Silylated polyamine polymers and a method of treating fibers
    1.
    发明授权
    Silylated polyamine polymers and a method of treating fibers 失效
    硅烷化聚胺聚合物和纤维的处理方法

    公开(公告)号:US5354829A

    公开(公告)日:1994-10-11

    申请号:US906960

    申请日:1992-06-30

    摘要: A polymeric reaction product is disclosed that is a silylated polyamine-containing polymer having moieties from fatty acid moieties and/or chain extenders as difunctional organo moieties and free amine moieties and hydrolyzed and/or hydrolyzable organofunctional silane moieties and that is at least water dispersible. The reactants that produce this product are a polyamine-containing polymer with fatty acid moieties and free amine moieties and at least one amine-reactable organo functional alkoxysilane or its hydrolysis products. The former reactant results from the reaction of a polyamine-containing polymer with free amine moieties with fatty acids alone or in mixtures with other fatty acids and/or dimer acids. The polymeric reaction product is combined with a predominant amount of water to form a fiber treating formulation that can reside on the surface of one or more treated fibers.

    摘要翻译: 公开了一种聚合反应产物,其是具有来自脂肪酸部分和/或扩链剂的部分作为双功能有机部分和游离胺部分以及水解和/或可水解的有机官能硅烷部分并且至少是水分散性的甲硅烷基化的含多胺的聚合物。 产生该产物的反应物是具有脂肪酸部分和游离胺部分的多胺聚合物和至少一种胺可反应的有机官能烷氧基硅烷或其水解产物。 前者反应物是由含多胺聚合物与游离胺部分与单独的脂肪酸或与其它脂肪酸和/或二聚酸的混合物的反应产生的。 将聚合反应产物与主要量的水混合以形成纤维处理制剂,其可以驻留在一种或多种经处理的纤维的表面上。

    METHOD OF FORMING A POLYUREA POLYURETHANE ELASTOMER CONTAINING CHEMICAL MECHANICAL POLISHING PAD
    2.
    发明申请
    METHOD OF FORMING A POLYUREA POLYURETHANE ELASTOMER CONTAINING CHEMICAL MECHANICAL POLISHING PAD 审中-公开
    形成含有化学机械抛光垫的聚氨酯聚氨酯弹性体的方法

    公开(公告)号:US20090094900A1

    公开(公告)日:2009-04-16

    申请号:US12194700

    申请日:2008-08-20

    IPC分类号: C09K3/14

    摘要: A method of forming a chemical mechanical polishing pad includes providing a first reactant including an isocyanate functional polyurethane prepolymer at a temperature above about 60° C., providing a second reactant including a diamine at a temperature above about 100° C., impingement mixing the first reactant and the second reactant within an impingement mixer to begin formation of a polyurea polyurethane elastomer, wherein the mixing is at a ratio of the first reactant to the second reactant of about 3:1 to about 6:1, casting the polyurea polyurethane elastomer that is formed from the mixed first and second reactants; and forming the polyurea polyurethane elastomer into chemical mechanical polishing pad dimensions. The polyurea polyurethane elastomer may further be provided with surface grooves and can be used as a single layer pad or formed into various stacked pad arrangements.

    摘要翻译: 形成化学机械抛光垫的方法包括在高于约60℃的温度下提供包含异氰酸酯官能化聚氨酯预聚物的第一反应物,在高于约100℃的温度下提供包含二胺的第二反应物, 第一反应物和第二反应物在冲击混合器内开始形成聚脲聚氨酯弹性体,其中所述混合以第一反应物与第二反应物的比例为约3:1至约6:1,将聚脲聚氨酯弹性体 由混合的第一和第二反应物形成; 并将聚脲聚氨酯弹性体形成化学机械抛光垫尺寸。 聚脲聚氨酯弹性体还可以设置有表面凹槽,并且可以用作单层垫或形成为各种堆叠垫布置。

    Polishing pad for planarization
    3.
    发明授权
    Polishing pad for planarization 失效
    抛光垫用于平坦化

    公开(公告)号:US06905402B2

    公开(公告)日:2005-06-14

    申请号:US10664860

    申请日:2003-09-22

    CPC分类号: B24B37/24 B24B37/22

    摘要: The present invention relates to a polishing pad. In particular, the polishing pad of the present invention comprises a sublayer, a middle layer, and a top layer which can function as a polishing layer. The polishing pad of the present invention is useful for polishing articles and particularly useful for chemical mechanical polishing or planarization of a microelectronic device, such as a semiconductor wafer.

    摘要翻译: 抛光垫技术领域本发明涉及一种抛光垫。 特别地,本发明的抛光垫包括可用作抛光层的子层,中间层和顶层。 本发明的抛光垫可用于抛光制品,并且特别适用于诸如半导体晶片的微电子器件的化学机械抛光或平面化。

    Polyurethane urea polishing pad
    4.
    发明授权
    Polyurethane urea polishing pad 失效
    聚氨酯尿素抛光垫

    公开(公告)号:US07291063B2

    公开(公告)日:2007-11-06

    申请号:US11489331

    申请日:2006-07-19

    IPC分类号: B24D11/00

    CPC分类号: B24B37/205 Y10T156/1057

    摘要: The present invention relates to an article for altering a surface of a workpiece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane urea material can be prepared by combining polyisocyanate and/or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present invention is useful for polishing articles, and is especially useful for chemical mechanical polishing or planarization of microelectronic and optical electronic devices such as but not limited to semiconductor wafers. The window of the polishing pad is at least partially transparent and thus, can be particularly useful with polishing or planarizing tools that are equipped with through-the-platen wafer metrology.

