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    Method for preparing cathode active material
    2.
    发明授权
    Method for preparing cathode active material 有权
    阴极活性材料的制备方法

    公开(公告)号：US08795550B2

    公开(公告)日：2014-08-05

    申请号：US12647643

    申请日：2009-12-28

    Applicant: Ya-Dong Li ,  Qing Peng ,  Zhong-Bin Zhuang

    Inventor： Ya-Dong Li ,  Qing Peng ,  Zhong-Bin Zhuang

    IPC: H01M4/02 ,  H01M4/136

    CPC classification number: H01M4/5825 ,  C01B33/24 ,  H01M4/366 ,  H01M4/625

    Abstract: A method for preparing a cathode active material includes mixing a phosphorus source material, a lithium source material, and a dispersing agent together to form a first liquid mixture. An iron powder is added into the first liquid mixture. The first liquid mixture with the iron powder therein is dried to achieve a precursor. The precursor is calcined in a protective gas at a temperature of about 600° C. to about 800° C. for more than about 2 hours.

    Abstract translation: 制备阴极活性材料的方法包括将磷源材料，锂源材料和分散剂混合在一起形成第一液体混合物。 将铁粉加入到第一液体混合物中。 将其中含有铁粉的第一液体混合物干燥以获得前体。 该前体在保护气体中在约600℃至约800℃的温度下煅烧超过约2小时。

    SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
    3.
    发明申请
    SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY 有权
    用于高级光刻的顺序浸润合成

    公开(公告)号：US20120241411A1

    公开(公告)日：2012-09-27

    申请号：US13427619

    申请日：2012-03-22

    Applicant: Seth B. Darling ,  Jeffrey W. Elam ,  Yu-Chih Tseng ,  Qing Peng

    Inventor： Seth B. Darling ,  Jeffrey W. Elam ,  Yu-Chih Tseng ,  Qing Peng

    IPC: H01L21/3065 ,  C23F1/00

    CPC classification number: H01L21/3081 ,  B81C1/00428 ,  B81C2201/0149 ,  B82Y40/00 ,  G03F7/0041 ,  G03F7/405 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/0279 ,  H01L21/3065 ,  H01L21/3086 ,  Y10T428/31522

    Abstract: A plasma etch resist material modified by an inorganic protective component via sequential infiltration synthesis (SIS) and methods of preparing the modified resist material. The modified resist material is characterized by an improved resistance to a plasma etching or related process relative to the unmodified resist material, thereby allowing formation of patterned features into a substrate material, which may be high-aspect ratio features. The SIS process forms the protective component within the bulk resist material through a plurality of alternating exposures to gas phase precursors which infiltrate the resist material. The plasma etch resist material may be initially patterned using photolithography, electron-beam lithography or a block copolymer self-assembly process.

    Abstract translation: 通过连续渗透合成（SIS）由无机保护组分改性的等离子体蚀刻抗蚀剂材料和制备改性抗蚀剂材料的方法。 改进的抗蚀剂材料的特征在于相对于未改性的抗蚀剂材料具有改进的抗等离子体蚀刻或相关工艺的耐受性，从而允许将图案化特征形成到基底材料中，该基材可以是高纵横比特征。 SIS工艺通过对渗透抗蚀剂材料的气相前体的多次交替曝光而在体抗蚀材料内形成保护组分。 可以使用光刻，电子束光刻或嵌段共聚物自组装工艺来初始图案化等离子体蚀刻抗蚀剂材料。

    MICROCHANNEL PLATE DETECTOR AND METHODS FOR THEIR FABRICATION
    4.
    发明申请
    MICROCHANNEL PLATE DETECTOR AND METHODS FOR THEIR FABRICATION 有权
    微通道板检测器及其制造方法

    公开(公告)号：US20120187305A1

    公开(公告)日：2012-07-26

    申请号：US13011645

    申请日：2011-01-21

    Applicant: Jeffrey W. Elam ,  Anil U. Mane ,  Qing Peng

    Inventor： Jeffrey W. Elam ,  Anil U. Mane ,  Qing Peng

    IPC: G01T3/08 ,  H01L31/18

    CPC classification number: H01J43/246 ,  C23C16/45529 ,  C23C16/45555

    Abstract: A multi-component tunable resistive coating and methods of depositing the coating on the surfaces of a microchannel plate (MCP) detector. The resistive coating composed of a plurality of alternating layers of a metal oxide resistive component layer and a conductive component layer composed of at least one of a metal, a metal nitride and a metal sulfide. The coating may further include an emissive layer configured to produce a secondary electron emission in response to a particle interacting with the MCP and a neutron-absorbing layer configured to respond to a neutron interacting with the MCP.

