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公开(公告)号:US20210366845A1
公开(公告)日:2021-11-25
申请号:US17396907
申请日:2021-08-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chiang Lin , Yueh-Ting Lin , Hua-Wei Tseng , Li-Hsien Huang , Yu-Hsiang Hu
IPC: H01L23/58 , H01L23/48 , H01L23/00 , H01L23/31 , H01L23/522 , H01L23/528 , H01L21/56
Abstract: A method includes forming a reconstructed wafer including encapsulating a device die in an encapsulant, forming a dielectric layer over the device die and the encapsulant, forming a plurality of redistribution lines extending into the dielectric layer to electrically couple to the device die, and forming a metal ring in a common process for forming the plurality of redistribution lines. The metal ring encircles the plurality of redistribution lines, and the metal ring extends into scribe lines of the reconstructed wafer. A die-saw process is performed along scribe lines of the reconstructed wafer to separate a package from the reconstructed wafer. The package includes the device die and at least a portion of the metal ring.
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公开(公告)号:US20190237379A1
公开(公告)日:2019-08-01
申请号:US16382542
申请日:2019-04-12
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chun-Hao Tseng , Jui Hsieh Lai , Tien-Yu Huang , Ying-Hao Kuo , Kuo-Chung Yee
IPC: H01L23/31 , H01L33/48 , H01L21/56 , H01L21/311 , H01L21/48 , H01L21/50 , H01L31/09 , H01L31/0232 , H01L31/0203 , H01L27/146 , H01L25/00 , H01L25/16 , H01L23/00 , H01L23/538 , H01L23/485 , H01L23/48 , H01L23/29 , H01L23/28 , H01L21/768 , H01L21/683 , H01L33/52
Abstract: In some embodiments, the present disclosure relates to a package for holding a plurality of integrated circuits. The package includes a first conductive pad disposed over a first substrate and a second conductive pad disposed over a second substrate. The second conductive pad is a multi-layer structure having an uppermost metal layer including titanium or nickel. A molding structure surrounds the first substrate and the second substrate. A conductive structure is over the first substrate and the second substrate. The conductive structure is conductively coupled to the second conductive pad.
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公开(公告)号:US10276471B2
公开(公告)日:2019-04-30
申请号:US15855305
申请日:2017-12-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chun-Hao Tseng , Jui Hsieh Lai , Tien-Yu Huang , Ying-Hao Kuo , Kuo-Chung Yee
IPC: H01L23/31 , H01L23/48 , H01L21/50 , H01L31/0232 , H01L31/09 , H01L23/538 , H01L21/56 , H01L21/48 , H01L31/0203 , H01L33/52 , H01L33/48 , H01L23/28 , H01L23/485 , H01L23/00 , H01L27/146 , H01L21/311 , H01L21/683 , H01L21/768 , H01L23/29 , H01L25/16 , H01L25/00
Abstract: In some embodiments, the present disclosure relates to a package for holding a plurality of integrated circuits. The package includes a first conductive pad over a first chip and a second conductive pad over a second chip. A molding structure surrounds the first chip and the second chip. A first passivation layer is over the first chip and the second chip, and a conductive structure is over the first passivation layer. The conductive structure is coupled to the first conductive pad. A second passivation layer is over the conductive structure. The first passivation layer and the second passivation layer have sidewalls defining an aperture that is directly over an optical element within the second chip and that extends through the first passivation layer and the second passivation layer.
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公开(公告)号:US11682637B2
公开(公告)日:2023-06-20
申请号:US17396907
申请日:2021-08-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chiang Lin , Yueh-Ting Lin , Hua-Wei Tseng , Li-Hsien Huang , Yu-Hsiang Hu
IPC: H01L23/482 , H01L23/58 , H01L23/48 , H01L23/00 , H01L23/31 , H01L23/522 , H01L23/528 , H01L21/56
CPC classification number: H01L23/585 , H01L21/563 , H01L23/3128 , H01L23/481 , H01L23/5226 , H01L23/5283 , H01L24/17 , H01L24/32 , H01L24/73 , H01L2224/0231 , H01L2224/02373 , H01L2224/02379 , H01L2224/02381 , H01L2224/0401 , H01L2224/73253 , H01L2924/1436
Abstract: A method includes forming a reconstructed wafer including encapsulating a device die in an encapsulant, forming a dielectric layer over the device die and the encapsulant, forming a plurality of redistribution lines extending into the dielectric layer to electrically couple to the device die, and forming a metal ring in a common process for forming the plurality of redistribution lines. The metal ring encircles the plurality of redistribution lines, and the metal ring extends into scribe lines of the reconstructed wafer. A die-saw process is performed along scribe lines of the reconstructed wafer to separate a package from the reconstructed wafer. The package includes the device die and at least a portion of the metal ring.
