公开(公告)号：US06507029B1

公开(公告)日：2003-01-14

申请号：US09255700

申请日：1999-02-23

申请人： Norimasa Nishimura ,  Akira Shimase ,  Junzou Azuma ,  Asahiro Kuni ,  Hiroya Koshishiba

发明人： Norimasa Nishimura ,  Akira Shimase ,  Junzou Azuma ,  Asahiro Kuni ,  Hiroya Koshishiba

IPC分类号： H01J3730

CPC分类号： B82Y15/00 ,  H01J37/026 ,  H01J2237/0047 ,  H01J2237/28

摘要： In an electron particle machine for observing, inspecting, processing or analyzing a semiconductor wafer as a substrate or a sample, a light source is installed in a preparation chamber. A chucking stage for chucking the semiconductor wafer with a chuck using static electricity is provided with parts for connecting to earth such that they are in contact with the chucked semiconductor wafer. After the chuck using static electricity is released after observation, inspection, process or analysis, a surface of the semiconductor wafer and the parts for connecting to earth are irradiated with light from the light source. This provides conductivity to the surface of the semiconductor wafer, so that charge accumulated on the semiconductor wafer is removed from the surface through the parts for connecting to earth.

摘要翻译： 在用于观察，检查，处理或分析作为基板或样品的半导体晶片的电子粒子机中，将光源安装在准备室中。 使用静电用卡盘夹住半导体晶片的夹持台设置有用于连接到地面的部件，使得它们与夹持的半导体晶片接触。 在观察，检查，处理或分析之后释放使用静电的卡盘后，用来自光源的光照射半导体晶片的表面和用于连接到地球的部分。 这为半导体晶片的表面提供导电性，从而通过用于连接到地球的部件从表面去除积聚在半导体晶片上的电荷。

公开(公告)号：US06465781B1

公开(公告)日：2002-10-15

申请号：US09589065

申请日：2000-06-08

申请人： Norimasa Nishimura ,  Akira Shimase ,  Masahiro Watanabe ,  Asahiro Kuni ,  Taku Ninomiya ,  Hiroshi Miyai

发明人： Norimasa Nishimura ,  Akira Shimase ,  Masahiro Watanabe ,  Asahiro Kuni ,  Taku Ninomiya ,  Hiroshi Miyai

IPC分类号： G01N2300

CPC分类号： H01J37/026 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/2482 ,  H01J2237/2817

摘要： A method and an apparatus for inspecting or measuring a sample based on charged-particle beam are provided to relieve charge-up of the sample, so that high-quality electron image is obtained. A UV light irradiation optical system is controlled by an irradiation controller, scanning of the charged-particle beam is controlled by a scanning controller, and the irradiation controller and the scanning controller are controlled by a general controller. They are mutually synchronized, and a signal from an electron detector is imaged by an image slicing circuit and an image processing circuit.

摘要翻译： 提供了一种用于基于带电粒子束检查或测量样品的方法和装置，以减轻样品的电荷，从而获得高质量的电子图像。 UV照射光学系统由照射控制器控制，由扫描控制器控制带电粒子束的扫描，照射控制器和扫描控制器由通用控制器控制。 它们相互同步，并且来自电子检测器的信号由图像分割电路和图像处理电路成像。

公开(公告)号：US4814615A

公开(公告)日：1989-03-21

申请号：US45538

申请日：1987-05-04

申请人： Satoru Fushimi ,  Yasuo Nakagawa ,  Asahiro Kuni ,  Hitoshi Kubota ,  Hiroya Koshishiba

发明人： Satoru Fushimi ,  Yasuo Nakagawa ,  Asahiro Kuni ,  Hitoshi Kubota ,  Hiroya Koshishiba

IPC分类号： H01L21/66 ,  G01B15/00 ,  G01N23/02 ,  G02B21/00 ,  G03F1/00 ,  G03F1/84 ,  G03F1/86 ,  H01J37/26 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/86 ,  H01J37/3174 ,  H01J2237/2802 ,  H01J2237/31798

