SEMICONDUCTOR PACKAGE
    1.
    发明公开

    公开(公告)号:US20230420374A1

    公开(公告)日:2023-12-28

    申请号:US18303380

    申请日:2023-04-19

    CPC classification number: H01L23/5383 H01L25/16 H01L23/49816 H01L25/105

    Abstract: A semiconductor package includes a package substrate having a first side and an opposite second side, a semiconductor chip on the first side of the package substrate, a capacitor on the second side of the package substrate, a plurality of connecting terminals on the second side of the package substrate, and a metal line within a trench in the package substrate. The trench extends in a first direction, and the metal line is between the capacitor and the plurality of connecting terminals. The metal line is spaced apart from the capacitor in a second direction that is transverse to the first direction, and a distance between the metal line and the capacitor is 100 μm or more and 1000 μm or less.

    INITIATOR AND METHOD FOR DEBONDING WAFER SUPPORTING SYSTEM
    3.
    发明申请
    INITIATOR AND METHOD FOR DEBONDING WAFER SUPPORTING SYSTEM 有权
    阻尼支撑系统的起动器和方法

    公开(公告)号:US20160093518A1

    公开(公告)日:2016-03-31

    申请号:US14788783

    申请日:2015-06-30

    Abstract: Provided are an initiator and a method for debonding a wafer supporting system. The initiator for debonding a wafer supporting system includes a rotation chuck having an upper surface on which a wafer supporting system (WSS), which includes a carrier wafer, a device wafer, and a glue layer for bonding the carrier wafer and the device wafer to each other, is seated to rotate the wafer supporting system, a detecting module detecting a height and a thickness of the glue layer and a laser module generating a fracture portion on the glue layer through irradiating a side surface of the glue layer with a laser on the basis of the height and the thickness of the glue layer.

    Abstract translation: 提供了一种用于剥离晶片支撑系统的引发剂和方法。 用于剥离晶片支撑系统的启动器包括具有上表面的旋转卡盘,其上包括载体晶片的晶片支撑系统(WSS),器件晶片和用于将载体晶片和器件晶片接合的胶层 彼此坐下来旋转晶片支撑系统,检测模块检测胶层的高度和厚度;以及激光模块,其通过用激光照射胶层的侧表面而在胶层上产生断裂部分 胶层的高度和厚度的基础。

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