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    Electrodes for fluorine gas discharge lasers
    4.
    发明授权
    Electrodes for fluorine gas discharge lasers 有权
    氟气放电激光电极

    公开(公告)号：US07339973B2

    公开(公告)日：2008-03-04

    申请号：US10672182

    申请日：2003-09-26

    申请人： Richard G. Morton ,  Bryan Moosman ,  Timothy S. Dyer ,  James A. Carmichael ,  Jiping Zhang

    发明人： Richard G. Morton ,  Bryan Moosman ,  Timothy S. Dyer ,  James A. Carmichael ,  Jiping Zhang

    IPC分类号： H01S3/097 ,  H01S3/22

    CPC分类号： H01S3/0385 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0384 ,  H01S3/0388 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/2251

    摘要： Fluorine gas discharge laser electrodes and electrode systems that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition electrodes may comprise a first discharge shaping magnet mounted in a first elongated gas discharge electrode and a second discharge shaping magnet mounted in a second elongated gas discharge electrode. Also is an electrode may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the electrode and a pair of elongated high erosion regions on either side of the crown comprising a second material with a relatively higher erosion rate during gas discharge than that of the first material.

    摘要翻译： 氟气放电激光电极和电极系统，其可以包括延伸小于第二细长气体放电电极的相应长度的多个电流返回脚。 此外，电极可以包括安装在第一细长气体放电电极中的第一放电成形磁体和安装在第二细长气体放电电极中的第二放电成形磁体。 电极还可以包括跨越一对侧壁和一对端壁之间的中心线轴线的冠，包括形成电极的放电区域的至少一部分的第一材料和一对细长的高侵蚀区域 在冠的任一侧包括在气体放电期间具有比第一材料的侵蚀速率更高的侵蚀速率的第二材料。

    Gas discharge laser chamber improvements
    5.
    发明申请
    Gas discharge laser chamber improvements 有权

    公开(公告)号：US20050226301A1

    公开(公告)日：2005-10-13

    申请号：US10815387

    申请日：2004-03-31

    申请人： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

    发明人： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

    IPC分类号： H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225

    CPC分类号： H01S3/036 ,  H01S3/0384 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/225

    摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

    Very high repetition rate narrow band gas discharge laser system
    6.
    发明授权
    Very high repetition rate narrow band gas discharge laser system 失效

    公开(公告)号：US07006547B2

    公开(公告)日：2006-02-28

    申请号：US10815386

    申请日：2004-03-31

    申请人： Thomas D. Steiger ,  Edward P. Holtaway ,  Bryan Moosman ,  Rajasekhar M. Rao

    发明人： Thomas D. Steiger ,  Edward P. Holtaway ,  Bryan Moosman ,  Rajasekhar M. Rao

    IPC分类号： H01S3/22

    CPC分类号： H01S3/038 ,  H01S3/0057 ,  H01S3/07 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/2333

    摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.

    Halogen gas discharge laser electrodes
    7.
    发明申请
    Halogen gas discharge laser electrodes 有权

    公开(公告)号：US20050047471A1

    公开(公告)日：2005-03-03

    申请号：US10877737

    申请日：2004-06-25

    申请人： Thomas Steiger ,  Richard Ujazdowski ,  Timothy Dyer ,  Thomas Duffey ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Brian Strate

    发明人： Thomas Steiger ,  Richard Ujazdowski ,  Timothy Dyer ,  Thomas Duffey ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Brian Strate

