公开(公告)号：US08801283B2

公开(公告)日：2014-08-12

申请号：US12656679

申请日：2010-02-12

申请人： Satoshi Ishikawa ,  Susumu Yamamoto

发明人： Satoshi Ishikawa ,  Susumu Yamamoto

IPC分类号： G01K7/00

CPC分类号： G01K1/14 ,  G01K1/16 ,  G01K7/16 ,  G01K13/10

摘要： A circuit body includes a flexible insulation sheet with an electric circuit pattern having wiring patterns and a temperature sensor arranged in the electric circuit pattern. The electric circuit pattern has a temperature-sensor connecting portion and a heat-concentrating pattern formed integrally with the temperature-sensor connecting portion so as to have a larger width than that of the wiring pattern. The temperature sensor is touched through the heat-concentrating pattern to an object to be measured. The wiring patterns and the heat-concentrating pattern are formed integrally on a primary surface of the insulation sheet by printing. An additional heat-concentrating pattern is further formed on a secondary surface of the insulation sheet at a position corresponding to the temperature-sensor connecting portion. The heat-concentrating patterns are bent integrally with the insulation sheet and touched to the object to be measured.

摘要翻译： 电路体包括柔性绝缘片，其具有布线图案的电路图案和布置在电路图案中的温度传感器。 电路图案具有温度传感器连接部分和与温度传感器连接部分一体形成的热集中图案，以便具有比布线图案宽的宽度。 温度传感器通过热集中模式被触摸到被测量物体。 布线图案和集热图案通过印刷一体地形成在绝缘片的主表面上。 在对应于温度传感器连接部分的位置处，在绝缘片的次表面上进一步形成另外的热集中图案。 热集中图案与绝缘片一体地弯曲并且被触摸到被测量物体。

公开(公告)号：US07986891B2

公开(公告)日：2011-07-26

申请号：US12382592

申请日：2009-03-19

申请人： Susumu Yamamoto

发明人： Susumu Yamamoto

IPC分类号： G03G15/00 ,  G03G15/08

CPC分类号： G03G15/065 ,  G03G15/0194 ,  G03G15/5058 ,  G03G2215/00059 ,  G03G2215/0802

摘要： An image forming apparatus includes an image supporting member for forming a developer image; a developing unit for forming a developer layer and forming the developer image on the image supporting member using developer of the developer layer; a developer supplying unit for supplying the developer to the developing unit; an image density detection unit for detecting an image density of the developer image; and a control unit for controlling a voltage applied to the developing unit and the developer supplying unit. The control unit corrects the voltage applied to at least one of the developing unit and the developer supplying unit according to the image density detected with the image density detection unit.

摘要翻译： 图像形成装置包括用于形成显影剂图像的图像支持部件; 显影单元，用于使用显影剂层的显影剂形成显影剂层并在图像支撑构件上形成显影剂图像; 显影剂供应单元，用于将显影剂供应到显影单元; 图像浓度检测单元，用于检测显影剂图像的图像浓度; 以及控制单元，用于控制施加到显影单元和显影剂供应单元的电压。 控制单元根据用图像浓度检测单元检测到的图像浓度校正施加到显影单元和显影剂供给单元中的至少一个的电压。

公开(公告)号：US07833431B2

公开(公告)日：2010-11-16

申请号：US11561071

申请日：2006-11-17

申请人： Gaku Minamihaba ,  Nobuyuki Kurashima ,  Dai Fukushima ,  Yukiteru Matsui ,  Susumu Yamamoto ,  Hiroyuki Yano

发明人： Gaku Minamihaba ,  Nobuyuki Kurashima ,  Dai Fukushima ,  Yukiteru Matsui ,  Susumu Yamamoto ,  Hiroyuki Yano

IPC分类号： B44C1/22 ,  H01L21/302 ,  C09K13/00 ,  C03C15/00

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31058 ,  H01L21/31144 ,  H01L21/7684

摘要： An aqueous dispersion for chemical mechanical polishing is provided, which includes water and a resin particle. The resin particles accompany with a projection having a curvature radius ranging from 10 nm to 1.65 μm on a surface. The maximum length of the resin particles is not more than 5 μm and is 2.5 to 25 times as large as the curvature radius.