    摘要翻译: 本发明涉及用于改变工件表面的制品或具有窗口的抛光垫。 特别地,抛光垫包括聚氨酯脲材料,其中聚氨酯脲材料含有至少部分填充有气体的电池。 聚氨酯脲材料可以通过混合多异氰酸酯和/或聚氨酯预聚物,含羟基的材料,含胺材料和发泡剂来制备。 根据本发明的抛光垫可用于抛光制品,并且特别适用于微电子和光电子器件的化学机械抛光或平面化,例如但不限于半导体晶片。 抛光垫的窗口至少部分是透明的,因此,可以特别有用于抛光或平面化具有通过压板晶片计量的工具。

    Glass fiber size and mat
    5.
    发明授权
    Glass fiber size and mat 失效
    玻璃纤维尺寸和垫

    公开(公告)号:US5648169A

    公开(公告)日:1997-07-15

    申请号:US433583

    申请日:1995-05-03

    摘要: Aqueous peroxide-free size compositions for application to glass fibers contain, as essential components, a reaction product of a polymeric amine and an amine-reactable organosilane, a film-forming polymer and an emulsified polyolefin. The reaction product can be preformed or made in situ, and is preferably the product of a polyalkylene polyamine and an epoxy-functional alkoxysilane. An optional added component is a water-soluble, non-volatile carboxylic acid. Glass fibers treated with the size composition can be made into mats, especially continuous strand, needled mats, useful for reinforcing thermoplastic polymers such as polypropylene in laminates which then can be used in molding processes to make articles of good physical properties.

    摘要翻译: 用于玻璃纤维的无过氧化物大小的组合物含有聚合胺和胺可反应的有机硅烷,成膜聚合物和乳化聚烯烃的反应产物作为必要组分。 反应产物可以预先制备或原位制备,优选为聚亚烷基多胺和环氧官能的烷氧基硅烷的产物。 任选的添加组分是水溶性,不挥发性羧酸。 用尺寸组合物处理的玻璃纤维可以制成垫子,特别是连续的针刺垫,可用于增强层压材料中的热塑性聚合物如聚丙烯,然后可以将其用于模制过程中以制备具有良好物理性能的物品。

    Chemical treatment for fibers and reinforcement for polymer matrices
resulting in good solvent resistance
    8.
    发明授权
    Chemical treatment for fibers and reinforcement for polymer matrices resulting in good solvent resistance 失效
    纤维的化学处理和聚合物基体的增强,导致良好的耐溶剂性

    公开(公告)号:US5484656A

    公开(公告)日:1996-01-16

    申请号:US7407

    申请日:1993-01-22

    摘要: Fibrous material including fibers, bundles of fibers, strands, roving, flakes and beads have a dried residue of a chemical treating composition for improved solvent resistance of polymers the fibrous materials reinforced. The chemical treated composition has at least one crosslinkable polyurethane, at least one organofunctional silane coupling agent, and acrylic copolymer with at least one addition polymerizable acrylic-type monomer and at least one monomer that is addition polymerizable and matrix resin miscible and reactable and a carrier. In addition, the chemical treating composition can have a polyurethane crosslinking agent in an effective amount to produce a dried residue of limited swellability from the chemical treatment, where the residue is a thin film on a substantial portion of the surface of the fibrous materials. Optionally, there may be present at least one low temperature antioxidant such as alkali metal and alkaline earth metal hypo or hydrogen phosphites. Also, there may be present in addition or in lieu of the first antioxidant a high temperature antioxidant such as: alkali metal or alkaline earth metal phenylphosphonates, thioethers like dialkyl thioalkylionate and processing aids such as epoxy polyester polymers.

    摘要翻译: 包括纤维,纤维束,丝束,粗纱,薄片和珠粒的纤维材料具有化学处理组合物的干燥残余物,用于改善纤维材料增强的聚合物的耐溶剂性。 化学处理的组合物具有至少一种交联性聚氨酯,至少一种有机官能硅烷偶联剂和至少一种可加聚丙烯酸类单体的丙烯酸共聚物和至少一种可加成聚合的单体和基质树脂可混溶和可反应的载体 。 此外,化学处理组合物可以具有有效量的聚氨酯交联剂,以从化学处理产生有限溶胀性的干燥残余物,其中残余物是纤维材料表面的大部分上的薄膜。 任选地,可存在至少一种低温抗氧化剂,例如碱金属和碱土金属次氢或亚磷酸氢盐。 此外,除了第一抗氧化剂之外,还可以存在高温抗氧化剂,例如:碱金属或碱土金属苯基膦酸盐,硫醚如硫代烷基硫酸二烷基酯和加工助剂如环氧聚酯聚合物。

    Polishing pad
    10.
    发明授权

    公开(公告)号:US07097549B2

    公开(公告)日:2006-08-29

    申请号:US10317982

    申请日:2002-12-13

    摘要: A polishing pad is described as comprising, (a) particulate polymer which can be chosen from particulate thermoplastic polymer (e.g., particulate thermoplastic polyurethane), particulate crosslinked polymer (e.g., particulate crosslinked polyurethane and/or particulate crosslinked polyepoxide) and mixtures thereof; and (b) organic polymer binder (e.g., polyurethane binder and/or polyepoxide binder), which can bind the particulate polymer together, wherein said organic polymer binder can be prepared in-situ. The particulate polymer and organic polymer binder can be distributed substantially across the work surface the polishing pad, and the pad can have a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad.