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    OPTICAL FILTER SUBSTRATE AND DISPLAY DEVICE INCLUDING THE SAME
    2.
    发明申请
    OPTICAL FILTER SUBSTRATE AND DISPLAY DEVICE INCLUDING THE SAME 有权

    公开(公告)号：US20210249479A1

    公开(公告)日：2021-08-12

    申请号：US17242387

    申请日：2021-04-28

    Applicant: Samsung Display Co., Ltd.

    Inventor： Euisuk Jung ,  Jihyun Kim ,  Junhong Park ,  Jun Chun ,  Hoon Kang ,  Jeongmin Park

    IPC: H01L27/32 ,  H01L51/50 ,  H01L51/52 ,  H01L51/00 ,  G02B5/20

    Abstract: A display device includes an optical filter substrate including: a substrate; a first color filter on the substrate; a second color filter on the substrate, the second color filter spaced apart from the first color filter; a first color conversion element on the first color filter, the first color conversion element converting incident light into light of a first color; a second color conversion element on the second color filter, the second color conversion element converting the incident light into light of a second color; and a black matrix located between the first color conversion element and the second color conversion element, and between the first color filter and the second color filter.

    Display apparatus and method of manufacturing the same
    3.
    发明授权
    Display apparatus and method of manufacturing the same 有权

    公开(公告)号：US11088356B2

    公开(公告)日：2021-08-10

    申请号：US16707818

    申请日：2019-12-09

    Applicant: Samsung Display Co., Ltd.

    Inventor： Woongsik Kim ,  Taewook Kang ,  Jeongmin Park ,  Hyeyong Chu ,  Hoon Kang ,  Hyunju Kang ,  Janghyun Kim

    IPC: H01L51/56 ,  H01L51/52 ,  H01L51/00

    Abstract: In a method of manufacturing a display apparatus, the method includes: providing a first mother substrate; forming, on the first mother substrate, a pixel layer comprising a light-emitting device; providing a second mother substrate; forming, on the second mother substrate, a diffraction pattern layer configured to diffract light emitted from the light-emitting device; forming a bonded substrate structure by bonding the first mother substrate, on which the pixel layer is formed, and the second mother substrate, on which the diffraction pattern layer is formed; forming, by cutting the bonded substrate structure, a plurality of unit substrate structures each comprising a first substrate on which the pixel layer is formed and a second substrate on which the diffraction pattern layer is formed; forming a protection member on the diffraction pattern layer; and removing a foreign material on the diffraction pattern layer with the protection member.

    Liquid crystal display and manufacturing method thereof
    7.
    发明授权
    Liquid crystal display and manufacturing method thereof 有权
    液晶显示及其制造方法

    公开(公告)号：US09496295B2

    公开(公告)日：2016-11-15

    申请号：US14490355

    申请日：2014-09-18

    Applicant: Samsung Display Co., Ltd.

    Inventor： Koichi Sugitani ,  Hoon Kang ,  Yeun Tae Kim ,  Kyung Tae Chae

    IPC: H01L27/12 ,  G02F1/1334 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/1333

    CPC classification number: H01L27/1288 ,  G02F1/133377 ,  G02F1/1334 ,  G02F1/13439 ,  G02F1/136209 ,  G02F2201/07 ,  H01L27/1214

    Abstract: A method of manufacturing a liquid crystal display includes: forming a sacrificial layer by stacking a non-photosensitive resin; initiating formation of an etch stop layer on the sacrificial layer; forming a photoresist pattern; completing the etch stop layer using the photoresist pattern; ashing the photoresist pattern and the sacrificial layer by using the completed etch stop layer as a mask; forming a microcavity by removing the sacrificial layer; and forming a liquid crystal layer in the microcavity. The horizontal area occupied by the sacrificial layer is reduced by forming the common electrode or the etch stop layer at an upper side, thereby increasing the aperture ratio. Further, the vertical electric field is generated without distortion by horizontally forming the common electrode on the sacrificial layer and forming no common electrode on the sidewall thereof.

    Abstract translation: 一种制造液晶显示器的方法包括：通过堆叠非感光树脂形成牺牲层; 在所述牺牲层上引发蚀刻停止层的形成; 形成光致抗蚀剂图案; 使用光致抗蚀剂图案完成蚀刻停止层; 通过使用完成的蚀刻停止层作为掩模来灰化光致抗蚀剂图案和牺牲层; 通过去除牺牲层形成微腔; 并在微腔中形成液晶层。 通过在上侧形成公共电极或蚀刻停止层来减小由牺牲层占据的水平面积，从而增加开口率。 此外，垂直电场通过在牺牲层上水平形成公共电极而在其侧壁上不形成公共电极而产生失真。

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