-
公开(公告)号:US10056323B2
公开(公告)日:2018-08-21
申请号:US15302632
申请日:2014-04-24
Applicant: Renesas Electronics Corporation
Inventor: Kazuyuki Nakagawa , Shinji Baba , Takeumi Kato
IPC: H01L23/52 , H01L23/498 , H01L25/00 , H05K3/46 , H01L21/56 , H01L21/66 , H01L23/31 , H01L23/367 , H01L23/66 , H01L23/00
CPC classification number: H01L23/49838 , H01L21/56 , H01L22/14 , H01L23/3128 , H01L23/367 , H01L23/3675 , H01L23/49816 , H01L23/49822 , H01L23/49827 , H01L23/50 , H01L23/66 , H01L24/48 , H01L24/49 , H01L24/85 , H01L25/00 , H01L25/50 , H01L2223/6611 , H01L2223/6616 , H01L2224/13111 , H01L2224/13116 , H01L2224/13139 , H01L2224/13147 , H01L2224/16225 , H01L2224/32225 , H01L2224/45099 , H01L2224/48091 , H01L2224/48227 , H01L2224/73204 , H01L2224/73253 , H01L2224/73265 , H01L2924/00014 , H01L2924/014 , H01L2924/1517 , H01L2924/15311 , H01L2924/16195 , H01L2924/181 , H01L2924/19041 , H01L2924/19105 , H05K1/0225 , H05K1/0231 , H05K1/0253 , H05K3/46 , H01L2924/00012 , H01L2924/00
Abstract: A semiconductor device includes a wiring substrate including wiring layers, a semiconductor chip including electrode pads and mounted on the wiring substrate, and a first capacitor including a first electrode and a second electrode, and mounted on the wiring substrate. The wiring layers include a first wiring layer including a first terminal pad electrically connected with the first electrode of the first capacitor and a second terminal pad electrically connected with the second electrode of the first capacitor; and a second wiring layer on an inner side by one layer from the first wiring layer of the wiring substrate and including a first conductor pattern having a larger area than each of the first terminal pad and the second terminal pad. The first conductor pattern includes a first opening in a region overlapping with each of the first terminal pad and the second terminal pad in the second wiring layer.
-
公开(公告)号:US10037966B2
公开(公告)日:2018-07-31
申请号:US15375072
申请日:2016-12-09
Applicant: Renesas Electronics Corporation
Inventor: Toshihiro Iwasaki , Takeumi Kato , Takanori Okita , Yoshikazu Shimote , Shinji Baba , Kazuyuki Nakagawa , Michitaka Kimura
IPC: H01L23/00 , H01L25/04 , H01L25/065 , H01L25/07 , H01L25/11 , H01L21/48 , H01L21/56 , H01L25/075
CPC classification number: H01L24/81 , H01L21/4853 , H01L21/563 , H01L23/49816 , H01L23/49838 , H01L24/03 , H01L24/04 , H01L24/05 , H01L24/11 , H01L24/14 , H01L24/16 , H01L24/17 , H01L24/32 , H01L24/75 , H01L24/83 , H01L24/94 , H01L25/043 , H01L25/0657 , H01L25/074 , H01L25/0756 , H01L25/117 , H01L2224/0345 , H01L2224/0346 , H01L2224/0347 , H01L2224/0361 , H01L2224/03622 , H01L2224/03912 , H01L2224/0401 , H01L2224/051 , H01L2224/056 , H01L2224/1132 , H01L2224/1147 , H01L2224/1181 , H01L2224/11849 , H01L2224/11901 , H01L2224/131 , H01L2224/1403 , H01L2224/14104 , H01L2224/14131 , H01L2224/1605 , H01L2224/1701 , H01L2224/1703 , H01L2224/73204 , H01L2224/75252 , H01L2224/75745 , H01L2224/75824 , H01L2224/8101 , H01L2224/81024 , H01L2224/81048 , H01L2224/81191 , H01L2224/81192 , H01L2224/81193 , H01L2224/81194 , H01L2224/81203 , H01L2224/81815 , H01L2224/81986 , H01L2224/831 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/14 , H01L2924/181 , H01L2924/3841 , H01L2224/81201 , H01L2924/00
Abstract: The joint reliability in flip chip bonding of a semiconductor device is enhanced. Prior to flip chip bonding, flux 9 is applied to the solder bumps 5a for flip chip bonding over a substrate and reflow/cleaning is carried out and then flip chip bonding is carried out. This makes is possible to thin the oxide film over the surfaces of the solder bumps 5a and make the oxide film uniform. As a result, it is possible to suppress the production of local solder protrusions to reduce the production of solder bridges during flip chip bonding and enhance the joint reliability in the flip chip bonding of the semiconductor device.
-
公开(公告)号:US11270971B2
公开(公告)日:2022-03-08
申请号:US16576424
申请日:2019-09-19
Applicant: RENESAS ELECTRONICS CORPORATION
Inventor: Kenji Ikura , Hideki Ishii , Takehiko Maeda , Takeumi Kato
IPC: H01L23/00 , H01L23/528
Abstract: A semiconductor device capable of suppressing propagation of a crack caused by a temperature cycle at a bonding part between a bonding pad and a bonding wire is provided. A semiconductor device according to an embodiment includes a semiconductor chip having bonding pads and bonding wires. The bonding pad includes a barrier layer and a bonding layer formed on the barrier layer and formed of a material containing aluminum. The bonding wire is bonded to the bonding pad and formed of a material containing copper. An intermetallic compound layer formed of an intermetallic compound containing copper and aluminum is formed so as to reach the barrier layer from the bonding wire in at least a part of the bonding part between the bonding pad and the bonding wire.
-
公开(公告)号:US10304768B2
公开(公告)日:2019-05-28
申请号:US15989771
申请日:2018-05-25
Applicant: RENESAS ELECTRONICS CORPORATION
Inventor: Kazuyuki Nakagawa , Shinji Baba , Takeumi Kato
IPC: H01L23/498 , H01L25/00 , H05K3/46 , H01L21/56 , H01L21/66 , H01L23/31 , H01L23/367 , H01L23/66 , H01L23/00 , H01L23/50 , H05K1/02
Abstract: A semiconductor device includes a wiring substrate including wiring layers, a semiconductor chip including electrode pads and mounted on the wiring substrate, and a first capacitor including a first electrode and a second electrode, and mounted on the wiring substrate. The wiring layers include a first wiring layer including a first terminal pad electrically connected with the first electrode of the first capacitor and a second terminal pad electrically connected with the second electrode of the first capacitor; and a second wiring layer on an inner side by one layer from the first wiring layer of the wiring substrate and including a first conductor pattern having a larger area than each of the first terminal pad and the second terminal pad. The first conductor pattern includes a first opening in a region overlapping with each of the first terminal pad and the second terminal pad in the second wiring layer.
-
-
-