    IPC分类号： H01S20060101 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225

    CPC分类号： H01S3/225 ,  H01S3/0381 ,  H01S3/0385 ,  H01S3/0388 ,  H01S3/0971 ,  H01S3/09713

    摘要： A method and apparatus for operating a gas discharge laser is disclosed which may comprise a laser chamber containing a laser gas, the laser gas comprising a halogen, two elongated electrode elements defining a cathode and an anode, each of the cathode and anode having an elongated discharge receiving region having a discharge receiving region width defining a width of an electric discharge between the electrode elements in the laser gas, the discharge receiving region defining two longitudinal edges, and the anode comprising: a first elongated anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region of the anode, a pair of second elongated anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an elongated electrode center base portion integral with the first elongated anode portion; and wherein each of the respective pair of second elongated anode portions is mechanically bonded to the center base portion. The electrode element may comprise a cathode. The first and second materials may be different materials such as different brass alloys with different erosion rates in the halogen gas. The first elongated cathode portion may comprising a first cathode material, located entirely within the discharge receiving region comprising a first portion of an ellipse intersecting elongated side walls, with a bottom wall opposite the portion of the ellipse; and a pair of second elongated cathode side portions comprising a second cathode material with the intersection of each respective second cathode portion and the portion of the ellipse forming the discharge receiving region of the first cathode portion, forming respective ellipsoidal extensions of the first portion. The members may be mechanically bonded to the center base portion. Some may be diffusion bonded to the center base portion and/or each other. The electrode assembly may have a hooded discharge receiving region extension at respective ends of the electrode and the electrode portion may be formed with or bonded to the center base portion and may have slanted side walls.

    Very high repetition rate narrow band gas discharge laser system
    9.
    发明申请
    Very high repetition rate narrow band gas discharge laser system 失效

    公开(公告)号：US20050226300A1

    公开(公告)日：2005-10-13

    申请号：US10815386

    申请日：2004-03-31

    申请人： Thomas Steiger ,  Edward Holtaway ,  Bryan Moosman ,  Rajasekhar Rao

    发明人： Thomas Steiger ,  Edward Holtaway ,  Bryan Moosman ,  Rajasekhar Rao

    IPC分类号： H01S3/00 ,  H01S3/038 ,  H01S3/097 ,  H01S3/104 ,  H01S3/13 ,  H01S3/22 ,  H01S3/23

    CPC分类号： H01S3/038 ,  H01S3/0057 ,  H01S3/07 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/2333

    摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.

    Very high repetition rate narrow band gas discharge laser system
    10.
    发明申请
    Very high repetition rate narrow band gas discharge laser system 审中-公开
    非常高的重复率窄带气体放电激光系统

    公开(公告)号：US20060209916A1

    公开(公告)日：2006-09-21

    申请号：US11363116

    申请日：2006-02-27

    申请人： Edward Holtaway ,  Bryan Moosman ,  Rajasekhar Rao

    发明人： Edward Holtaway ,  Bryan Moosman ,  Rajasekhar Rao

    IPC分类号： H01S3/22 ,  H01S3/223 ,  H01S3/03 ,  H01S3/097 ,  H01S3/081 ,  H01S3/08

    CPC分类号： H01S3/038 ,  H01S3/0057 ,  H01S3/07 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/2333

    摘要： A laser system and method is disclosed which may comprise a first line narrowed gas discharge laser system producing a first laser output light pulse beam at a pulse repetition rate of ≧2000 Hz; a second line narrowed gas discharge laser system producing a second laser output light pulse beam at a pulse repetition rate of ≧2000 Hz; a beam combiner combining the first and second output light pulse beams into a combined laser output light pulse beam with a ≧4000 Hz pulse repetition rate. The apparatus and method may comprise a compression head comprising a storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes.

    摘要翻译： 公开了一种激光系统和方法，其可以包括以脉冲重复率> = 2000Hz产生第一激光输出光脉冲束的第一线窄气体放电激光系统; 第二行窄气体放电激光系统以脉冲重复率> = 2000Hz产生第二激光输出光脉冲光束; 光束组合器，将第一和第二输出光脉冲光束组合成具有> = 4000Hz脉冲重复率的组合激光输出光脉冲光束。 该装置和方法可以包括压缩头，该压缩头包括以每秒x倍的速率充电的存储装置; 气体放电室，包括至少两组成对的气体放电电极; 至少两个磁饱和开关，分别连接在压缩头电荷存储装置和至少两组成对电极中的一个之间。