Biological electrode and manufacturing method thereof

    公开(公告)号:US11911161B2

    公开(公告)日:2024-02-27

    申请号:US17061762

    申请日:2020-10-02

    IPC分类号: A61B5/25

    摘要: The present invention provides a biological electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer includes a resin layer and particles dispersed in the resin layer, the particles being coated with gold, silver, or platinum, and a thickness of the resin layer is equal to or thinner than an average particle size of the particles. The biological electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, and can be manufactured at low cost.

    Bio-electrode and method for manufacturing the same

    公开(公告)号:US10950364B2

    公开(公告)日:2021-03-16

    申请号:US15484514

    申请日:2017-04-11

    摘要: The present invention provides a bio-electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer contains a resin layer and particles dispersed in the resin layer, the particles being coated with gold, platinum, silver, or alloy of these metals; a thickness of the resin layer is equal to or thinner than an average particle size of the particles; the resin layer contains a silicon-containing resin and a non-silicon-containing resin; and the silicon-containing resin is localized in the direction of a surface of the resin layer. The bio-electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, can be manufactured at low cost, and can combine repellency of the resin layer surface and adhesion properties of the resin layer to particles.

    Method for producing composition for forming coating film for lithography and patterning process

    公开(公告)号:US10591817B2

    公开(公告)日:2020-03-17

    申请号:US15079999

    申请日:2016-03-24

    摘要: The present invention provides a method for producing a composition for forming a coating film for a lithography used in manufacture of a semiconductor device by using a producing apparatus provided with a metal adsorbent and a filter, comprising the steps of: (1) introducing a solvent used in the composition into the producing apparatus, (2) circulating the solvent in the producing apparatus to adsorb a metal impurity by the metal adsorbent, (3) adding a raw material of the composition into the circulated solvent and homogenizing them to prepare the composition, and (4) circulating the prepared composition in the producing apparatus to remove a microscopic foreign matter by the filter. This method enables to produce a composition for forming a coating film for a lithography with its metal impurities, which cause an etching defect, extremely reduced.