Method and apparatus for using cache memory in a system that supports a low power state
    4.
    发明授权
    Method and apparatus for using cache memory in a system that supports a low power state 有权
    在支持低功率状态的系统中使用高速缓冲存储器的方法和装置

    公开(公告)号:US08640005B2

    公开(公告)日:2014-01-28

    申请号:US12785182

    申请日:2010-05-21

    IPC分类号: G11C29/00

    CPC分类号: G06F11/1064

    摘要: A cache memory system uses multi-bit Error Correcting Code (ECC) with a low storage and complexity overhead. In an embodiment, error correction logic may include a first error correction logic to determine a number of errors in data that is stored in a cache line of a cache memory, and a second error correction logic to receive the data from the first error correction logic if the number of errors is determined to be greater than one and to perform error correction responsive to receipt of the data. The cache memory system can be operated at very low idle power, without dramatically increasing transition latency to and from an idle power state due to loss of state. Other embodiments are described and claimed.

    摘要翻译: 高速缓冲存储器系统使用具有低存储和复杂度开销的多位错误校正码(ECC)。 在一个实施例中,纠错逻辑可以包括:第一纠错逻辑,用于确定存储在高速缓存存储器的高速缓存行中的数据中的错误数;以及第二纠错逻辑,用于从第一纠错逻辑接收数据 如果错误的数量被确定为大于1,并且响应于数据的接收执行错误校正。 高速缓冲存储器系统可以在非常低的空闲功率下操作,而不会由于状态的损失而急剧增加到空闲功率状态的转换等待时间。 描述和要求保护其他实施例。

    Low overhead error correcting code protection for stored information
    6.
    发明授权
    Low overhead error correcting code protection for stored information 有权
    存储信息的低开销错误纠正代码保护

    公开(公告)号:US08539303B2

    公开(公告)日:2013-09-17

    申请号:US12973880

    申请日:2010-12-20

    IPC分类号: G06F11/00

    摘要: Embodiments of an invention for low overhead error-correcting-code protection for stored information are described are disclosed. In one embodiment, an apparatus includes a data storage structure, a first check value storage structure, a second check value storage structure, and check value generation hardware. The data storage structure is to store a plurality of first data values. The first check value storage structure is to store a plurality of first check values. The second check value storage structure is to store a plurality of second check values. The check value generation hardware is to generate the first check values and the second check values. The first check values provide a first level of error protection for the first data values and the second check values provide a second level of error protection for a plurality of second data values. Each of the plurality of first data value has a first data width, and each of the plurality of second data values has a second data width, the second data width being greater than the first data width. Each of the second data values is a concatenation of one of the first data values and at least another of the first data values.

    摘要翻译: 公开了用于存储信息的低开销纠错码保护的发明的实施例。 在一个实施例中,一种装置包括数据存储结构,第一检查值存储结构,第二检查值存储结构和检查值生成硬件。 数据存储结构是存储多个第一数据值。 第一检查值存储结构是存储多个第一检查值。 第二检查值存储结构是存储多个第二检查值。 检查值生成硬件是生成第一检查值和第二检查值。 第一检查值为第一数据值提供第一级错误保护,并且第二检查值为多个第二数据值提供第二级别的错误保护。 多个第一数据值中的每一个具有第一数据宽度,并且多个第二数据值中的每一个具有第二数据宽度,第二数据宽度大于第一数据宽度。 第二数据值中的每一个是第一数据值和第一数据值中的至少另一数据值之一的级联。

    INCREASING THE SURFACE AREA OF A MEMORY CELL CAPACITOR
    9.
    发明申请
    INCREASING THE SURFACE AREA OF A MEMORY CELL CAPACITOR 有权
    增加记忆体电容器的表面积

    公开(公告)号:US20100181607A1

    公开(公告)日:2010-07-22

    申请号:US12749389

    申请日:2010-03-29

    IPC分类号: H01L27/06

    摘要: Methods and apparatuses to increase a surface area of a memory cell capacitor are described. An opening in a second insulating layer deposited over a first insulating layer on a substrate is formed. The substrate has a fin. A first insulating layer is deposited over the substrate adjacent to the fin. The opening in the second insulating layer is formed over the fin. A first conducting layer is deposited over the second insulating layer and the fin. A third insulating layer is deposited on the first conducting layer. A second conducting layer is deposited on the third insulating layer. The second conducting layer fills the opening. The second conducting layer is to provide an interconnect to an upper metal layer. Portions of the second conducting layer, third insulating layer, and the first conducting layer are removed from a top surface of the second insulating layer.

    摘要翻译: 描述了增加存储单元电容器的表面积的方法和装置。 形成了沉积在基板上的第一绝缘层上的第二绝缘层中的开口。 衬底具有翅片。 第一绝缘层沉积在邻近鳍片的衬底上。 第二绝缘层上的开口形成在鳍上。 第一导电层沉积在第二绝缘层和鳍上。 第三绝缘层沉积在第一导电层上。 第二导电层沉积在第三绝缘层上。 第二导电层填充开口。 第二导电层是提供与上金属层的互连。 从第二绝缘层的顶表面去除第二导电层,第三绝缘层和第一导电层的部分。

    Integrated circuit, 1T-1C embedded memory cell containing same, and method of manufacturing 1T-1C memory cell for embedded memory application
    10.
    发明申请
    Integrated circuit, 1T-1C embedded memory cell containing same, and method of manufacturing 1T-1C memory cell for embedded memory application 审中-公开
    集成电路,含有1T-1C的嵌入式存储单元以及用于嵌入式存储器应用的1T-1C存储单元的制造方法

    公开(公告)号:US20100155801A1

    公开(公告)日:2010-06-24

    申请号:US12317507

    申请日:2008-12-22

    摘要: An integrated circuit includes a semiconducting substrate (110), electrically conductive layers (120) over the semiconducting substrate, and a capacitor (130) at least partially embedded within the semiconducting substrate such that the capacitor is entirely underneath the electrically conductive layers. A storage node voltage is on an outside layer (132) of the capacitor. In the same or another embodiment, the integrated circuit may act as a 1T-1C embedded memory cell including the semiconducting substrate, an electrically insulating stack (160) over the semiconducting substrate, a transistor (140) including a source/drain region (142) within the semiconducting substrate and a gate region (141) above the semiconducting substrate, a trench (111) extending through the electrically insulating layers and into the semiconducting substrate, a first electrically insulating layer (131) located within the trench, and the capacitor located within the trench interior to the first electrically insulating layer.

    摘要翻译: 集成电路包括半导体衬底(110),半导体衬底上的导电层(120)和至少部分地嵌入在半导体衬底内的电容器(130),使得电容器完全在导电层的下面。 存储节点电压位于电容器的外层(132)上。 在相同或另一个实施例中,集成电路可以用作包括半导体衬底的1T-1C嵌入式存储单元,半导体衬底上的电绝缘堆叠(160),包括源极/漏极区域(142)的晶体管(140) )和在半导体衬底上方的栅极区(141),延伸穿过电绝缘层并进入半导体衬底的沟槽(111),位于沟槽内的第一电绝缘层(131)和电容器 位于第一电绝缘层的沟槽内部。