摘要:
Apparatus and methods are disclosed for utilizing a plasma cleaning operation of a CVD system incorporating cleaning process endpoint detection. In one embodiment, the cleaning process is performed at a constant exhaust capacity and the endpoint detection is in response to a specified rate of change of chamber pressure. In another embodiment, a servo-controlled exhaust system maintains a controlled chamber pressure and the endpoint detection is in response to a specified control signal. In a preferred embodiment, nitrogen trifluoride is converted into a plasma containing free fluorine radicals in a magnetron-powered remote microwave plasma generator. The remotely produced free fluorine radicals are used to remove silicon nitride deposits from a substrate processing chamber. The use of such a remote plasma system provides an efficient cleaning process that takes as little as half the time compared to similar in situ plasma cleaning processes. The incorporation of endpoint detection provides optimal cleaning time for the remote plasma cleaning process.
摘要:
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.
摘要:
An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between the inlet and the outlet. The apparatus is connected at its inlet to receive the exhaust of the substrate processing chamber, and the collection chamber is structured and arranged to collect particulate matter flowing through the fluid conduit and to inhibit egress of the particulate matter from the collection chamber. A microwave plasma generation system supplies microwave energy within the fluid conduit to form a plasma from etchant gases within the fluid conduit. Constituents from the plasma react with the particulate matter collected in the collection chamber to form gaseous products that may be pumped out of the fluid conduit. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.
摘要:
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.
摘要:
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.
摘要:
In some embodiments, a chip includes clock generation circuitry to create a clock signal, and reference signal oscillator circuitry to produce a reference signal with a higher frequency than the clock signal. The chip includes a counter to change a count value in response to changes in the reference signal; and count logic circuitry to cause count storage circuitry to read the count value in response to at least some changes in the clock signal and to make at least some of the values in the count storage circuitry related to a duty cycle of the clock signal available to an external tester. Other embodiments are described and claimed.
摘要:
A die includes circuit components to perform normal operations and duplicated components of selective ones of the circuit components. Each end of the duplicated components is connected to a pad on the die to allow access by measurement devices. The measurement devices apply electricity to the pads to measure analog characteristics of the duplicated components.
摘要:
In some embodiments, a circuit includes an oscillator circuit and a control circuit. The oscillator circuit generates a clock signal and includes a plurality of selectable delay circuits. The control circuit receives the clock signal from the oscillator and a reference signal. The control circuit provides a control signal to the oscillator circuit to activate one or more of the plurality of selectable delay circuits to change the frequency of the clock signal. In some embodiments, a method includes generating a clock signal in an oscillator circuit, processing the clock signal to generate a control signal, and activating one or more of a plurality of selectable delay circuits in the oscillator circuit, in response to the control signal.
摘要:
A die includes circuit components to perform normal operations and duplicated components of selective ones of the circuit components. Each end of the duplicated components is connected to a pad on the die to allow access by measurement devices. The measurement devices apply electricity to the pads to measure analog characteristics of the duplicated components.
摘要:
In some embodiments, a chip includes clock generation circuitry to create a clock signal, and reference signal oscillator circuitry to produce a reference signal with a higher frequency than the clock signal. The chip includes a counter to change a count value in response to changes in the reference signal; and count logic circuitry to cause count storage circuitry to read the count value in response to at least some changes in the clock signal and to make at least some of the values in the count storage circuitry related to a duty cycle of the clock signal available to an external tester. Other embodiments are described and claimed.