Process for the preparation of a composite material
    4.
    发明申请
    Process for the preparation of a composite material 审中-公开
    制备复合材料的方法

    公开(公告)号:US20070184187A1

    公开(公告)日:2007-08-09

    申请号:US10556081

    申请日:2004-05-10

    申请人: Shahab Jahromi

    发明人: Shahab Jahromi

    IPC分类号: C23C16/00

    CPC分类号: C23C14/12 C23C14/20

    摘要: The invention relates to a process for the preparation of a composite material comprising a substrate, a first layer and a second layer, comprising a first vapor-depositing step, wherein a first compound is vapor-deposited on the substrate, whereby the first layer is formed, and a second vapor-depositing step, wherein a second compound comprising a triazine compound is vapor-deposited on the first layer, whereby the second layer is formed, whereby the first and second vapor-depositing steps are carried out in such a way that the first layer comprises between 0 wt. % and 10 wt. % of a triazine compound.

    摘要翻译: 本发明涉及一种制备复合材料的方法,所述复合材料包括基底,第一层和第二层,包括第一气相沉积步骤,其中第一化合物气相沉积在所述基底上,由此所述第一层是 和第二气相沉积步骤,其中在所述第一层上气相沉积包含三嗪化合物的第二化合物,由此形成所述第二层,由此第一和第二气相沉积步骤以这种方式进行 第一层包含0wt。 %和10wt。 %的三嗪化合物。

    Method and apparatus for producing microchips
    5.
    发明申请
    Method and apparatus for producing microchips 审中-公开
    生产微芯片的方法和装置

    公开(公告)号:US20070105050A1

    公开(公告)日:2007-05-10

    申请号:US10578265

    申请日:2004-10-28

    IPC分类号: G03F7/20

    CPC分类号: G03F7/2041

    摘要: Method for producing microchips by using immersion lithography, wherein the immersion fluid comprises an additive so that the refractive index of the immersion fluid is increased relative to the fluid not comprising the additive. The exposure light in the method has improved resolution, so that microchips having an increased integration density are obtained. The invention also relates to the immersion fluid and an apparatus for immersion lithography, comprising the immersion fluid.

    摘要翻译: 通过浸渍光刻制造微芯片的方法,其中浸没流体包括添加剂,使得浸没流体的折射率相对于不包含添加剂的流体增加。 该方法中的曝光光分辨率提高,从而获得具有增加的积分密度的微芯片。 本发明还涉及浸没流体和用于浸没式光刻的装置,其包括浸没流体。

    Dissolution inhibitors in photoresist compositions for microlithography
    8.
    发明申请
    Dissolution inhibitors in photoresist compositions for microlithography 审中-公开
    用于微光刻的光致抗蚀剂组合物中的溶解抑制剂

    公开(公告)号:US20070134585A1

    公开(公告)日:2007-06-14

    申请号:US10565505

    申请日:2004-07-21

    IPC分类号: G03C1/00

    摘要: The invention relates to photoresist composition suitable for use at 10-165 nm comprising: (a) a polymeric binder (b) a photoactive compound (c) a dissolution inhibitor, the dissolution inhibitor comprising at least (i) two aromatic groups, (ii) fluorine and (iii) a blocked acid group which when unblocked has a pKa

    摘要翻译: 本发明涉及适用于10-165nm的光致抗蚀剂组合物,其包含:(a)聚合物粘合剂(b)光敏化合物(c)溶解抑制剂,所述溶解抑制剂至少包含(i)两个芳族基团, )氟和(iii)当未封闭时具有pKa <12的封闭酸基。 优选的溶解抑制剂是其中桥连碳原子被氟化脂肪族基团取代的双酚衍生物。

    Process for producing a nano-porous polymeric material, a polymer composition comprising nanoparticles of a chemical blowing agent, nanoparticles of a chemical blowing agent and a nano-porous polymeric material
    9.
    发明申请
    Process for producing a nano-porous polymeric material, a polymer composition comprising nanoparticles of a chemical blowing agent, nanoparticles of a chemical blowing agent and a nano-porous polymeric material 审中-公开
    用于生产纳米多孔聚合物材料的方法,包含化学发泡剂纳米颗粒的聚合物组合物,化学发泡剂的纳米颗粒和纳米多孔聚合物材料

    公开(公告)号:US20070110983A1

    公开(公告)日:2007-05-17

    申请号:US10582483

    申请日:2004-12-10

    申请人: Shahab Jahromi

    发明人: Shahab Jahromi

    IPC分类号: B05D3/02 C08F2/46

    摘要: Process for producing a nano-porous polymeric material, characterized in that the process comprises the steps of: a. incorporating a chemical blowing agent in the form of nano-particles in the polymeric material, b. decomposing the chemical blowing agent in its gaseous reaction products. The process may be used for the production of anti-reflective coatings, a bio-degradable scaffold for tissue engineering, an isolation coating, a dielectric interlayer, a membrane, a nano-reactor.

    摘要翻译: 制备纳米多孔聚合材料的方法,其特征在于该方法包括以下步骤:a。 在聚合物材料中掺入纳米颗粒形式的化学发泡剂,b。 在其气态反应产物中分解化学发泡剂。 该方法可用于生产抗反射涂层,用于组织工程的生物可降解支架,隔离涂层,电介质中间层,膜,纳米反应器。