-
公开(公告)号：US11335792B2
公开(公告)日：2022-05-17
申请号：US16841342
申请日：2020-04-06
发明人： David Hurley , Ioan Domsa , Ian Colgan , Gerhardus Van Der Linde , Patrick Hughes , Maciej Burel , Barry Clarke , Mihaela Ioana Popovici , Lars-Ake Ragnarsson
摘要： A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
-
公开(公告)号：US09851149B2
公开(公告)日：2017-12-26
申请号：US14836047
申请日：2015-08-26
发明人： Mitsuru Yamazaki , Barry Clarke , Jattie Van Der Linde , Makoto Saito , Kazuyoshi Sugawara , Toshiji Abe , Tadashi Enomoto
CPC分类号： F27B17/0025 , F27D11/12 , F27D99/0001 , H01L21/67115 , H01L21/67248 , H01L43/12
摘要： Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
-
公开(公告)号：US20160061526A1
公开(公告)日：2016-03-03
申请号：US14840486
申请日：2015-08-31
发明人： Mitsuru Yamazaki , Barry Clarke , Ian Colgan , George Eyres , Ioan Domsa
CPC分类号： F27B17/0025 , F27B5/08 , F27B17/005 , F27D5/0037 , F27D99/0001 , H01L21/67115 , H01L21/67313 , H01L21/67754 , H01L43/12
摘要： Disclosed is a magnetic annealing apparatus including a processing container having a horizontally-elongated tubular shape and configured to perform a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a heating unit provided to cover at least a part of a surface of the processing container that extends in a longitudinal direction, from outside; a magnet provided to cover the heating unit from the outside of the heating unit; a substrate holder configured to hold the plurality of substrates within the processing container; and a heat shielding plate provided to surround a part of the substrate holder.
摘要翻译： 公开了一种磁性退火装置，其包括具有水平细长管状形状的处理容器，并且被配置为在磁场中容纳在其中的多个基板上进行磁退火处理; 加热单元，其设置成覆盖从外部沿长度方向延伸的处理容器的表面的至少一部分; 设置成从加热单元的外部覆盖加热单元的磁体; 衬底保持器，其构造成将所述多个衬底保持在所述处理容器内; 以及设置成围绕基板保持器的一部分设置的热屏蔽板。
-
公开(公告)号：US11837652B2
公开(公告)日：2023-12-05
申请号：US17662579
申请日：2022-05-09
发明人： David Hurley , Ioan Domsa , Ian Colgan , Gerhardus Van Der Linde , Patrick Hughes , Maciej Burel , Barry Clarke , Mihaela Ioana Popovici , Lars-Ake Ragnarsson
CPC分类号： H01L29/6684 , H01L21/02532 , H01L21/02554 , H01L21/02667 , H01L21/67098
摘要： A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
-
公开(公告)号：US10254046B2
公开(公告)日：2019-04-09
申请号：US14840486
申请日：2015-08-31
发明人： Mitsuru Yamazaki , Barry Clarke , Ian Colgan , George Eyres , Ioan Domsa
IPC分类号： F27B5/08 , F27B5/14 , F27D1/00 , F27D7/06 , H01L43/12 , F27B17/00 , F27D99/00 , H01L21/67 , H01L21/677 , F27D5/00 , H01L21/673
摘要： Disclosed is a magnetic annealing apparatus including a processing container having a horizontally-elongated tubular shape and configured to perform a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a heating unit provided to cover at least a part of a surface of the processing container that extends in a longitudinal direction, from outside; a magnet provided to cover the heating unit from the outside of the heating unit; a substrate holder configured to hold the plurality of substrates within the processing container; and a heat shielding plate provided to surround a part of the substrate holder.