摘要： In accordance with the present invention, there is provided a pattern defect detecting apparatus using a scanning and transmission electron microscope, comprising an electron gun for accelerating an electron beam with high energy enough to transmit it through a sample and for radiating the accelerated electron beam, a condenser lens for focusing the electron beam generated by said electron gun, a beam deflection coil for deflecting the electron beam focused by said condenser lens, an objective lens for further focusing the electron beam deflected by said beam deflection coil onto a fixed spot, an XY stage for disposing the sample so as to be opposed to said objective lens, said XY stage being movable in X and Y directions in a step and repeat manner, a sample chamber for housing the XY stage in vacuum, said sample chamber including at least the outlet of the electron beam of said objective lens, an electron beam detector for detecting electron beams transmitted through said sample, said electron beam detector being fixed to a stationary member such as said chamber or a lens barrel, and defect detecting means for scanning the electron beam by using said beam deflection coil for each step and repeat operation of said XY stage, for comparing a video signal obtained from said electron beam detector with a reference pattern read out from memory means, and for thereby detecting a defect of the sample.

摘要翻译： 根据本发明，提供了一种使用扫描和透射电子显微镜的图案缺陷检测装置，其包括用于加速具有足够高能量的电子束以通过样品透射并用于辐射加速电子束的电子枪的电子枪， 用于聚焦由所述电子枪产生的电子束的聚光透镜，用于偏转由所述聚光透镜聚焦的电子束的光束偏转线圈，用于将由所述光束偏转线圈偏转的电子束进一步聚焦到固定点上的物镜， XY台，用于将样品设置为与所述物镜相对，所述XY台可以在X和Y方向上以一个步骤和重复的方式移动，用于在XY真空中容纳XY台的样品室，所述样品室至少包括 所述物镜的电子束的出口，用于检测透过所述样品的电子束的电子束检测器 d电子束检测器固定到诸如所述腔室或透镜镜筒之类的静止构件上，以及缺陷检测装置，用于通过每个步骤使用所述光束偏转线圈扫描电子束，并重复所述XY平台的操作，用于比较视频信号 从所述电子束检测器获得从存储装置读出的参考图案，从而检测样品的缺陷。

公开(公告)号：US06587581B1

公开(公告)日：2003-07-01

申请号：US09006371

申请日：1998-01-12

申请人： Yukio Matsuyama ,  Yuji Takagi ,  Takashi Hiroi ,  Maki Tanaka ,  Asahiro Kuni ,  Junzou Azuma ,  Shunji Maeda ,  Chie Shishido

发明人： Yukio Matsuyama ,  Yuji Takagi ,  Takashi Hiroi ,  Maki Tanaka ,  Asahiro Kuni ,  Junzou Azuma ,  Shunji Maeda ,  Chie Shishido

IPC分类号： G06K900

CPC分类号： G06T7/001 ,  G01N21/8851 ,  G01N21/95607 ,  G06T5/008 ,  G06T5/40 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/2817

摘要： The present invention provides a scanning electron microscope (SEM) or optical inspection method and apparatus which correct differences in brightness between comparison images and thus which is capable of detecting a fine defect with a high degree of reliability without causing any false defect detection. According to the present invention, the brightness values of a pattern, which should be essentially the same, contained in two detected images to be compared are corrected in such a manner that, even if there may be a brightness difference in a portion free from defects, the brightness difference is reduced to such a degree so that it can be recognized as a normal portion. Also, a limit for the amount of correction is furnished in advance, and correction exceeding such limit value is not performed. Such correction prevents the difference in brightness that should be permitted as non-defective from being falsely recognized as a defect without overlooking great differences in brightness due to a defect.

摘要翻译： 本发明提供了一种扫描电子显微镜（SEM）或光学检查方法和装置，其校正比较图像之间的亮度差异，从而能够以高可靠性检测精细缺陷而不引起任何假缺陷检测。 根据本发明，将要被比较的两个检测图像中包含的基本上相同的图案的亮度值以这样的方式进行校正：即使在没有缺陷的部分中可能存在亮度差 ，亮度差降低到这样的程度，从而可以将其识别为正常部分。 此外，预先提供校正量的限制，并且不执行超过该限制值的校正。 这样的校正可以防止由于缺陷而将不允许的亮度差错误地识别为缺陷，而不会因为缺陷而忽略亮度的很大差异。

公开(公告)号：US20080063257A1

公开(公告)日：2008-03-13

申请号：US11931693

申请日：2007-10-31

申请人： Takashi HIROI ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

发明人： Takashi HIROI ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

摘要： An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.

