti+1) preceding the triggering of the next radiation pulse is controlled depending on the magnitude of the deviation between the current individual pulse energy (Ei) and the target value (E0) of the pulse energy.

摘要翻译： 本发明涉及用于稳定脉冲辐射源的平均发射辐射输出的方法和装置。 本发明的目的是找到一种用于稳定脉冲辐射源的平均发射辐射输出的新颖可能性，即使当没有足够可靠的操纵变量来影响发射的脉冲能量（Ei）时，也能够进行可靠的调节。 根据本发明，满足目的在于测量当前辐射脉冲的单个脉冲能量（Ei）的目的，确定当前独立脉冲能量（Ei）与先前确定的目标值（E0）的偏差，以及 根据当前个体脉冲能量（Ei）与脉冲能量的目标值（E0）之间的偏差大小来控制触发下一个辐射脉冲之前的脉冲间隔（＆Dgr; ti + 1）。

公开(公告)号：US07595594B2

公开(公告)日：2009-09-29

申请号：US12041121

申请日：2008-03-03

申请人： Vladimir Korobochko ,  Alexander Keller ,  Juergen Kleinschmidt

发明人： Vladimir Korobochko ,  Alexander Keller ,  Juergen Kleinschmidt

IPC分类号： H05B31/26

CPC分类号： H05G2/003 ,  H05H1/52

摘要： The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for generating a hollow cathode plasma that permits a longer life of the cathodes of short wavelength-emitting gas discharge radiation sources and pseudospark switches, also in high-power operation. This object is met in that the metal wall between the hollow cathode space and the discharge space has a thickness on the order of the centimeter range so that the openings of the metal wall change into relatively long channels and in that substantially radially extending cooling channels are introduced in the metal wall to reduce the ion erosion of the metal wall of the hollow cathode through efficient cooling.

摘要翻译： 本发明涉及一种用于通过高压气体放电或用于产生气体放电等离子体发射EUV辐射来切换高电流的装置。 本发明的目的是发现一种产生中空阴极等离子体的新颖可能性，其允许短波长发射气体放电辐射源和伪脉冲开关的阴极在大功率操作中寿命更长。 满足这个目的在于，中空阴极空间和放电空间之间的金属壁具有大约厘米范围的厚度，使得金属壁的开口变成相对较长的通道，并且基本上径向延伸的冷却通道是 引入金属壁，以通过有效的冷却来减少空心阴极的金属壁的离子侵蚀。

公开(公告)号：US07531820B2

公开(公告)日：2009-05-12

申请号：US11426086

申请日：2006-06-23

申请人： Guido Hergenhan ,  Christian Ziener ,  Juergen Kleinschmidt

发明人： Guido Hergenhan ,  Christian Ziener ,  Juergen Kleinschmidt

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： The object of an arrangement and a method for the generation of extreme ultraviolet radiation is to construct the radiation source with an increased lifetime of the electrodes for using various emitters, wherein deposits inside the discharge chamber are reduced considerably when using metal emitters. The starting material is supplied as a continuous series of individual volumes which are introduced successively by directed injection and are pre-ionized by a pulsed energy beam. At least the electrode that is thermally loaded to a comparatively greater degree is constructed as a rotating electrode.

摘要翻译： 用于产生极紫外线辐射的装置和方法的目的是构建具有增加的电极使用寿命的辐射源，以使用各种发射器，其中当使用金属发射体时，放电室内的沉积物显着减少。 起始材料作为连续系列的单独体积供应，其通过定向注射连续引入并且通过脉冲能量束预电离。 至少将热负载到较大程度的电极构成为旋转电极。

公开(公告)号：US20060192157A1

公开(公告)日：2006-08-31

申请号：US11354324

申请日：2006-02-14

申请人： Kai Gaebel ,  Juergen Kleinschmidt

发明人： Kai Gaebel ,  Juergen Kleinschmidt

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/005

摘要： It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a starting material serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.

摘要翻译： 产生极紫外（EUV）辐射的装置和方法的目的是克服先前使用有效的金属发射体造成的障碍，从而可以优化转换效率，结果可以增加辐射输出 而不会缩短集光器和电极系统的使用寿命。 注射装置的注射喷嘴被引导到位于排放室中的排放区域。 注射喷嘴提供一系列单独的体积的起始材料，其用于以对应于气体放电的频率的重复率产生辐射。 此外，提供了在排出区域中连续蒸发各个体积。

公开(公告)号：US06801561B2

公开(公告)日：2004-10-05

申请号：US09960875

申请日：2001-09-21

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H01S3223

CPC分类号： H01S3/225 ,  H01S3/1055 ,  H01S3/106

摘要： An excimer or molecular fluorine laser system a wavefront compensating optic within its resonator for adjusting the curvature of the wavefront of the beam for compensating wavefront distortions and thereby enhancing the spectral purity of the beam. The wavefront compensating optic may be a plate, such as a null lens. One or both surfaces of the null lens may be adjustable and/or have an adjustable curvature for controlling the wavefront distortion compensation. A multi-compartment enclosure may be included having at least one optical component of the line-narrowing unit within each compartment. An atmosphere within at least one compartment is preferably controlled for controlling the spectral purity of the beam by controlling an amount of wavefront distortion compensation. The wavefront compensating optic may be sealably disposed between adjacent compartments.

摘要翻译： 准分子或分子氟激光系统在其谐振器内的波前补偿光学器件，用于调整波束的波前的曲率以补偿波前失真，从而增强光束的光谱纯度。 波前补偿光学元件可以是板，例如零透镜。 零透镜的一个或两个表面可以是可调节的和/或具有用于控制波前失真补偿的可调曲率。 可以包括多隔室外壳，其具有每个隔室内的线条变窄单元的至少一个光学部件。 优选地控制至少一个室内的气氛，以通过控制波前失真补偿量来控制光束的光谱纯度。 波前补偿光学元件可以密封地设置在相邻的隔室之间。