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    Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive
    1.
    发明授权
    Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive 失效
    含有选择性羟基化合物添加剂的正醌二叠氮磺酸酯抗蚀剂组合物

    公开(公告)号：US5376497A

    公开(公告)日：1994-12-27

    申请号：US872245

    申请日：1992-04-22

    申请人： Shoji Kawata ,  Toshiaki Fujii ,  Teturyo Kusunoki ,  Motofumi Kashiwagi ,  Hiroshi Yagi ,  Kazuko Koito ,  Shinya Ikeda

    发明人： Shoji Kawata ,  Toshiaki Fujii ,  Teturyo Kusunoki ,  Motofumi Kashiwagi ,  Hiroshi Yagi ,  Kazuko Koito ,  Shinya Ikeda

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0226

    摘要： Disclosed herein is a positive resist composition comprising in admixture:(a) 100 parts by weight of an alkali-soluble phenolic resin;(b) 1-100 parts by weight of a photosensitive agent formed of a quinonediazide sulfonic acid ester;(c) 1-100 parts by weight of a hydroxy compound having a structure that at least part of its hydroxyl group(s) (--OH) has been modified by at least one conversion reaction selected from the group consisting of esterification with sulfonic acid (--OSO.sub.2 R), esterification with carboxylic acid (--OCOR) and etherification (--O--R), in which R means an alkyl, substituted alkyl, alkenyl, substituted alkenyl, aryl, substituted aryl, aralkyl or substituted aralkyl group; and(d) sufficient solvent to dissolve the foregoing composition components.

    摘要翻译： 本文公开了一种正型抗蚀剂组合物，其包含：（a）100重量份的碱溶性酚醛树脂; （b）1-100重量份由醌二叠氮磺酸酯形成的感光剂; （c）1-100重量份具有至少一部分羟基（-OH）的结构的羟基化合物已被至少一种选自由磺酸酯化的转化反应所修饰的羟基化合物 （-OSO 2 R），用羧酸酯化（-OCOR）和醚化（-OR），其中R表示烷基，取代的烷基，烯基，取代的烯基，芳基，取代的芳基，芳烷基或取代的芳烷基; 和（d）足够的溶剂以溶解上述组合物组分。

    Electron microscope and specimen analyzing method
    2.
    发明授权
    Electron microscope and specimen analyzing method 有权
    电子显微镜和样品分析方法

    公开(公告)号：US08664598B2

    公开(公告)日：2014-03-04

    申请号：US12931411

    申请日：2011-01-28

    申请人： Masakatsu Hasuda ,  Atsushi Uemoto ,  Toshiaki Fujii ,  Junichi Tashiro

    发明人： Masakatsu Hasuda ,  Atsushi Uemoto ,  Toshiaki Fujii ,  Junichi Tashiro

    IPC分类号： H01J37/29

    CPC分类号： G01N23/225 ,  H01J37/28

    摘要： An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam 1a.

    摘要翻译： 电子显微镜具有相对于电子束柱定位的聚焦离子束柱，使得聚焦离子束基本上垂直于电子束相交。 反向散射电子检测器相对于聚焦离子束柱定位，使得垂直于后向散射电子检测器的检测平面的方向基本上垂直于聚焦离子束的方向。 背散射电子检测器被配置和定位成通过照射具有电子束1a的部分来检测从该部分的表面以宽度至少约70度的扩散中释放的反向散射电子。

    Container and loader for substrate
    3.
    发明授权
    Container and loader for substrate 有权
    用于基材的容器和装载机

    公开(公告)号：US08348583B2

    公开(公告)日：2013-01-08

    申请号：US10036802

    申请日：2001-12-21

    申请人： Toshiaki Fujii ,  Osamu Horita ,  Koji Ohyama ,  Toshiya Nakayama ,  Fumio Sakiya ,  Mineo Kinpara

    发明人： Toshiaki Fujii ,  Osamu Horita ,  Koji Ohyama ,  Toshiya Nakayama ,  Fumio Sakiya ,  Mineo Kinpara

    IPC分类号： B65G49/07

    CPC分类号： H01L21/67772

    摘要： A loader is provided, which is disposed in a low cleanliness room along a border between the low cleanliness room and a high cleanliness room, for transporting a dust free article between an inside of a container receiving the dust free article and the high cleanliness room, comprising a movable stage for mounting the container; an opening portion through which the dust free article is transported between the container and the high cleanliness room; a door for opening and closing the opening portion; a unifying means for unifying a cover of the container and the door when the container approaches the door; and a driving apparatus for moving the cover and the door unified within the loader to open and close the opening portion and the container.

