Method for inspecting filled state of via-holes filled with fillers and
apparatus for carrying out the method
    1.
    发明授权
    Method for inspecting filled state of via-holes filled with fillers and apparatus for carrying out the method 失效
    用于检查填充有填充物的通孔的填充状态的方法和用于执行该方法的装置

    公开(公告)号:US5015097A

    公开(公告)日:1991-05-14

    申请号:US416934

    申请日:1989-10-04

    摘要: A method for inspecting the filled state of a plurality of via-holes which pass through a non-conductive circuit board and are filled with a conductive substance and an apparatus for carrying out the method are disclosed.The surface of the circuit board is illuminated in two directions to generate shadows depending on the concave or convex state of the fillers in a plurality of via-holes. An optical image of the illuminated surface of the circuit board is detected. Each edge of the two shadow areas, which exist in the detected optical image and are generated in one via-hole by light irradiation in two directions, is detected. Whether the filler in this one via-hole is in the concave state or convex state is identified according to the mutual position relationship of the detected edges. The length of each shadow area is detected, and whether the concave state or convex state of the filler is within a predetermined allowance is decided according to the detection results. The area of the image of the filler is detected according to differences between the brightness of the board surface or of the via-hole wall and the brightness of the filler in the via-hole in the detected optical image, and whether the filler is lacking or not is decided according to the detection result.

    摘要翻译: 公开了一种用于检查通过非导电电路板并填充有导电物质的多个通孔的填充状态的方法和用于实施该方法的装置。 电路板的表面在两个方向上被照亮,以产生取决于多个通孔中的填料的凹凸状态的阴影。 检测电路板的被照射表面的光学图像。 检测存在于所检测的光学图像中并且在两个方向上通过光照射在一个通孔中产生的两个阴影区域的每个边缘。 根据检测到的边缘的相互位置关系来识别该通孔中的填充物是处于凹状还是凸状状态。 检测每个阴影区域的长度,根据检测结果确定填料的凹状或凸状状态是否处于预定的余量内。 根据检测到的光学图像中的基板表面或通孔壁的亮度与通孔中的填充物的亮度之间的差异来检测填充物的图像的面积,以及填充材料是否缺乏 是否根据检测结果决定。

    Method and device of inspecting three-dimensional shape defect
    2.
    发明授权
    Method and device of inspecting three-dimensional shape defect 失效
    检查三维形状缺陷的方法和装置

    公开(公告)号:US06072899A

    公开(公告)日:2000-06-06

    申请号:US12739

    申请日:1998-01-23

    摘要: A three-dimensional shaped defect inspecting method including a three-dimensional shape detection region selecting step for detecting a two-dimensional picture signal by taking a two-dimensional optical picture fluorescence emitted from a detection object and selecting a three-dimensional shape detection region in respect of the detection object based on the detected two-dimensional picture signal, and a three-dimensional shape determining step for detecting a picture signal by taking an optical picture in accordance with a height by reflected light from the detection object and sampling height information with a desired two-dimensional pixel size in respect of the selected three-dimensional shape inspection region with respect to the detected picture signal, thereby calculating and determining a three-dimensional shape, whereby a defect caused by a deficiency in thickness or the like on a wiring pattern of a solid shape, formed on a detection object of a circuit board or the like, can be detected in a short period of time, and its device.

    摘要翻译: 一种三维形缺陷检查方法,包括:三维形状检测区域选择步骤,用于通过从检测对象发出的二维光学图像荧光检测二维图像信号,并选择三维形状检测区域 基于检测到的二维图像信号对检测对象的尊重;以及三维形状确定步骤,用于通过根据来自检测对象的反射光和高度信息采集光学图像来检测图像信号,并且具有采样高度信息 相对于检测到的图像信号,对于所选择的三维形状检查区域的期望的二维像素尺寸,由此计算和确定三维形状,由此由于厚度等不足导致的缺陷 可以形成在电路板等的检测对象上的实心形状的布线图案 在短时间内被检测到,其设备。

    Method and apparatus for detecting defect in circuit pattern of a mask
for X-ray exposure
    4.
    发明授权
    Method and apparatus for detecting defect in circuit pattern of a mask for X-ray exposure 失效
    用于检测用于X射线曝光的掩模的电路图案中的缺陷的方法和装置

    公开(公告)号:US4814615A

    公开(公告)日:1989-03-21

    申请号:US45538

    申请日:1987-05-04

    摘要: In accordance with the present invention, there is provided a pattern defect detecting apparatus using a scanning and transmission electron microscope, comprising an electron gun for accelerating an electron beam with high energy enough to transmit it through a sample and for radiating the accelerated electron beam, a condenser lens for focusing the electron beam generated by said electron gun, a beam deflection coil for deflecting the electron beam focused by said condenser lens, an objective lens for further focusing the electron beam deflected by said beam deflection coil onto a fixed spot, an XY stage for disposing the sample so as to be opposed to said objective lens, said XY stage being movable in X and Y directions in a step and repeat manner, a sample chamber for housing the XY stage in vacuum, said sample chamber including at least the outlet of the electron beam of said objective lens, an electron beam detector for detecting electron beams transmitted through said sample, said electron beam detector being fixed to a stationary member such as said chamber or a lens barrel, and defect detecting means for scanning the electron beam by using said beam deflection coil for each step and repeat operation of said XY stage, for comparing a video signal obtained from said electron beam detector with a reference pattern read out from memory means, and for thereby detecting a defect of the sample.

