Semiconductor device, and manufacturing method thereof
    2.
    发明申请
    Semiconductor device, and manufacturing method thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US20050263771A1

    公开(公告)日:2005-12-01

    申请号:US11181923

    申请日:2005-07-15

    摘要: In a display device such as a liquid crystal display device, a large-sized display screen is realized under low power consumption. A surface of a source wiring line of a pixel portion employed in an active matrix type liquid crystal display device is processed by way of a plating process operation so as to lower a resistance value of this source wiring line. The source wiring line of the pixel portion is manufactured at a step different from a step for manufacturing a source wiring line of a drive circuit portion. Further, electrodes of a terminal portion are processed by a plating process operation so as to reduce a resistance value thereof.

    摘要翻译: 在诸如液晶显示装置的显示装置中,在低功耗下实现大尺寸显示屏。 在有源矩阵型液晶显示装置中采用的像素部分的源极布线的表面通过电镀处理操作进行处理,以降低该源极布线的电阻值。 像素部的源极配线与制造驱动电路部的源极配线的工序不同, 此外,通过电镀处理操作来处理端子部分的电极,以便降低其电阻值。

    SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
    4.
    发明申请
    SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF 有权
    半导体器件及其制造方法

    公开(公告)号:US20090146149A1

    公开(公告)日:2009-06-11

    申请号:US12323724

    申请日:2008-11-26

    IPC分类号: H01L33/00 H01L21/336

    摘要: In a display device such as a liquid crystal display device, a large-sized display screen is realized under low power consumption. A surface of a source wiring line of a pixel portion employed in an active matrix type liquid crystal display device is processed by way of a plating process operation so as to lower a resistance value of this source wiring line. The source wiring line of the pixel portion is manufactured at a step different from a step for manufacturing a source wiring line of a drive circuit portion. Further, electrodes of a terminal portion are processed by a plating process operation so as to reduce a resistance value thereof.

    摘要翻译: 在诸如液晶显示装置的显示装置中,在低功耗下实现大尺寸显示屏。 在有源矩阵型液晶显示装置中采用的像素部分的源极布线的表面通过电镀处理操作进行处理,以降低该源极布线的电阻值。 像素部的源极配线与制造驱动电路部的源极配线的工序不同, 此外,通过电镀处理操作来处理端子部分的电极,以便降低其电阻值。

    Semiconductor device, and manufacturing method thereof
    5.
    发明授权
    Semiconductor device, and manufacturing method thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US07459352B2

    公开(公告)日:2008-12-02

    申请号:US11181923

    申请日:2005-07-15

    IPC分类号: H01L21/84

    摘要: In a display device such as a liquid crystal display device, a large-sized display screen is realized under low power consumption. A surface of a source wiring line of a pixel portion employed in an active matrix type liquid crystal display device is processed by way of a plating process operation so as to lower a resistance value of this source wiring line. The source wiring line of the pixel portion is manufactured at a step different from a step for manufacturing a source wiring line of a drive circuit portion. Further, electrodes of a terminal portion are processed by a plating process operation so as to reduce a resistance value thereof.

    摘要翻译: 在诸如液晶显示装置的显示装置中,在低功耗下实现大尺寸显示屏。 在有源矩阵型液晶显示装置中采用的像素部分的源极布线的表面通过电镀处理操作进行处理,以降低该源极布线的电阻值。 像素部的源极配线与制造驱动电路部的源极配线的工序不同, 此外,通过电镀处理操作来处理端子部分的电极,以便降低其电阻值。