    摘要翻译： 提供一种装载机，其设置在低洁净室和低洁净室之间的边界的低洁净室中，用于在容纳无尘物品的容器的内部和高洁净室之间运送无尘物品， 包括用于安装所述容器的可移动台; 开口部分，无尘物品通过该开口部分在容器和高洁净室之间输送; 用于打开和关闭开口部分的门; 用于当容器接近门时统一容器和门的盖的统一装置; 以及驱动装置，用于将盖和门一体地移动到装载机内，以打开和关闭开口部分和容器。

    APPARATUS FOR WORKING AND OBSERVING SAMPLES AND METHOD OF WORKING AND OBSERVING CROSS SECTIONS
    7.
    发明申请
    APPARATUS FOR WORKING AND OBSERVING SAMPLES AND METHOD OF WORKING AND OBSERVING CROSS SECTIONS 有权
    用于工作和观察样本的工具及其工作方法和观察截面

    公开(公告)号：US20080224198A1

    公开(公告)日：2008-09-18

    申请号：US12047013

    申请日：2008-03-12

    申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

    发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

    IPC分类号： G01N23/225

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

    摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

    摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

    Skin preparations for external use
    8.
    发明授权
    Skin preparations for external use 有权
    外用皮肤准备

    公开(公告)号：US06939859B1

    公开(公告)日：2005-09-06

    申请号：US09937414

    申请日：2000-03-30

    申请人： Hironobu Murase ,  Toshiaki Fujii

    发明人： Hironobu Murase ,  Toshiaki Fujii

    IPC分类号： A01N43/04 ,  A01N43/16 ,  A61K31/35 ,  A61K31/70 ,  A61K31/7048 ,  A61P17/00 ,  A61P17/16 ,  A61P43/00 ,  C07H15/26 ,  C07H17/065

    CPC分类号： A61K8/602 ,  A61Q19/02 ,  A61Q19/08

    摘要： An dermatological agent for external use is disclosed which contains a chromanol glycoside represented by the following general formula (1) (wherein R1, R2, R3, and R4 which may be the same or different, each represent a hydrogen atom or a lower alkyl group, R5 represents a hydrogen atom, a lower alkyl group, or a lower acyl group, X represents a monosaccharic residue or an oligosaccharic residue optionally having the hydrogen atom of the hydroxyl group in the saccharic residue substituted with a lower alkyl group or a lower acyl group, n represents an integer in the range of 0-6, and m represents an integer in the range of 1-6). This is a novel dermatological agent for external use which excels in stability and percutaneous absorbency, manifests an effective action safely at a small application rate, and effectively prevents and cures the dermopathy. It is very useful as an agent for preventing and curing the disorders caused by the ultraviolet light, an agent for preventing and allaying the sedimentation of pigment in the skin, an agent for beautifying the skin in white, an agent for preventing the senescence of the skin, an agent for activating cells, an agent for preventing and curing the dermopathy, and a cosmetic preparation.

    摘要翻译： 公开了一种外用皮肤病药，其含有以下通式（1）表示的色原糊精糖苷（其中R 1，R 2，R 3，R 3， 和/或相同或不同的R 4各自表示氢原子或低级烷基，R 5表示氢原子，低级烷基 基团或低级酰基，X表示任选具有由低级烷基或低级酰基取代的糖残基中的羟基的氢原子的单糖残基或寡糖残基，n表示在 0-6，m表示1-6的整数。 这是一种外用的新型皮肤病学药剂，其稳定性和经皮吸收性优异，以小的施用率安全地显示出有效的作用，有效地防止并治愈了皮肤病。 作为用于预防和治疗由紫外线引起的疾病的药剂，用于预防和消除皮肤中色素沉淀的药剂，美白白皮肤剂，防止紫外线衰老的药剂是非常有用的 皮肤，活化细胞的药剂，用于预防和治愈皮肤病的药剂和化妆品制剂。

    Focused ion beam machining method and device thereof
    10.
    发明授权
    Focused ion beam machining method and device thereof 有权
    聚焦离子束加工方法及其装置

    公开(公告)号：US06300628B1

    公开(公告)日：2001-10-09

    申请号：US09207823

    申请日：1998-12-09

    申请人： Toshiaki Fujii ,  Yasuhiko Sugiyama ,  Toshio Doi

    发明人： Toshiaki Fujii ,  Yasuhiko Sugiyama ,  Toshio Doi

    IPC分类号： H01J37305

    CPC分类号： H01J37/3056

    摘要： A focused ion beam machining method for etching the surface of a sample to obtain a desired profile formation portion by recurrently irradiating a focused ion beam to a desired region of the sample, wherein the recurrently scanned region is enlarged with the elapse of time during the etching and scanning of the sample with the focused ion beam is performed in parallel with the profile formation portion, and the profile formation portion is scanned after all other portions of the recurrently scanned region have been scanned.

    摘要翻译： 一种聚焦离子束加工方法，用于通过将聚焦离子束循环照射到样品的期望区域来蚀刻样品的表面以获得期望的轮廓形成部分，其中循环扫描区域在蚀刻期间随着时间的推移而增大 并且与轮廓形成部分并行地进行与聚焦离子束的样品的扫描，并且在已经扫描了循环扫描区域的所有其它部分之后，扫描轮廓形成部分。