    摘要翻译: 根据本发明,提供了一种使用扫描和透射电子显微镜的图案缺陷检测装置,其包括用于加速具有足够高能量的电子束以通过样品透射并用于辐射加速电子束的电子枪的电子枪, 用于聚焦由所述电子枪产生的电子束的聚光透镜,用于偏转由所述聚光透镜聚焦的电子束的光束偏转线圈,用于将由所述光束偏转线圈偏转的电子束进一步聚焦到固定点上的物镜, XY台,用于将样品设置为与所述物镜相对,所述XY台可以在X和Y方向上以一个步骤和重复的方式移动,用于在XY真空中容纳XY台的样品室,所述样品室至少包括 所述物镜的电子束的出口,用于检测透过所述样品的电子束的电子束检测器 d电子束检测器固定到诸如所述腔室或透镜镜筒之类的静止构件上,以及缺陷检测装置,用于通过每个步骤使用所述光束偏转线圈扫描电子束,并重复所述XY平台的操作,用于比较视频信号 从所述电子束检测器获得从存储装置读出的参考图案,从而检测样品的缺陷。

    Sample processing apparatus and method for removing charge on sample through light irradiation
    5.
    发明授权
    Sample processing apparatus and method for removing charge on sample through light irradiation 有权
    用于通过光照射去除样品上的电荷的样品处理装置和方法

    公开(公告)号:US06507029B1

    公开(公告)日:2003-01-14

    申请号:US09255700

    申请日:1999-02-23

    IPC分类号: H01J3730

    摘要: In an electron particle machine for observing, inspecting, processing or analyzing a semiconductor wafer as a substrate or a sample, a light source is installed in a preparation chamber. A chucking stage for chucking the semiconductor wafer with a chuck using static electricity is provided with parts for connecting to earth such that they are in contact with the chucked semiconductor wafer. After the chuck using static electricity is released after observation, inspection, process or analysis, a surface of the semiconductor wafer and the parts for connecting to earth are irradiated with light from the light source. This provides conductivity to the surface of the semiconductor wafer, so that charge accumulated on the semiconductor wafer is removed from the surface through the parts for connecting to earth.

    摘要翻译: 在用于观察,检查,处理或分析作为基板或样品的半导体晶片的电子粒子机中,将光源安装在准备室中。 使用静电用卡盘夹住半导体晶片的夹持台设置有用于连接到地面的部件,使得它们与夹持的半导体晶片接触。 在观察,检查,处理或分析之后释放使用静电的卡盘后,用来自光源的光照射半导体晶片的表面和用于连接到地球的部分。 这为半导体晶片的表面提供导电性,从而通过用于连接到地球的部件从表面去除积聚在半导体晶片上的电荷。

    Electron microscope
    6.
    发明授权
    Electron microscope 失效
    电子显微镜

    公开(公告)号:US4990776A

    公开(公告)日:1991-02-05

    申请号:US227645

    申请日:1988-08-03

    摘要: An auto-focusing electron microscope used for the observation, measurement and/or checking of a circuit pattern or the like comprises an objective lens capable of changing a focal position of an electron beam, an optical system for projecting a light and shade pattern having a light-permeable portion and a light-shielding portion onto the surface of a specimen through the objective lens, and a detector for detecting the projected pattern while optically reflecting it, whereby focusing can be made while reducing any damage and/or charging of the specimen.

    摘要翻译: 用于电路图案等的观察,测量和/或检查的自动聚焦电子显微镜包括能够改变电子束的焦点位置的物镜,用于投影具有 光透射部分和遮光部分通过物镜到样本表面上,以及用于在光学反射的同时检测投影图案的检测器,从而可以在减少样本的损伤和/或充电的同时进行聚焦 。

    Apparatus and method for detecting threats
    7.
    发明授权
    Apparatus and method for detecting threats 失效
    用于检测威胁的装置和方法

    公开(公告)号:US07260173B2

    公开(公告)日:2007-08-21

    申请号:US10372393

    申请日:2003-02-25

    IPC分类号: G01N23/083

    摘要: An image pickup unit is disposed so as to be able to obtain a scan projection image of an inspection subject from each of a vertical direction and a horizontal direction. An X-ray absorption coefficient of an object in the inspection subject is obtained from the vertical scan projection image and the horizontal scan projection image. It is determined whether there is a threat in the inspection subject on the basis of the X-ray absorption coefficient. Furthermore, a CT image is obtained by moving the image pickup unit around the inspection subject. It is determined whether there is a threat in the inspection subject, on the basis of the CT values of the CT image.

