摘要:
A method for producing a semiconductor structure including preparing a semiconductor substrate, and generating a lower first, a middle second and an upper third masking layer on a surface of the semiconductor substrate. The method further includes forming at least one first window in the upper third masking layer, structuring the middle second masking layer using the first window for transferring the first window, structuring the lower first masking layer using the first window for transferring the first window, and enlarging the first window to form a second window. The method for further includes restructuring the middle second masking layer using the second window for transferring the second window, structuring the semiconductor substrate, using the structured lower third masking layer, restructuring the lower first masking layer using the second window, and restructuring the semiconductor substrate using the restructured lower third masking layer.
摘要:
A method for producing a semiconductor structure including preparing a semiconductor substrate, and generating a lower first, a middle second and an upper third masking layer on a surface of the semiconductor substrate. The method further includes forming at least one first window in the upper third masking layer, structuring the middle second masking layer using the first window for transferring the first window, structuring the lower first masking layer using the first window for transferring the first window, and enlarging the first window to form a second window. The method for further includes restructuring the middle second masking layer using the second window for transferring the second window, structuring the semiconductor substrate, using the structured lower third masking layer, restructuring the lower first masking layer using the second window, and restructuring the semiconductor substrate using the restructured lower third masking layer.
摘要:
An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the infrared radiation reflected from the substrate is measured at a multitude of measuring frequencies. An analyzing unit determines the respective reflectance and relative phase change and/or relative amplitude change in relation to the respective measuring frequency. In addition, a reflectance spectrum, a relative phase change spectrum and/or a relative amplitude change spectrum may be obtained. By performing a Fourier transformation of the respective spectrum, a secondary Fourier spectrum is obtained. The secondary Fourier spectrum plots a virtual amplitude against corresponding values of a frequency periodicity that correspond to a substrate depth. Peaks of the virtual amplitude may indicate reflective planes within the substrate at respective depths. Thus, rough sections in the trench profile may be identified without modeling.
摘要:
A method for controlling a process for fabricating integrated devices on a substrate. The method includes ex-situ and in-situ measurements of pre-etch and post-etch dimensions for structures formed on the substrate and uses the results of the measurements to adjust process recipes and to control the operational status of etch and external substrate processing equipment. In one exemplary application, the method is used during a multi-pass process for fabricating a capacitive structure of a trench capacitor.
摘要:
An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the infrared radiation reflected from the substrate is measured at a multitude of measuring frequencies. An analyzing unit determines the respective reflectance and relative phase change and/or relative amplitude change in relation to the respective measuring frequency. In addition, a reflectance spectrum, a relative phase change spectrum and/or a relative amplitude change spectrum may be obtained. By performing a Fourier transformation of the respective spectrum, a secondary Fourier spectrum is obtained. The secondary Fourier spectrum plots a virtual amplitude against corresponding values of a frequency periodicity that correspond to a substrate depth. Peaks of the virtual amplitude may indicate reflective planes within the substrate at respective depths. Thus, rough sections in the trench profile may be identified without modeling.
摘要:
An equalizing tank for a hydraulic motor vehicle brake system, with a housing including a housing upper part and a housing lower part, and with a device for monitoring the fluid level in the equalizing tank, the device including a switching unit which is fastened to the housing and has a plug-in connector and a contact carrier, a portion of which projects into a guide pipe which extends into an interior space of the tank, and a sensor element or switching element which is arranged on the contact carrier in the region of the guide pipe and which can be switched by a transmitter in a switching point at which the switching unit generates a signal for an electronic control unit.
摘要:
A method for optimizing the switching behaviour of a tank warning device of a compensation tank, in particular for a hydraulic motor-vehicle brake system, with a housing and the tank warning device for monitoring the tank filling level of the compensation tank. The tank warning device including a switching unit with a reed contact as a switching element, which can be switched by means of a magnet at a switching point S at which the switching unit generates a signal for an electronic control unit. A compensation tank including a tank warning device which has been optimized in terms of switching by means of a method according to the invention is also disclosed. The reed contact and the magnet are matched to one another in a manner optimized in terms of switching in such a way that the magnet switches at a single switching lobe of the reed contact.
摘要:
A method of preparing a chicory extract enriched with sesquiterpene lactones is provided. The method includes performing an initial extraction chicory in a polar solvent, such as methanol or ethanol, at ambient temperature to form an alcoholic extract. The alcoholic extract is subsequently defatted with a non-polar solvent, preferably hexane or n-heptane. A second extraction of the defatted alcoholic extract is performed with a solvent which is more polar than the solvent used in the defatting process and less polar than the solvent used in the initial extraction, for example, it can be chosen from the group consisting of ethyl acetate, n-butanol, isopropanol, n-propanol, dichloromethane, acetonitrile, and mixtures thereof; resulting in a sesquiterpene lactones enriched extract, preferably containing at least 60% sesquiterpene lactones.
摘要:
To fabricate a trench capacitor in a substrate, a trench is formed in the substrate. The trench has an upper region and a lower region. In the trench, first of all nanocrystallites and/or a seed layer for nanocrystallites are deposited in the upper region and the lower region. Then, the nanocrystallites and/or the seed layer are removed from the upper region of the trench by means of an etching process. The etching parameters of the etching process are selected in such a way that the seed layer and/or the nanocrystallites which are uncovered in the upper region and the lower region are removed only from the upper region. Consequently, an expensive mask layer can be avoided in the lower region of the trench.
摘要:
A method of preparing Pouteria lucuma extract was developed which comprises extracting oil from the nut. The lucuma nut oil (LNO) was effective to induce cell migration, enhance tissue regeneration and enhance wound healing. The lucuma nut oil provides an agent that is useful for therapeutic or cosmetic maintenance of skin and scalp.