-
公开(公告)号：US20160061525A1
公开(公告)日：2016-03-03
申请号：US14836047
申请日：2015-08-26
发明人： Mitsuru Yamazaki , Barry Clarke , Jattie Van Der Linde , Makoto Saito , Kazuyoshi Sugawara , Toshiji Abe , Tadashi Enomoto
CPC分类号： F27B17/0025 , F27D11/12 , F27D99/0001 , H01L21/67115 , H01L21/67248 , H01L43/12
摘要： Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
摘要翻译： 公开了一种磁性退火装置，包括：处理容器，其对容纳在其中的多个基板进行磁性退火处理; 衬底保持器，其将所述多个衬底基本上水平地保持在所述处理容器中; 分割加热器，其包括多个分割加热器，并且沿纵向方向覆盖处理容器的预定区域的外周的大致整个圆周表面; 安装用于覆盖分隔加热器外部的磁体; 以及控制器，被配置为反馈控制多个分割加热器中的预定控制目标加热器的温度，并且基于获得的控制输出来控制除了预定控制目标加热器之外的多个分割加热器的温度 通过将预定控制目标加热器的控制输出与预定比率相乘。
-
公开(公告)号：US11894240B2
公开(公告)日：2024-02-06
申请号：US17185231
申请日：2021-02-25
发明人： David Hurley , Ioan Domsa , Ian Colgan , Gerhardus Van Der Linde , Patrick Hughes , Maciej Burel , Barry Clarke , Mihaela Ioana Popovici , Lars-Ake Ragnarsson , Gerrit J. Leusink , Robert Clark , Dina Triyoso
IPC分类号： H01L21/326 , H01L21/04 , H01L21/42 , H01L21/02
CPC分类号： H01L21/326 , H01L21/02107 , H01L21/0425 , H01L21/42
摘要： A system for processing semiconductor wafers, the system including: a processing chamber; a heat source; a substrate holder configured to expose a semiconductor wafer to the heat source; a first electrode configured to be detachably coupled to a first major surface of a semiconductor wafer; and a second electrode coupled to the substrate holder, the first electrode and the second electrode together configured to apply an electric field in the semiconductor wafer.
-
公开(公告)号：US20230304741A1
公开(公告)日：2023-09-28
申请号：US17656588
申请日：2022-03-25
发明人： Ian Colgan , Ioan Domsa , George Eyres , Bartlomiej Burkowicz , Barry Clarke , David Hurley , Einstein Noel Abarra
IPC分类号： F27B17/00 , H01L21/324 , F27D3/00
CPC分类号： F27B17/0025 , H01L21/324 , F27D3/0084 , F27D2007/066
摘要： The disclosure describes equipment for magnetic annealing of a substrate, the equipment including: an anneal chamber configured to heat and cool a substrate held at a soak location along a first direction in the anneal chamber, the anneal chamber including: a heater, a cooler, and a substrate lifter including a substrate holder, where the substrate holder is configured to support a substrate oriented such that the first direction is perpendicular to a major surface of the substrate; and a magnet assembly configured to establish a homogeneous zone in the anneal chamber, the soak location being within the homogeneous zone, the homogeneous zone including a region of magnetic field.
-
公开(公告)号：US11527345B2
公开(公告)日：2022-12-13
申请号：US16466824
申请日：2018-01-03
发明人： Ian Colgan , Ioan Domsa , George Eyres , Toru Ishii , Makoto Saito , David Hurley , Noel O'Shaughnessy , Barry Clarke , Gerhardus Van Der Linde , Pat Hughes
摘要： An apparatus for magnetic annealing one or more workpieces, and a method of operating the apparatus, are described. The apparatus includes: a workpiece holder configured to support one or more workpieces, wherein the one or more workpieces having at least one substantially planar surface; an optional workpiece heating system configured to elevate the one or more workpieces to an anneal temperature; and a magnet assembly having a first magnet and a second magnet, the first and second magnets defining a gap between opposing poles of each magnet, wherein the magnet assembly is arranged to generate a magnetic field substantially perpendicular to the planar surface of the one or more workpieces.
-
公开(公告)号：US20220262921A1
公开(公告)日：2022-08-18
申请号：US17662579
申请日：2022-05-09
发明人： David Hurley , Ioan Domsa , lan Colgan , Gerhardus Van Der Linde , Patrick Hughes , Maciej Burel , Barry Clarke , Mihaela Ioana Popovici , Lars-Ake Ragnarsson
摘要： A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
-
-
-
-
-
-
-
-
-
搜索结果
12 条记录 (耗时 0.044 秒)