摘要翻译： 一种用于处理缺陷候选图像的装置，包括：用于拍摄样本的放大图像的成像器; 图像处理器，用于处理由成像器拍摄的图像以检测存在于样本上的缺陷候选，并将检测到的缺陷候选分类为多个缺陷类别中的一个; 存储器，用于存储包括缺陷候选图像和从图像处理器输出的分类缺陷类别数据的缺陷候选的信息; 以及显示单元，具有用于显示存储在存储器中的信息的显示屏幕，其中所述显示单元与存储在存储器中的缺陷类别数据一起显示缺陷候选的图像，并且显示的缺陷类别数据可在显示屏幕上变化， 并且存储器将存储的缺陷候选的缺陷类别数据改变为改变的缺陷类别数据。

公开(公告)号：US20070131877A9

公开(公告)日：2007-06-14

申请号：US10062666

申请日：2002-02-05

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Munenori Fukunishi ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Munenori Fukunishi ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mitsunobu Isobe

IPC分类号： G01N23/00

CPC分类号： G06K9/6211 ,  G01N23/22 ,  G06K9/033 ,  G06K2209/19 ,  G06T7/001 ,  G06T2207/30148

摘要： Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, the present invention, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, enables the retrieval of image data via an outside results confirmation system. Further, in the case of defect data of a plurality of substrates, it is enabled to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.

摘要翻译： 通常，由检查系统输出的缺陷数据仅包括诸如坐标数据，面积和投影长度的特征定量数据，并且仅有用于移动到缺陷位置的坐标数据可以被有效地利用。 相比之下，本发明通过使用除了特征定量数据之外的图像数据作为检查系统的缺陷数据，能够经由外部结果确认系统检索图像数据。 此外，在多个基板的缺陷数据的情况下，能够通过图像检索相似缺陷的事实在检查期间显示缺陷图像，并且检索结果被显示为趋势，使得可以在显示缺陷图像期间显示缺陷图像 通过搜索图像上的类似缺陷并将其显示为趋势，指定趋势上的基板，从而显示其缺陷图并指定缺陷图上的缺陷来进行检查。

公开(公告)号：US06898305B2

公开(公告)日：2005-05-24

申请号：US09791911

申请日：2001-02-22

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Asahiro Kuni ,  Maki Tanaka ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mari Nozoe

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Asahiro Kuni ,  Maki Tanaka ,  Hiroshi Miyai ,  Yasuhiko Nara ,  Mari Nozoe

IPC分类号： G01N23/225 ,  G01N21/956 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G06K9/00

CPC分类号： G06T7/001 ,  G01N21/95684 ,  G06T2207/10056 ,  G06T2207/30148

摘要： The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.

公开(公告)号：US20050080647A1

公开(公告)日：2005-04-14

申请号：US10929418

申请日：2004-08-31

申请人： Koji Okada ,  Tatsuya Suzuki ,  Asahiro Kuni

发明人： Koji Okada ,  Tatsuya Suzuki ,  Asahiro Kuni

IPC分类号： G06Q10/00 ,  G06Q10/06 ,  G06Q50/00 ,  G06F17/60

CPC分类号： G06Q10/06 ,  G06Q30/0203

摘要： In business process diagnosis, answers to questions is improved in their accuracy, and an accurate result of diagnosis is obtained. A computer diagnoses a business process of an organization based on answers to questions. The diagnosis includes a first answer reception step in which a first question sheet containing common questions is displayed to receive answers to said common questions and to receive questions proper to the organization, and then a second question sheet containing said common questions, said answers to the common questions, and said questions proper to the organization is generated; a second answer reception step in which said second question sheet is displayed to receive answers to said questions proper to the organization, and then a third question sheet containing said common questions, said answers to the common questions, said questions proper to the organization, and said answers to the questions proper to the organization is generated; and a diagnosis step in which the business process of said organization is diagnosed based on the answers to said common questions and the answers to said questions proper to the organization, with said answers to said common questions and said answers to said questions proper to the organization being filled in said third question sheet.