    摘要翻译: 一个图像拾取单元设置成能够从垂直方向和水平方向中的每一个获得检查对象的扫描投影图像。 从垂直扫描投影图像和水平扫描投影图像获得检查对象物体的X射线吸收系数。 根据X射线吸收系数确定检查对象是否存在威胁。 此外,通过使摄像单元围绕检查对象移动来获得CT图像。 根据CT图像的CT值确定检查对象是否存在威胁。

    X-ray tomography method and apparatus thereof
    8.
    发明授权
    X-ray tomography method and apparatus thereof 失效
    X射线层析成像方法及其装置

    公开(公告)号:US5351278A

    公开(公告)日:1994-09-27

    申请号:US29041

    申请日:1993-03-09

    摘要: This invention relates to an X-ray tomography apparatus and a method therefor. The apparatus comprises an X-ray source for irradiating X rays to an inspection object; inspection object an rotating arrangement for rotating the inspection object about a first rotational axis slanted to an, optical axis of X rays generated from the X-ray source; and an X-ray detecting arrangement where an X-ray image transmitted through the inspection object rotated by the inspection object rotating arrangement is rotated and superposed in synchronization with the inspection object rotated about second rotational axis in parallel to the first rotational axis, and the X-ray projection image outside of a focal plane perpendicular to the first rotational axis passing through an intersection of the optical axis and the first rotational axis is blurred and the X-ray tomographic image in the focal plane is detected as a clear image signal, thereby the X-ray tomographic image in the focal plane can be obtained based on the image signal obtained from the X-ray detecting arrangement.

    摘要翻译: 本发明涉及一种X射线断层摄影装置及其方法。 该装置包括用于将X射线照射到检查对象的X射线源; 检查对象用于使检查对象围绕从X射线源产生的X射线的光轴倾斜的第一旋转轴线旋转的旋转装置; 以及X检测装置,其中通过检查对象旋转装置旋转的检查对象透射的X射线图像与第一旋转轴平行旋转的检查对象旋转重叠,并且, 通过与光轴和第一旋转轴的交点相垂直的第一旋转轴的焦平面外的X射线投影图像被模糊,焦平面中的X射线断层图像被检测为清晰图像信号, 从而可以基于从X射线检测装置获得的图像信号来获得焦平面中的X射线断层图像。

    X-ray imaging system
    10.
    发明授权
    X-ray imaging system 失效
    X光成像系统

    公开(公告)号:US5629969A

    公开(公告)日:1997-05-13

    申请号:US404198

    申请日:1995-03-13

    申请人: Hiroya Koshishiba

    发明人: Hiroya Koshishiba

    摘要: In a micro focus X-ray imaging system using a transmission type target, a transmitted X-ray image is uniformly bright. The micro focus X-ray imaging system is structured so that (i) the fine focussed electron beam 1 is irradiated to a target in which a tungsten film 10 is deposited thinly on a beryllium foil 11, (ii) the tungsten film 10 is cooled by a circular thermoelectric cooling device 14, and (iii) an X-ray image intensifier 22 is installed other than on the prolonged line in a travel direction of the electron beam 1 and the transmitted X-ray image of a sample 7 is detected by the X-ray image intensifier 22 and the CCD camera 24. As a result thereof, in the case of a thin transmission-type target, intensive X-rays are generated in the travel direction of the electron beam and X-ray image intensifier is installed other than on the prolonged line in the travel direction of the electron beam, so that X-rays with a uniform intensity can be irradiated to the X-ray image intensifier and accordingly a transmitted X-ray image which is uniformly bright can be obtained.

    摘要翻译: 在使用透射型靶的微焦X射线成像系统中,透射的X射线图像是均匀亮的。 微焦X射线成像系统被构造成使得(i)将细聚焦电子束1照射到其上将钨膜10薄薄地沉积在铍箔11上的靶上,(ii)将钨膜10冷却 通过圆形热电冷却装置14,和(iii)在电子束1的行进方向上安装除了延长线以外的X射线图像增强器22,并且通过以下方式检测样品7的透射X射线图像: X射线图像增强器22和CCD摄像机24.其结果是,在薄型透射型靶的情况下,在电子束的行进方向上产生强烈的X射线,X射线图像增强器为 安装在电子束的行进方向以外的延长线上,能够对X射线图像增强器照射具有均匀强度的X射线,因此可以获得均匀亮的透射X射线图像 。