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公开(公告)号:US10748825B2
公开(公告)日:2020-08-18
申请号:US16382542
申请日:2019-04-12
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chun-Hao Tseng , Jui Hsieh Lai , Tien-Yu Huang , Ying-Hao Kuo , Kuo-Chung Yee
IPC: H01L23/31 , H01L23/48 , H01L21/50 , H01L31/0232 , H01L31/09 , H01L23/538 , H01L21/56 , H01L21/48 , H01L31/0203 , H01L33/52 , H01L33/48 , H01L23/28 , H01L23/485 , H01L23/00 , H01L27/146 , H01L33/54 , H01L21/311 , H01L21/683 , H01L21/768 , H01L23/29 , H01L25/16 , H01L25/00
Abstract: In some embodiments, the present disclosure relates to a package for holding a plurality of integrated circuits. The package includes a first conductive pad disposed over a first substrate and a second conductive pad disposed over a second substrate. The second conductive pad is a multi-layer structure having an uppermost metal layer including titanium or nickel. A molding structure surrounds the first substrate and the second substrate. A conductive structure is over the first substrate and the second substrate. The conductive structure is conductively coupled to the second conductive pad.
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公开(公告)号:US09865481B2
公开(公告)日:2018-01-09
申请号:US15223609
申请日:2016-07-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chun-Hao Tseng , Jui Hsieh Lai , Tien-Yu Huang , Ying-Hao Kuo , Kuo-Chung Yee
IPC: H01L21/56 , H01L23/48 , H01L21/50 , H01L23/31 , H01L31/0232 , H01L31/09 , H01L23/538 , H01L21/48 , H01L23/00 , H01L27/146 , H01L21/311 , H01L21/683 , H01L21/768 , H01L23/29 , H01L25/16 , H01L25/00
CPC classification number: H01L21/563 , H01L21/31111 , H01L21/481 , H01L21/4857 , H01L21/50 , H01L21/565 , H01L21/568 , H01L21/6836 , H01L21/76838 , H01L23/293 , H01L23/3114 , H01L23/3171 , H01L23/48 , H01L23/538 , H01L23/5383 , H01L23/5389 , H01L24/06 , H01L24/24 , H01L24/82 , H01L25/167 , H01L25/50 , H01L27/14618 , H01L31/0232 , H01L31/09 , H01L2224/24137 , H01L2224/24195 , H01L2924/10253 , H01L2924/1032 , H01L2924/1033 , H01L2924/1305 , H01L2924/13091 , H01L2924/00
Abstract: A package for holding a plurality of heterogeneous integrated circuits includes a first chip having a first conductive pad and a first substrate including a first semiconductor, and a second chip having a second conductive pad and a second substrate including a second semiconductor. The second semiconductor is different from the first semiconductor. The package also includes a molding structure in which the first chip and the second chip are embedded, a conductive structure over the first chip and conductively coupled to the first conductive pad and over the second chip and conductively coupled to the second conductive pad, and a passivation layer over the conductive structure. The passivation layer comprises an opening defined therein which exposes a portion of the second chip.
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公开(公告)号:US20250125223A1
公开(公告)日:2025-04-17
申请号:US18415426
申请日:2024-01-17
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Ta-Hsuan Lin , Hua-Wei Tseng , Wei-Cheng Wu
IPC: H01L23/48 , H01L21/768 , H01L23/00 , H01L23/31 , H01L23/498 , H01L25/00 , H01L25/065
Abstract: A method includes forming a metal pad, depositing a passivation layer on the metal pad, and planarizing the passivation layer, so that the passivation layer includes a planar top surface. The method further includes etching the passivation layer to form an opening in the passivation layer, wherein the metal pad is exposed to the opening, and forming a conductive via including a lower portion in the opening, and an upper portion higher than the passivation layer. A polymer layer is then dispensed to cover the conductive via.