    Abstract translation: 多组分可调电阻涂层和在微通道板（MCP）检测器的表面上沉积涂层的方法。 电阻涂层由金属氧化物电阻性成分层的多个交替层和由金属，金属氮化物和金属硫化物中的至少一种构成的导电性成分层构成。 涂层还可以包括发射层，其被配置为响应于与MCP相互作用的颗粒产生二次电子发射，以及被配置为响应于与MCP相互作用的中子的中子吸收层。

    Ordered nanoscale domains by infiltration of block copolymers
    5.
    发明授权
    Ordered nanoscale domains by infiltration of block copolymers 有权
    有序的纳米级域通过嵌段共聚物的渗透

    公开(公告)号：US09487600B2

    公开(公告)日：2016-11-08

    申请号：US13209190

    申请日：2011-08-12

    Applicant: Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    Inventor： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    IPC: C08F8/42

    CPC classification number: C08G83/001 ,  C08F8/42 ,  H01G9/02 ,  H01J9/025 ,  H01L21/0271 ,  H01L51/4213 ,  H01L51/441 ,  H01M2/166 ,  H01M10/0565 ,  H01M2300/0082

    Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic features with patterned nanostructures defined by the configuration of the microdomain.

    Abstract translation: 通过渗透具有多个自组装的周期性聚合物微畴的嵌段共聚物支架来制备可调谐无机图案化纳米尺度的方法。 该方法可以使用与原子层沉积（ALD）相关的顺序渗透合成（SIS）。 该方法包括选择配置为与限定微区的共聚物单元选择性反应但与该共聚物的另一聚合物单元基本上不反应的金属前体。 选择性地在微区上形成可调谐的无机特征以形成金属前体和共反应物的杂化有机/无机复合材料。 可以任选地除去有机组分以获得由微区的构型定义的图案化纳米结构的无机特征。

    Microchannel plate detector and methods for their fabrication
    6.
    发明授权
    Microchannel plate detector and methods for their fabrication 有权
    微通道板检测器及其制造方法

    公开(公告)号：US08969823B2

    公开(公告)日：2015-03-03

    申请号：US13011645

    申请日：2011-01-21

    Applicant: Jeffrey W. Elam ,  Anil U. Mane ,  Qing Peng

    Inventor： Jeffrey W. Elam ,  Anil U. Mane ,  Qing Peng

    IPC: G01T3/00 ,  H01J43/24 ,  C23C16/455

    CPC classification number: H01J43/246 ,  C23C16/45529 ,  C23C16/45555

    Abstract: A multi-component tunable resistive coating and methods of depositing the coating on the surfaces of a microchannel plate (MCP) detector. The resistive coating composed of a plurality of alternating layers of a metal oxide resistive component layer and a conductive component layer composed of at least one of a metal, a metal nitride and a metal sulfide. The coating may further include an emissive layer configured to produce a secondary electron emission in response to a particle interacting with the MCP and a neutron-absorbing layer configured to respond to a neutron interacting with the MCP.

    Abstract translation: 多组分可调电阻涂层和在微通道板（MCP）检测器的表面上沉积涂层的方法。 电阻涂层由金属氧化物电阻性成分层的多个交替层和由金属，金属氮化物和金属硫化物中的至少一种构成的导电性成分层构成。 涂层还可以包括发射层，其被配置为响应于与MCP相互作用的颗粒产生二次电子发射，以及被配置为响应于与MCP相互作用的中子的中子吸收层。

    Ordered Nanoscale Domains by Infiltration of Block Copolymers
    8.
    发明申请
    Ordered Nanoscale Domains by Infiltration of Block Copolymers 有权
    嵌段共聚物渗透的有序纳米领域

    公开(公告)号：US20120046421A1

    公开(公告)日：2012-02-23

    申请号：US13209190

    申请日：2011-08-12

    Applicant: Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    Inventor： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

    IPC: C08F8/42

    CPC classification number: C08G83/001 ,  C08F8/42 ,  H01G9/02 ,  H01J9/025 ,  H01L21/0271 ,  H01L51/4213 ,  H01L51/441 ,  H01M2/166 ,  H01M10/0565 ,  H01M2300/0082

    Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.

    Abstract translation: 通过渗透具有多个自组装的周期性聚合物微畴的嵌段共聚物支架来制备可调谐无机图案化纳米尺度的方法。 该方法可以使用与原子层沉积（ALD）相关的顺序渗透合成（SIS）。 该方法包括选择配置为与限定微区的共聚物单元选择性反应但与该共聚物的另一聚合物单元基本上不反应的金属前体。 选择性地在微区上形成可调谐的无机特征以形成金属前体和共反应物的杂化有机/无机复合材料。 可以任选地除去有机组分以获得具有由微区域的构型限定的图案化纳米结构的无机特征。

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