Abstract:
A semiconductor device may include an interlayer insulating layer containing hydrogen and a first passivation layer configured to prevent or inhibit an out-gassing of the hydrogen. In the method, a second passivation layer configured to control a warpage characteristic of a wafer may be formed on the first passivation layer.
Abstract:
An apparatus for manufacturing semiconductor devices having a gas mixer includes a gas supply and a reaction chamber, and the gas supply includes an upper gas mixer, an intermediate gas mixer disposed under the upper gas mixer, a lower gas mixer disposed under the intermediate gas mixer, a first gas supply pipe which is disposed on an upper portion of the upper gas mixer and supplies a first gas to the upper gas mixer, a second gas supply pipe which is disposed on an upper end portion of a side surface of the upper gas mixer and supplies a second gas to the upper gas mixer, and a third gas supply pipe which is disposed on a side surface of the intermediate gas mixer and supplies a third gas to the intermediate gas mixer.
Abstract:
Example embodiments relate to a wiring structure, a method of forming the same, and an electronic device employing the same. The wiring structure includes a first conductive material layer and a nanocrystalline graphene layer on the first conductive material layer in direct contact with the metal layer.
Abstract:
A method of manufacturing a semiconductor device including forming a first sacrificial layer on a substrate, the first sacrificial layer including a conductive material, forming a second sacrificial layer on the first sacrificial layer, the second sacrificial layer including an insulating material, patterning the second sacrificial layer and the first sacrificial layer to form an opening successively penetrating the second and first sacrificial layers, conformally forming a seed layer on the second and first sacrificial layers including the opening, and forming a conductive pattern filling the opening having the seed layer by a plating process.
Abstract:
A semiconductor device may comprise a stack structure on a substrate, the stack structure including a plurality of dielectric layers and a plurality of transparent conductive oxide layers, the dielectric layers and the transparent conductive oxide layers are alternately stacked, each of the dielectric layers and a corresponding one of the transparent conductive oxide layer adjacent to each other in a vertical direction have equal horizontal widths, and a channel structure extending through the stack structure, the channel structure including an information storage layer, a channel layer inside the information storage layer, and a buried dielectric layer inside the channel layer.
Abstract:
The present disclosure relates to a membrane for flue gas separation containing a crosslinked, thermally rearranged poly(benzoxazole-co-imide) copolymer prepared simply by heat-treating a membrane prepared from an o-hydroxypolyimide copolymer having carboxylic acid groups such that thermal crosslinking and thermal rearrangement occur simultaneously or a membrane for flue gas separation containing a crosslinked, thermally rearranged poly(benzoxazole-co-imide) copolymer having a benzoxazole group content of less than 80% in the polymer chain, prepared from transesterification crosslinking of an o-hydroxypolyimide copolymer having carboxylic acid groups and a diol-based compound followed by thermal rearrangement, and a method for preparing the same.In accordance with the present disclosure, a crosslinked, thermally rearranged poly(benzoxazole-co-imide) copolymer membrane for flue gas separation can be prepared simply through heat treatment without requiring a complicated process such as chemical crosslinking, UV irradiation, etc. for forming a crosslinked structure and a membrane for flue gas separation prepared therefrom exhibits superior permeability and selectivity. Also, the method is applicable to commercial-scale production because the preparation process is simple.