摘要翻译： 在业务流程诊断中，问题的答案在准确性方面得到改进，得到了准确的诊断结果。 计算机根据问题的答案诊断组织的业务流程。 诊断包括第一答案接收步骤，其中显示包含常见问题的第一问题单以接收对所述常见问题的答案并且接收适合于该组织的问题，然后包含包含所述常见问题的第二个问题单，对 共同的问题，并提出了适合组织的问题; 第二回答接收步骤，其中显示所述第二问题单以接收对组织适当的所述问题的答案，然后包含第三个问题单，其中包含所述常见问题，常见问题的答案，对组织适用的所述问题，以及 表示对组织适用的问题的答案是产生的; 以及诊断步骤，其中基于所述常见问题的答案和对组织适当的所述问题的答案来诊断所述组织的业务流程，所述答案涉及对所述组织适合的所述常见问题和所述问题的答案 填写在第三个问题单中。

公开(公告)号：US06614022B2

公开(公告)日：2003-09-02

申请号：US09908713

申请日：2001-07-20

申请人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

发明人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

IPC分类号： H01J37244

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2817

摘要： In the detecting system for irradiating the electron beam and detecting the secondary electron thereof, an area of the detector is an important factor for high-speed detection. For the technique of the current electron optical system and detector, a detector of the area larger than a constant area is necessary and detection of 200 Msps or more by receiving limitation on the frequency inversely proportional to the area is substantially difficult. For example, for detection at 400 Msps under the condition that the required area is 4 mm square and the rate for 4 mm square is defined as 150 Msps, four discrete high-speed detectors of 2 mm square are arranged to amplify and then add the signals for A/D conversion. Otherwise, the secondary electron is sequentially inputted to the detector of 8 mm square with the secondary electron deflector, the secondary electron is detected at 100 Msps and arranged after the A/D conversion. In any case, the area of 4 mm square and rate of 400 Msps can be attained.

摘要翻译： 在用于照射电子束并检测其二次电子的检测系统中，检测器的面积是高速检测的重要因素。 对于当前电子光学系统和检测器的技术，需要一个大于恒定面积的区域的检测器，并且通过接收与该区域成反比的频率的限制来检测200 Msps以上是非常困难的。例如，对于 在所需面积为4平方毫米，4平方毫米的速率定义为150 Msps的条件下，以400 Msps进行检测，放置4个离散高速2 mm的高速检测器，放大，然后将A / D转换。 否则，二次电子依次输入到具有二次电子偏转器的8mm正方形的检测器，二次电子以100Msps检测并且在A / D转换之后排列。 在任何情况下，可以获得4平方毫米的面积和400 Msps的面积。

公开(公告)号：US06376854B2

公开(公告)日：2002-04-23

申请号：US09848422

申请日：2001-05-04

申请人： Chie Shishido ,  Takashi Hiroi ,  Haruo Yoda ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Takanori Ninomiya ,  Hideaki Doi ,  Shunji Maeda ,  Mari Nozoe ,  Hiroyuki Shinoda ,  Atsuko Takafuji ,  Aritoshi Sugimoto ,  Yasutsugu Usami

发明人： Chie Shishido ,  Takashi Hiroi ,  Haruo Yoda ,  Masahiro Watanabe ,  Asahiro Kuni ,  Maki Tanaka ,  Takanori Ninomiya ,  Hideaki Doi ,  Shunji Maeda ,  Mari Nozoe ,  Hiroyuki Shinoda ,  Atsuko Takafuji ,  Aritoshi Sugimoto ,  Yasutsugu Usami

IPC分类号： G01N2188

CPC分类号： G01N21/95607

摘要： A method for inspecting a pattern formed on a substrate, includes the steps of moving a table along a first direction on which a substrate to be inspected is mounted, irradiating a converged electron beam on the substrate by scanning the converged electron beam along a second direction which is perpendicular to the first direction; detecting an electron radiated from the substrate by the irradiation of the converged electron beam in which the movement of the table and the scanning of the converged electron beam are synchronized; forming a digital image of the substrate from the detected electron; improving a quality of the digital image by filtering the digital image; and detecting a defect of a pattern formed on the substrate by using the improved quality digital image.

摘要翻译： 一种用于检查形成在基板上的图案的方法，包括以下步骤：沿着安装有待检查的基板的第一方向移动工作台，通过沿第二方向扫描会聚的电子束将会聚的电子束照射在基板上 其垂直于第一方向; 通过会聚电子束的照射来检测从基板辐射的电子，其中台的移动和会聚电子束的扫描同步; 从检测到的电子形成衬底的数字图像; 通过过滤数字图像来提高数字图像的质量; 以及通过使用改进的质量数字图像来检测在基板上形成的图案的缺陷。