摘要翻译： 提供了用于化学机械抛光的水分散体，其包括水和树脂颗粒。 树脂颗粒在表面附近具有范围为10nm至1.65μm的曲率半径的突起。 树脂粒子的最大长度为5μm以下，为曲率半径的2.5〜25倍。

公开(公告)号：US20080124927A1

公开(公告)日：2008-05-29

申请号：US11980496

申请日：2007-10-31

申请人： Gaku Minamihaba ,  Hiroyuki Yano ,  Nobuyuki Kurashima ,  Susumu Yamamoto

发明人： Gaku Minamihaba ,  Hiroyuki Yano ,  Nobuyuki Kurashima ,  Susumu Yamamoto

IPC分类号： H01L21/44

CPC分类号： H01L21/76834 ,  H01L21/76823 ,  H01L21/76825 ,  H01L21/76849 ,  H01L21/76868 ,  H01L21/76877 ,  H01L21/76886 ,  H01L23/5258 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/00

摘要： Disclosed is a semiconductor device comprising a semiconductor substrate, a first insulating film formed above the semiconductor substrate, Cu wiring buried in the first insulating film, a second insulating film formed above the Cu wiring, and a discontinuous film made of at least one metal selected from the group consisting of Ti, Al, W, Pd, Sn, Ni, Mg and Zn, or a metal oxide thereof and interposed at an interface between the Cu wiring and the second insulating film.

摘要翻译： 公开了一种半导体器件，包括半导体衬底，形成在半导体衬底上的第一绝缘膜，埋在第一绝缘膜中的Cu布线，在Cu布线上方形成的第二绝缘膜，以及由至少一种选择的金属制成的不连续膜 来自由Ti，Al，W，Pd，Sn，Ni，Mg和Zn组成的组或其金属氧化物，并且介于Cu配线和第二绝缘膜之间的界面处。

公开(公告)号：US07378428B2

公开(公告)日：2008-05-27

申请号：US10502884

申请日：2003-01-30

申请人： Akira Ohhata ,  Yoshikazu Takaoka ,  Mikio Ogawa ,  Hisao Nakai ,  Susumu Yamamoto ,  Hiroshi Ochiai

发明人： Akira Ohhata ,  Yoshikazu Takaoka ,  Mikio Ogawa ,  Hisao Nakai ,  Susumu Yamamoto ,  Hiroshi Ochiai

IPC分类号： C07D279/16 ,  A61K31/5415 ,  A61K31/4035

CPC分类号： C07D217/04 ,  A61K31/4035 ,  A61K31/472 ,  A61K31/4725 ,  A61K31/4738 ,  A61K31/496 ,  A61K31/497 ,  A61K31/536 ,  A61K31/5377 ,  A61K31/541 ,  A61K31/5415

摘要： A nitrogen-containing bicyclic compound of formula (I) or a pharmaceutically acceptable salt thereof (wherein the symbols have the same meanings as described in the specification). The compound of formula (I) has an inhibitory activity against PDE7 and it is useful for the prevention and/or treatment of various diseases, i.e. autoimmune diseases (ulcerative colitis, Crohn's disease, rheumatism, psoriasis, multiple sclerosis, collagenosis, etc.), inflammatory diseases (obstructive pulmonary disease, sepsis, pancreatitis, sarcoidosis, nephritis, hepatitis, enteritis, etc.), allergic diseases (asthma, allergic rhinitis, allergic conjunctivitis, seasonal conjunctivitis, atopic dermatitis, etc.), rejection of organ transplants, serious graft versus host disease (GVHD), diabetic disease, osteoporosis, bone fracture, restenosis, atherosclerosis, obesity, ischemic reperfusion injury, depression, Parkinson's disease, dementia, leukemia, etc.

摘要翻译： 式（I）的含氮双环化合物或其药学上可接受的盐（其中符号具有与说明书中所述相同的含义）。 式（I）化合物对PDE7具有抑制活性，可用于预防和/或治疗各种疾病，即自身免疫性疾病（溃疡性结肠炎，克罗恩病，风湿病，牛皮癣，多发性硬化症，胶原病等） ，炎性疾病（阻塞性肺病，败血症，胰腺炎，结节病，肾炎，肝炎，肠炎等），过敏性疾病（哮喘，过敏性鼻炎，过敏性结膜炎，季节性结膜炎，特应性皮炎等），器官移植排斥， 严重的移植物抗宿主病（GVHD），糖尿病，骨质疏松症，骨折，再狭窄，动脉粥样硬化，肥胖，缺血再灌注损伤，抑郁症，帕金森病，痴呆，白血病等。

