公开(公告)号：US20180151395A1

公开(公告)日：2018-05-31

申请号：US15819550

申请日：2017-11-21

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： MIHYUN PARK ,  JUNG-MIN OH ,  INGI KIM ,  SEOHYUN KIM ,  TAE-HONG KIM ,  HYOSAN LEE

IPC分类号： H01L21/67 ,  H01L21/02 ,  H01L29/66 ,  H01L21/28 ,  H01L21/3105 ,  C11D1/12 ,  C11D3/43

CPC分类号： H01L21/67051 ,  C11D1/12 ,  C11D1/146 ,  C11D1/29 ,  C11D3/201 ,  C11D3/2017 ,  C11D3/2044 ,  C11D3/2068 ,  C11D3/28 ,  C11D3/32 ,  C11D3/3445 ,  C11D3/43 ,  C11D11/0047 ,  H01L21/02065 ,  H01L21/02074 ,  H01L21/28123 ,  H01L21/31053 ,  H01L21/67017 ,  H01L29/66545 ,  H01L29/66803 ,  H01L29/66818

摘要： A cleaning composition includes a surfactant, deionized (DI) water, and an organic solvent. The surfactant has a concentration of from about 0.03 M to about 0.003 M. A cleaning apparatus includes a chuck that receives a substrate, a nozzle for providing the cleaning composition onto the substrate. The cleaning apparatus further includes a chemical solution supply unit supplying the cleaning composition to the nozzle. The chemical solution supply unit mixes the cleaning composition to generate cleaning particles. The cleaning composition includes a surfactant, deionized (DI) water, and an organic solvent. The surfactant has a concentration of from about 0.03 M to about 0.003 M. A method for manufacturing a semiconductor device includes processing a substrate, forming an interlayer insulating layer, polishing an interlayer insulating layer, and providing a cleaning composition onto the interlayer insulating layer to remove first particles.

公开(公告)号：US20200079999A1

公开(公告)日：2020-03-12

申请号：US16387892

申请日：2019-04-18

申请人： Samsung Electronics Co., Ltd. ,  Soulbrain Co., Ltd.

发明人： Yongtae KIM ,  Junghun LIM ,  SOOJIN KIM ,  JUNG-MIN OH ,  SEUNGMIN JEON ,  HAYOUNG JEON

IPC分类号： C09K13/08 ,  H01L21/02 ,  H01L21/306 ,  H01L29/66 ,  H01L29/06 ,  H01L29/423 ,  H01L29/786

摘要： Provided are an etching composition and a method for manufacturing a semiconductor device using the same. According to embodiments, the etching composition may comprise from about 15 wt % to about 75 wt % of peracetic acid; a fluorine compound; an amine compound; and an organic solvent.

公开(公告)号：US20180028936A1

公开(公告)日：2018-02-01

申请号：US15482549

申请日：2017-04-07

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： JUNG-MIN OH ,  JI-HOON JEONG ,  DONG-GYUN HAN ,  KUN-TACK LEE ,  HYO-SAN LEE ,  YONG-MYUNG JUN

IPC分类号： B01D11/04 ,  B01D11/02

CPC分类号： B01D11/0407 ,  B01D11/0203 ,  B01D11/0403 ,  B01D11/0411 ,  G01N21/3554 ,  H01L21/02101 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67109 ,  H01L21/6719

摘要： A source supplier includes a source reservoir that contains a liquefied source fluid for a supercritical process, a vaporizer that vaporizes the liquefied source fluid into a gaseous source fluid under high pressure, a purifier that removes organic impurities and moistures from the gaseous source fluid and an analyzer connected to the purifier that analyzes an impurity fraction and a moisture fraction in the gaseous source fluid. Moisture and organic impurities are removed from the source fluid to reduce the moisture concentration of the supercritical fluid in the supercritical process.

公开(公告)号：US20160147277A1

公开(公告)日：2016-05-26

申请号：US14843768

申请日：2015-09-02

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： CHAN-WOOK PARK ,  SE-HO KIM ,  YOUNG-GWAN KIM ,  TAEK-HYUN KIM ,  JUNG-MIN OH ,  I-SAAC HONG

IPC分类号： G06F1/32

CPC分类号： G06F1/3206 ,  G06F1/206 ,  G06F1/324 ,  Y02D10/126 ,  Y02D10/16 ,  Y02D50/20

摘要： A processor and a semiconductor device including the same are provided. The processor includes an operation unit, an operation counter which measures a first operation pattern by counting first operations of the operation unit and measures a second operation pattern by counting second operations of the operation unit which are different from the first operations, a power measurement unit which calculates power consumption of the operation unit using a first weight for the first operation pattern and a second weight for the second operation pattern, and a frequency controller which adjusts an operating frequency used for the first or second operations by using the calculated power consumption.

摘要翻译： 提供了包括该处理器和半导体器件的处理器和半导体器件。 处理器包括操作单元，操作计数器，其通过对操作单元的第一操作进行计数来测量第一操作模式，并通过计数与第一操作不同的操作单元的第二操作来测量第二操作模式;功率测量单元 其使用第一操作模式的第一权重和第二操作模式的第二权重来计算操作单元的功耗;以及频率控制器，其通过使用所计算的功率消耗来调整用于第一或第二操作的操作频率。

公开(公告)号：US20160034021A1

公开(公告)日：2016-02-04

申请号：US14789236

申请日：2015-07-01

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： YOUNG-GWAN KIM ,  TAEK-HYUN KIM ,  HYUN-CHANG KIM ,  CHAN-WOOK PARK ,  JUNG-MIN OH

IPC分类号： G06F1/32 ,  G06T1/20

CPC分类号： G06F1/3293 ,  G06T1/20 ,  Y02D10/122

摘要： An image processing method includes receiving a first image rendered by a graphics processing unit (GPU) from the GPU, comparing the first image with a second image rendered by the GPU before the first image, and controlling a rendering frequency of the GPU based on a result of comparing the first image with the second image.

摘要翻译： 图像处理方法包括从GPU接收由图形处理单元（GPU）呈现的第一图像，将第一图像与第一图像之前的GPU渲染的第二图像进行比较，并且基于图像处理单元 将第一图像与第二图像进行比较的结果。