MICROELECTROMECHANICAL SENSOR DEVICE WITH REDUCED STRESS-SENSITIVITY AND CORRESPONDING MANUFACTURING PROCESS
    4.
    发明申请
    MICROELECTROMECHANICAL SENSOR DEVICE WITH REDUCED STRESS-SENSITIVITY AND CORRESPONDING MANUFACTURING PROCESS 有权
    具有降低应力敏感性的微电子传感器装置和相应的制造工艺

    公开(公告)号:US20170073220A1

    公开(公告)日:2017-03-16

    申请号:US15074755

    申请日:2016-03-18

    Abstract: A MEMS device is provided with: a supporting base, having a bottom surface in contact with an external environment; a sensor die, which is of semiconductor material and integrates a micromechanical detection structure; a sensor frame, which is arranged around the sensor die and is mechanically coupled to a top surface of the supporting base; and a cap, which is arranged above the sensor die and is mechanically coupled to a top surface of the sensor frame, a top surface of the cap being in contact with an external environment. The sensor die is mechanically decoupled from the sensor frame.

    Abstract translation: MEMS装置设置有:支撑基座,其具有与外部环境接触的底面; 传感器芯片,其是半导体材料并且集成了微机械检测结构; 传感器框架,其布置在所述传感器模具周围并且机械地联接到所述支撑基座的顶表面; 以及盖,其布置在传感器模具的上方并且机械地联接到传感器框架的顶表面,盖的顶表面与外部环境接触。 传感器模具与传感器框架机械分离。

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