公开(公告)号：US07268506B2

公开(公告)日：2007-09-11

申请号：US11144618

申请日：2005-06-06

申请人： Satoshi Nakagawa ,  Yoshimitsu Maejima ,  Yasuyuki Mochizuki ,  Katsuyuki Iwasaki ,  Susumu Yamamoto

发明人： Satoshi Nakagawa ,  Yoshimitsu Maejima ,  Yasuyuki Mochizuki ,  Katsuyuki Iwasaki ,  Susumu Yamamoto

IPC分类号： H02P3/00 ,  H02P5/00 ,  H02P7/00

CPC分类号： H02H7/0851 ,  E05F15/41 ,  E05F15/695 ,  E05Y2900/55 ,  H02H7/0816

摘要： The power window system moves a window glass in opening and closing directions in response to operation of an opening and closing instruction switch. The power window system includes a measurement device for obtaining an open degree of the window glass and a control device for controlling movement of the window glass in response to operation of the switch. The control device moves the window glass in the closing direction when an open degree obtained by the measurement device is not less than a predetermined degree and in the opening direction when the open degree is less than the predetermined degree.

摘要翻译： 电动窗系统响应于打开和关闭指令开关的操作而在打开和关闭方向上移动窗玻璃。 电动窗系统包括用于获得窗玻璃的开度的测量装置和用于响应于开关的操作来控制窗玻璃的移动的控制装置。 当通过测量装置获得的打开度不小于预定程度并且当开度小于预定程度时，控制装置使窗玻璃沿关闭方向移动。

公开(公告)号：US20070128873A1

公开(公告)日：2007-06-07

申请号：US11561071

申请日：2006-11-17

申请人： Gaku MINAMIHABA ,  Nobuyuki Kurashima ,  Dai Fukushima ,  Yukiteru Matsui ,  Susumu Yamamoto ,  Hiroyuki Yano

发明人： Gaku MINAMIHABA ,  Nobuyuki Kurashima ,  Dai Fukushima ,  Yukiteru Matsui ,  Susumu Yamamoto ,  Hiroyuki Yano

IPC分类号： C09K13/00 ,  H01L21/461 ,  C03C15/00 ,  H01L21/302 ,  B44C1/22

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31058 ,  H01L21/31144 ,  H01L21/7684

摘要： An aqueous dispersion for chemical mechanical polishing is provided, which includes water and a resin particle. The resin particles accompany with a projection having a curvature radius ranging from 10 nm to 1.65 μm on a surface. The maximum length of the resin particles is not more than 5 μm and is 2.5 to 25 times as large as the curvature radius.

摘要翻译： 提供了用于化学机械抛光的水分散体，其包括水和树脂颗粒。 树脂颗粒伴随着表面上具有10nm至1.65μm的曲率半径的突起。 树脂粒子的最大长度为5μm以下，为曲率半径的2.5〜25倍。

公开(公告)号：US07009352B2

公开(公告)日：2006-03-07

申请号：US10933526

申请日：2004-09-03

申请人： Susumu Yamamoto ,  Yasuyuki Mochizuki ,  Yuichi Nakazawa

发明人： Susumu Yamamoto ,  Yasuyuki Mochizuki ,  Yuichi Nakazawa

IPC分类号： H02P3/00

CPC分类号： H02H7/0851 ,  E05F15/41 ,  E05F15/695 ,  E05Y2900/55 ,  H02H3/006

摘要： A current sensing circuit includes; a shunt resistor, on which a motor current is flown; a reference resistor which has a resistance value that is n times the shunt resistor; and a current following circuit. The current following circuit includes: a following current control circuit, which controls the following current and generates a first reference voltage; and a capacitor which generates a second reference voltage indicating an average value of the first reference voltage. A first comparator compares a third reference voltage higher than the first reference voltage with the second reference voltage, and outputs the current limitation control signal. A motor current sensing range expanding circuit expands a motor current sensing range by increasing a ratio of the current sensing circuit having the shunt resistor and the reference resistor.

