摘要:
A polymeric reaction product is disclosed that is a silylated polyamine-containing polymer having moieties from fatty acid moieties and/or chain extenders as difunctional organo moieties and free amine moieties and hydrolyzed and/or hydrolyzable organofunctional silane moieties and that is at least water dispersible. The reactants that produce this product are a polyamine-containing polymer with fatty acid moieties and free amine moieties and at least one amine-reactable organo functional alkoxysilane or its hydrolysis products. The former reactant results from the reaction of a polyamine-containing polymer with free amine moieties with fatty acids alone or in mixtures with other fatty acids and/or dimer acids. The polymeric reaction product is combined with a predominant amount of water to form a fiber treating formulation that can reside on the surface of one or more treated fibers.
摘要:
A method of forming a chemical mechanical polishing pad includes providing a first reactant including an isocyanate functional polyurethane prepolymer at a temperature above about 60° C., providing a second reactant including a diamine at a temperature above about 100° C., impingement mixing the first reactant and the second reactant within an impingement mixer to begin formation of a polyurea polyurethane elastomer, wherein the mixing is at a ratio of the first reactant to the second reactant of about 3:1 to about 6:1, casting the polyurea polyurethane elastomer that is formed from the mixed first and second reactants; and forming the polyurea polyurethane elastomer into chemical mechanical polishing pad dimensions. The polyurea polyurethane elastomer may further be provided with surface grooves and can be used as a single layer pad or formed into various stacked pad arrangements.
摘要:
The present invention relates to a polishing pad. In particular, the polishing pad of the present invention comprises a sublayer, a middle layer, and a top layer which can function as a polishing layer. The polishing pad of the present invention is useful for polishing articles and particularly useful for chemical mechanical polishing or planarization of a microelectronic device, such as a semiconductor wafer.
摘要:
The present invention relates to an article for altering a surface of a workpiece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane urea material can be prepared by combining polyisocyanate and/or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present invention is useful for polishing articles, and is especially useful for chemical mechanical polishing or planarization of microelectronic and optical electronic devices such as but not limited to semiconductor wafers. The window of the polishing pad is at least partially transparent and thus, can be particularly useful with polishing or planarizing tools that are equipped with through-the-platen wafer metrology.
摘要:
Aqueous peroxide-free size compositions for application to glass fibers contain, as essential components, a reaction product of a polymeric amine and an amine-reactable organosilane, a film-forming polymer and an emulsified polyolefin. The reaction product can be preformed or made in situ, and is preferably the product of a polyalkylene polyamine and an epoxy-functional alkoxysilane. An optional added component is a water-soluble, non-volatile carboxylic acid. Glass fibers treated with the size composition can be made into mats, especially continuous strand, needled mats, useful for reinforcing thermoplastic polymers such as polypropylene in laminates which then can be used in molding processes to make articles of good physical properties.
摘要:
A process for coating a non-conductive substrate, such as glass, ceramic or plastic, which comprises applying to the surface of the substrate a coating of a silylated polyamine-noble metal (SPNM) complex and then optionally bringing the coated substrate so obtained into contact with a solution containing a metal salt, such as a salt of nickel, cobalt or copper, to obtain plating of metal from the latter solution onto the surface of the substrate.
摘要:
A composite material consisting of continuous random glass mats with a new non-peroxide sizing chemistry, polypropylene and a functionalized polypropylene. This composite gives unexpectedly higher performance in bumper beam applications. The functionalized polypropylene contains anhydride functionalities, which are preferably maleic anhydride.
摘要:
Fibrous material including fibers, bundles of fibers, strands, roving, flakes and beads have a dried residue of a chemical treating composition for improved solvent resistance of polymers the fibrous materials reinforced. The chemical treated composition has at least one crosslinkable polyurethane, at least one organofunctional silane coupling agent, and acrylic copolymer with at least one addition polymerizable acrylic-type monomer and at least one monomer that is addition polymerizable and matrix resin miscible and reactable and a carrier. In addition, the chemical treating composition can have a polyurethane crosslinking agent in an effective amount to produce a dried residue of limited swellability from the chemical treatment, where the residue is a thin film on a substantial portion of the surface of the fibrous materials. Optionally, there may be present at least one low temperature antioxidant such as alkali metal and alkaline earth metal hypo or hydrogen phosphites. Also, there may be present in addition or in lieu of the first antioxidant a high temperature antioxidant such as: alkali metal or alkaline earth metal phenylphosphonates, thioethers like dialkyl thioalkylionate and processing aids such as epoxy polyester polymers.
摘要:
Polymeric-containing compositions having improved oxidative stability have the polymer and at least two stabilizing agents. These agents are selected from low temperature antioxidants such as alkali metal and alkaline earth metal hypo or hydrogen phosphites, high temperature antioxidants such as: alkali metal or alkaline earth metal phenylphosphonates, thioethers like dialkyl thioalkylionate and polymers thereof and metal deactivating agents like polydentate ligands and ethylene diamine-tetracidic acid compounds. The composition can be a coating composition for substrates including those like fibrous material including fibers, bundles of fibers, strands, roving, flakes and beads. The composition can be present as a dried residue on the substrate. For fibrous substrates, the composition also has at least one organofunctional silane coupling agent, may also have processing aids such as epoxy polyester polymers and/or lubricants. In addition, the polymeric-containing composition can have a crosslinking agent in an effective amount to produce a dried residue of limited swellability from the composition.
摘要:
A polishing pad is described as comprising, (a) particulate polymer which can be chosen from particulate thermoplastic polymer (e.g., particulate thermoplastic polyurethane), particulate crosslinked polymer (e.g., particulate crosslinked polyurethane and/or particulate crosslinked polyepoxide) and mixtures thereof; and (b) organic polymer binder (e.g., polyurethane binder and/or polyepoxide binder), which can bind the particulate polymer together, wherein said organic polymer binder can be prepared in-situ. The particulate polymer and organic polymer binder can be distributed substantially across the work surface the polishing pad, and the pad can have a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad.