摘要:
An optical member for a touch panel of the invention includes a rubber elastic material film 1, in which one surface or both surfaces of the rubber elastic material have an irregular shape. The optical member for a touch panel of the invention can provide a touch panel that reduces errors even in environments having weak external light, enables input without using a special pen, and enables input even when an image in an LCD is displayed as the color black.
摘要:
An optical member 1 for a touch panel having a pair of opposite main surfaces S1 and S2. The optical member 1 includes a first layer 11 and a second layer 12 laminated over the first layer 11. The surface 11a of the first layer 11, adjacent to the second layer 12, has an irregular shape, and the surface 11a of the first layer 11 and the surface 12a of the second layer 12 are partially or completely separated from each other. When the optical member is pressed from one main surface S2, the surface of at least one of the first layer 11 and/or the second layer 12 is reversibly deformed, thereby changing the reflection state of reflected light L2, which is incident from the other main surface S1.
摘要:
Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
摘要:
Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
摘要:
Disclosed are a process for preparing a phosphor pattern of the present invention comprises the steps of: (I) forming a phosphor-containing photosensitive resin composition layer (A) on a substrate having unevenness, (II) irradiating a scattered light to the layer (A) imagewisely, (III) developing the layer (A) by removing the portion to which the scattered light is imagewisely irradiated to form a pattern, and (IV) calcinating the formed pattern to remove an unnecessary portion from the pattern formed in the step (III) to form a phosphor pattern, a phosphor pattern produced by the above process and a back plate for the plasma display panel provided with the phosphor pattern on a substrate for a plasma display panel.
摘要:
The invention provides a material for forming a passivation film for a semiconductor substrate. The material includes a polymer compound having an anionic group or a cationic group.
摘要:
The composition for forming an n-type diffusion layer in accordance with the present invention contains a donor element-containing glass powder and a dispersion medium. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.
摘要:
The method for producing a photovoltaic cell includes applying an n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium onto a first region on one surface side of a semiconductor substrate; applying a p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium onto a second region other than the first region on the surface of the semiconductor substrate where the first region is provided; a thermal diffusion process in which an n-type diffusion layer and a p-type diffusion layer are formed by heat-treating the semiconductor substrate onto which the n-type diffusion layer forming composition and the p-type diffusion layer forming composition are applied; and forming an electrode on each of the first region where the n-type diffusion layer is formed and the second region where the p-type diffusion layer is formed, respectively.
摘要:
The paste composition for an electrode according to the present invention includes metal particles containing copper as a main component, a flux, glass particles, a solvent, and a resin. Further, a photovoltaic cell according to the present invention has an electrode formed by using the paste composition for an electrode.
摘要:
The composition for forming an n-type diffusion layer in accordance with the present invention contains a donor element-containing glass powder and a dispersion medium. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.