摘要翻译： 电流检测电路包括： 电动机电流流过的分流电阻器; 一个参考电阻，其电阻值是分流电阻的n倍; 和电流跟随电路。 电流跟随电路包括：后续电流控制电路，其控制以下电流并产生第一参考电压; 以及产生表示第一参考电压的平均值的第二参考电压的电容器。 第一比较器将比第一参考电压高的第三参考电压与第二参考电压进行比较，并输出电流限制控制信号。 电动机电流感测范围扩大电路通过增加具有分流电阻器和参考电阻器的电流感测电路的比例来扩大电动机电流感测范围。

公开(公告)号：US20050083004A1

公开(公告)日：2005-04-21

申请号：US10933526

申请日：2004-09-03

申请人： Susumu Yamamoto ,  Yasuyuki Mochizuki ,  Yuichi Nakazawa

发明人： Susumu Yamamoto ,  Yasuyuki Mochizuki ,  Yuichi Nakazawa

IPC分类号： E05F15/16 ,  B60J1/00 ,  B60J1/17 ,  H02H3/00 ,  H02H7/085 ,  H02P1/00 ,  H02P3/08

CPC分类号： H02H7/0851 ,  E05F15/41 ,  E05F15/695 ,  E05Y2900/55 ,  H02H3/006

摘要： A current sensing circuit includes; a shunt resistor, on which a motor current is flown; a reference resistor which has a resistance value that is n times the shunt resistor; and a current following circuit. The current following circuit includes: a following current control circuit, which controls the following current and generates a first reference voltage; and a capacitor which generates a second reference voltage indicating an average value of the first reference voltage. A first comparator compares a third reference voltage higher than the first reference voltage with the second reference voltage, and outputs the current limitation control signal. A motor current sensing range expanding circuit expands a motor current sensing range by increasing a ratio of the current sensing circuit having the shunt resistor and the reference resistor.

摘要翻译： 电流检测电路包括： 电动机电流流过的分流电阻器; 一个参考电阻，其电阻值是分流电阻的n倍; 和电流跟随电路。 电流跟随电路包括：后续电流控制电路，其控制以下电流并产生第一参考电压; 以及产生表示第一参考电压的平均值的第二参考电压的电容器。 第一比较器将比第一参考电压高的第三参考电压与第二参考电压进行比较，并输出电流限制控制信号。 电动机电流感测范围扩大电路通过增加具有分流电阻器和参考电阻器的电流感测电路的比例来扩大电动机电流感测范围。

公开(公告)号：US5989732A

公开(公告)日：1999-11-23

申请号：US921342

申请日：1997-08-29

申请人： Susumu Yamamoto

发明人： Susumu Yamamoto

IPC分类号： B21C1/00 ,  B21C9/00 ,  B21C9/02 ,  B21C37/04 ,  C10M103/00 ,  C10M103/06 ,  C22C38/00 ,  C22C38/58 ,  C25D5/48 ,  F16F1/04

CPC分类号： B21C1/003 ,  B21C37/042 ,  B21C9/00 ,  B21C9/02 ,  C10M103/06 ,  C25D5/48 ,  C10M2201/0603 ,  C10M2201/0613 ,  C10M2201/0623 ,  C10M2201/0653 ,  C10M2201/0663 ,  C10M2201/08 ,  C10M2201/0803 ,  C10M2201/081 ,  C10M2201/082 ,  C10M2201/084 ,  C10M2201/0853 ,  C10M2201/0863 ,  C10M2201/087 ,  C10M2201/0873 ,  C10M2201/1006 ,  C10M2201/1023 ,  C10M2201/1033 ,  C10M2201/1053 ,  C10M2201/123 ,  C10N2240/402 ,  C10N2240/403 ,  C10N2240/404 ,  C10N2240/405 ,  C10N2240/406 ,  C10N2240/407 ,  C10N2240/408 ,  C10N2240/409 ,  C10N2250/121 ,  Y10T428/12438 ,  Y10T428/12611 ,  Y10T428/12937 ,  Y10T428/12979

摘要： A stainless steel wire is plated with nickel (Ni) to a thickness of from not less than 1 .mu.m to not more than 5 .mu.m. An inorganic salt coat film mainly composed of at least one of potassium sulfate and borax (borate) and free from fluorine (F) or chlorine (Cl) is then deposited on the nickel (Ni) plate 2 as the substrate. The steel wire is then drawn to a reduction of area of not less than 60% to adjust the surface roughness thereof to a range of from 0.80 to 12.5 .mu.mRz, preferably from 1.0 to 10.0 .mu.mRz.