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公开(公告)号：US12131836B2
公开(公告)日：2024-10-29
申请号：US17518453
申请日：2021-11-03
发明人： Shiori Nonaka , Koji Hasegawa , Osamu Watanabe , Jun Hatakeyama
摘要： A polyurethane contains a weakly acidic functional group having a pKa of 5 to 11. Thus, the present invention provides: a conductive paste composition for forming a stretchable conductive wire which varies slightly in electric conductivity at the time of elongation and shrinkage; and a polyurethane for providing the composition.
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公开(公告)号：US11786160B2
公开(公告)日：2023-10-17
申请号：US16272321
申请日：2019-02-11
CPC分类号： A61B5/25 , A61B5/6802 , C08L33/14 , C08L41/00 , A61B5/0245 , A61B2562/0215 , C08K3/041 , C08K3/08 , C08K2003/085 , C08K2003/0806 , C08K2003/0831 , C08K2003/0862 , C08K2201/001 , C08L2203/02
摘要： The present invention provides a bio-electrode composition comprising a polymer compound having a repeating unit A that contains silver salt of fluorosulfonic acid, silver salt of fluorosulfonimide, or silver salt of fluorosulfonamide. This can form a living body contact layer for a bio-electrode with excellent electric conductivity, biocompatibility and light weight, which can be manufactured at low cost and does not cause large lowering of the electric conductivity even when it is wetted with water or dried. The present invention also provides a bio-electrode in which the living body contact layer is formed from the bio-electrode composition and a method for manufacturing the bio-electrode.
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公开(公告)号：US11453741B2
公开(公告)日：2022-09-27
申请号：US16514068
申请日：2019-07-17
发明人： Jun Hatakeyama , Motoaki Iwabuchi , Joe Ikeda , Shiori Nonaka , Koji Hasegawa
摘要： The present invention is a stretchable film of a cured product of a resin including: a polymer compound having a urethane bond in the main chain, a repeating unit containing a fluorine atom, and a repeating unit containing a silicon atom. The present invention provides a stretchable film that has excellent stretchability and strength, with the film surface having excellent water repellency, and a method for forming the same.
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公开(公告)号：US10851188B2
公开(公告)日：2020-12-01
申请号：US15877771
申请日：2018-01-23
IPC分类号： C08F20/58 , C08F12/30 , C08F20/38 , H01B1/12 , C08F212/14 , C08F220/38 , C08F220/58 , C08F12/24 , C08F12/20 , C08F12/22
摘要： A polymer compound for a conductive polymer contains one or more kinds of repeating units “a” represented by the following general formula (1) and has a weight average molecular weight in the range of 1,000 to 500,000, R1 represents a hydrogen atom or a methyl group; Rf1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf1; Z1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(═O)—O—R2—; R2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R2; and “a” is 0
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公开(公告)号：US10457779B2
公开(公告)日：2019-10-29
申请号：US15457493
申请日：2017-03-13
IPC分类号： G03F7/023 , G03F7/031 , G03F7/037 , G03F7/038 , G03F7/38 , G03F7/40 , C08G73/10 , C08G73/12 , C07C69/76 , C07C69/88 , G03F7/022 , C07C69/92 , G03F7/004 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/32 , C09D179/08
摘要： The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X1 represents a tetravalent organic group; and R1 represents a group shown by the following general formula (2), wherein the dotted line represents a bond; Y1 represents an organic group with a valency of k+1; “k” represents 1 or 2; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition and usable as a base resin of a photosensitive resin composition.
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6.发明申请公开(公告)号：US20190298891A1
公开(公告)日：2019-10-03
申请号：US16351027
申请日：2019-03-12
摘要： The present invention provides a bio-electrode composition including: (A) an ionic material; and (B) a resin other than the component (A); wherein the component (A) contains both of a repeating unit-a having a structure of any of silver salts of fluorosulfonic acid, fluorosulfonimide, and fluorosulfonamide; and a repeating unit-b having silicon. This can form a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light in weight, manufacturable at low cost, and free from large lowering of the electric conductivity even when it is wetted with water or dried. The present invention also provides a bio-electrode in which the living body contact layer is formed from the bio-electrode composition, and a method for manufacturing the bio-electrode.
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公开(公告)号：US20190235381A1
公开(公告)日：2019-08-01
申请号：US16380093
申请日：2019-04-10
IPC分类号： G03F7/038 , G03F7/32 , C08F220/68 , G03F7/004 , C07D493/18 , C07D493/08 , C07D307/93 , G03F7/16 , G03F7/20 , C09D133/16 , C08F220/28 , C07C69/653
摘要： A monomer of formula (1a) or (1b) is provided wherein A is a polymerizabie group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon, group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
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公开(公告)号：US20180059543A1
公开(公告)日：2018-03-01
申请号：US15690846
申请日：2017-08-30
CPC分类号： G03F7/0045 , C07C309/02 , C07C309/20 , C07C381/12 , C07C2602/42 , C07C2603/68 , C07C2603/74 , C07D327/08 , C07D333/76 , C07D339/08 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/16 , G03F7/2004 , G03F7/2041 , G03F7/2053 , G03F7/322 , G03F7/325 , G03F7/38
摘要： A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.
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公开(公告)号：US09810983B2
公开(公告)日：2017-11-07
申请号：US15185195
申请日：2016-06-17
IPC分类号： G03F7/039 , C08F220/16 , C08F224/00 , G03F7/32 , C08F222/20 , G03F7/004 , G03F7/085
CPC分类号： G03F7/0392 , C08F220/16 , C08F220/20 , C08F220/30 , C08F222/20 , C08F224/00 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/085 , C08F2220/302 , C08F228/02
摘要： A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.
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公开(公告)号：US20170277037A1
公开(公告)日：2017-09-28
申请号：US15460454
申请日：2017-03-16
发明人： Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/039 , C08F220/28 , C08F220/36 , G03F7/32 , G03F7/004 , G03F7/20 , G03F7/38 , G03F7/16 , C08F220/30
CPC分类号： G03F7/039 , C08F220/28 , C08F220/30 , C08F220/36 , C08F220/52 , C08F226/06 , C08F2220/282 , C08F2220/283 , C08F2220/301 , C08F2220/365 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/162 , G03F7/168 , G03F7/2041 , G03F7/322 , G03F7/325 , G03F7/327 , G03F7/38
摘要： A resist composition is provided comprising a polymer comprising recurring units (a) having a succinimide structure and recurring units (b) containing a group capable of polarity switch with the aid of acid. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.
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