Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer
    1.
    发明申请
    Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer 失效
    使用CMP剥离层和耐电层制造用于垂直记录的磁头的方法

    公开(公告)号:US20070026537A1

    公开(公告)日:2007-02-01

    申请号:US11184364

    申请日:2005-07-18

    IPC分类号: G11B5/33 H01L21/00

    CPC分类号: G11B5/3163 G11B5/1278

    摘要: A method using a CMP resistant hardmask in a process of fabricating a pole piece for a magnetic head is described. A set of layers used as the mask for milling the pole piece preferably includes a CMP resistant hardmask of silicon dioxide, a resist hardmask, an upper hardmask and a photoresist mask respectively. A multi-step reactive-ion etching (RIE) process is preferably used to sequentially remove the excess materials in the layer stack to ultimately define the multilayer mask for the pole piece. The excess pole piece material is then milled away. The wafer is then refilled with a nonmagnetic material such as alumina. A CMP liftoff is used to remove the resist hardmask. The material for the CMP resistant hardmask is selected to have a high resistance to the CMP liftoff process in comparison to the refill material. The CMP resistant hardmask is preferably then removed by a RIE process.

    摘要翻译: 描述了在制造用于磁头的极片的工艺中使用CMP耐磨硬掩模的方法。 作为用于研磨极片的掩模的一组层优选分别包括二氧化硅的CMP耐磨硬掩模,抗蚀剂硬掩模,上硬掩模和光致抗蚀剂掩模。 优选使用多步反应离子蚀刻(RIE)工艺来顺序地去除层叠中的多余材料以最终限定极片的多层掩模。 然后将多余的极片材料磨掉。 然后用非磁性材料如氧化铝再填充晶片。 CMP剥离用于去除抗蚀剂硬掩模。 选择用于CMP耐磨硬掩模的材料以与补充材料相比具有对CMP剥离工艺的高抗性。 然后优选通过RIE工艺去除CMP耐磨硬掩模。

    Fabricating thin-film magnetic recording heads using multi-layer DLC-type protective coatings
    2.
    发明申请
    Fabricating thin-film magnetic recording heads using multi-layer DLC-type protective coatings 审中-公开
    使用多层DLC型保护涂层制造薄膜磁记录头

    公开(公告)号:US20060286292A1

    公开(公告)日:2006-12-21

    申请号:US11151626

    申请日:2005-06-13

    IPC分类号: B05D5/12 C23C16/00

    摘要: An improved method of fabricating thin-film magnetic recording heads is disclosed. For the method, one or more layers for a feature (such as a read element, a write element, etc) are deposited and patterned. A layer of adhesion material is then deposited on the layers of the feature. The adhesion material provides better adhesion to a Diamond-Like Carbon (DLC) layer and to the underlying feature surface, such as monolithic Silicon (Si) or Titanium (Ti). A layer of DLC material is then deposited on the layer of adhesion material. The steps of depositing the layer of adhesion material and the layer of DLC material are repeated more than one time. Thus, more than one set of alternating layers of adhesion material and DLC material are deposited on the layers of the feature to form a multi-layer protective coating on the feature.

    摘要翻译: 公开了一种制造薄膜磁记录头的改进方法。 对于该方法,一个或多个特征层(如读取元素,写入元件等)被沉积和图案化。 然后将一层粘合材料沉积在特征层上。 粘合材料提供对类金刚石碳(DLC)层和底层特征表面(例如单片硅(Si)或钛(Ti))的更好的附着力。 然后将DLC材料层沉积在粘合材料层上。 沉积粘合材料层和DLC材料层的步骤重复一次以上。 因此,多于一组交替层的粘合材料和DLC材料沉积在特征层上,以在该特征上形成多层保护涂层。

    Process for self-aligned flare point and shield throat definition prior to main pole patterning
    7.
    发明授权
    Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
    在主极图案化之前,自对准耀斑和屏蔽喉定义的过程

    公开(公告)号:US07881010B2

    公开(公告)日:2011-02-01

    申请号:US11956277

    申请日:2007-12-13

    IPC分类号: G11B5/187

    摘要: A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译: 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上,然后将磁性材料沉积在写入极材料上,随后是非磁性材料。 形成第一掩模,其具有前边缘以限定次级火炬点的位置,并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替,并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge
    9.
    发明授权
    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
    具有磁写入磁极的垂直磁性写头具有凹形后缘

    公开(公告)号:US07576951B2

    公开(公告)日:2009-08-18

    申请号:US11411556

    申请日:2006-04-25

    IPC分类号: G11B5/127

    摘要: A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

    摘要翻译: 用于垂直磁记录的磁写头,具有带有凹后缘的写极。 磁性写入极可以具有梯形形状,其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽,并且如果包括后屏蔽,则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能,例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极,掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层,并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层,并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。