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公开(公告)号:US11984410B2
公开(公告)日:2024-05-14
申请号:US18312705
申请日:2023-05-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chiang Lin , Yueh-Ting Lin , Hua-Wei Tseng , Li-Hsien Huang , Yu-Hsiang Hu
IPC: H01L23/482 , H01L21/56 , H01L23/00 , H01L23/31 , H01L23/48 , H01L23/522 , H01L23/528 , H01L23/58
CPC classification number: H01L23/585 , H01L21/563 , H01L23/3128 , H01L23/481 , H01L23/5226 , H01L23/5283 , H01L24/17 , H01L24/32 , H01L24/73 , H01L2224/0231 , H01L2224/02373 , H01L2224/02379 , H01L2224/02381 , H01L2224/0401 , H01L2224/73253 , H01L2924/1436
Abstract: A method includes forming a reconstructed wafer including encapsulating a device die in an encapsulant, forming a dielectric layer over the device die and the encapsulant, forming a plurality of redistribution lines extending into the dielectric layer to electrically couple to the device die, and forming a metal ring in a common process for forming the plurality of redistribution lines. The metal ring encircles the plurality of redistribution lines, and the metal ring extends into scribe lines of the reconstructed wafer. A die-saw process is performed along scribe lines of the reconstructed wafer to separate a package from the reconstructed wafer. The package includes the device die and at least a portion of the metal ring.
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公开(公告)号:US20230275040A1
公开(公告)日:2023-08-31
申请号:US18312705
申请日:2023-05-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wan-Yu Lee , Chiang Lin , Yueh-Ting Lin , Hua-Wei Tseng , Li-Hsien Huang , Yu-Hsiang Hu
IPC: H01L23/58 , H01L23/48 , H01L23/00 , H01L23/31 , H01L23/522 , H01L23/528 , H01L21/56
CPC classification number: H01L23/585 , H01L23/481 , H01L24/32 , H01L24/73 , H01L23/3128 , H01L23/5226 , H01L23/5283 , H01L21/563 , H01L24/17 , H01L2224/02379 , H01L2224/0401 , H01L2224/73253 , H01L2924/1436 , H01L2224/0231 , H01L2224/02373 , H01L2224/02381
Abstract: A method includes forming a reconstructed wafer including encapsulating a device die in an encapsulant, forming a dielectric layer over the device die and the encapsulant, forming a plurality of redistribution lines extending into the dielectric layer to electrically couple to the device die, and forming a metal ring in a common process for forming the plurality of redistribution lines. The metal ring encircles the plurality of redistribution lines, and the metal ring extends into scribe lines of the reconstructed wafer. A die-saw process is performed along scribe lines of the reconstructed wafer to separate a package from the reconstructed wafer. The package includes the device die and at least a portion of the metal ring.
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公开(公告)号:US20180138056A1
公开(公告)日:2018-05-17
申请号:US15855305
申请日:2017-12-27
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Wan-Yu Lee , Chun-Hao Tseng , Jui Hsieh Lai , Tien-Yu Huang , Ying-Hao Kuo , Kuo-Chung Yee
IPC: H01L21/56 , H01L23/538 , H01L21/48 , H01L21/50 , H01L31/09 , H01L31/0232 , H01L27/146 , H01L25/00 , H01L25/16 , H01L23/00 , H01L21/311 , H01L23/48 , H01L23/31 , H01L23/29 , H01L21/768 , H01L21/683
CPC classification number: H01L21/563 , H01L21/31111 , H01L21/481 , H01L21/4857 , H01L21/50 , H01L21/565 , H01L21/568 , H01L21/6836 , H01L21/76838 , H01L23/293 , H01L23/3114 , H01L23/3171 , H01L23/48 , H01L23/538 , H01L23/5383 , H01L23/5389 , H01L24/06 , H01L24/24 , H01L24/82 , H01L25/167 , H01L25/50 , H01L27/14618 , H01L31/0232 , H01L31/09 , H01L2224/24137 , H01L2224/24195 , H01L2924/10253 , H01L2924/1032 , H01L2924/1033 , H01L2924/1305 , H01L2924/13091 , H01L2924/00
Abstract: In some embodiments, the present disclosure relates to a package for holding a plurality of integrated circuits. The package includes a first conductive pad over a first chip and a second conductive pad over a second chip. A molding structure surrounds the first chip and the second chip. A first passivation layer is over the first chip and the second chip, and a conductive structure is over the first passivation layer. The conductive structure is coupled to the first conductive pad. A second passivation layer is over the conductive structure. The first passivation layer and the second passivation layer have sidewalls defining an aperture that is directly over an optical element within the second chip and that extends through the first passivation layer and the second passivation layer.
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