Polyimide precursor composition, method of forming polyimide film,
electronic parts and liquid crystal element
    1.
    发明授权
    Polyimide precursor composition, method of forming polyimide film, electronic parts and liquid crystal element 失效
    聚酰亚胺前体组合物,聚酰亚胺膜的形成方法,电子部件和液晶元件

    公开(公告)号:US5756650A

    公开(公告)日:1998-05-26

    申请号:US816595

    申请日:1997-03-13

    摘要: A polyimide precursor composition, which comprises, a polyamic acid having a repeating unit represented by the following general formula (PA), and at least one kinds of cure accelerator selected from the group consisting of a substituted or unsubstituted nitrogen-containing heterocyclic compound exhibiting an acid dissociation index "pKa" of a proton complex ranging from 0 to 8 in an aqueous solution thereof, or an N-oxide compound of said nitrogen-containing heterocyclic compound (AC1), a substituted or unsubstituted amino acid compound (AC2), and an aromatic hydrocarbon compound or an aromatic heterocyclic compound having a molecular weight of 1,000 or less and two or more hydroxyl groups (AC3): ##STR1## wherein .phi. is a quadrivalent organic group, .phi. is a bivalent organic group, R is a substituted or unsubstituted hydrocarbon group, organosilicic group or hydrogen atom.

    摘要翻译: 一种聚酰亚胺前体组合物,其包含具有由以下通式(PA)表示的重复单元的聚酰胺酸和至少一种选自取代或未取代的含氮杂环化合物的固化促进剂, 在其水溶液中为0〜8的质子络合物的酸解离指数“pKa”,或所述含氮杂环化合物(AC1)的N-氧化物,取代或未取代的氨基酸化合物(AC2)和 分子量为1000以下的芳香族烃化合物或芳香族杂环化合物以及两个以上的羟基(AC3):其中phi是四价有机基团,Phi是二价有机基团,其中R为 取代或未取代的烃基,有机硅基或氢原子。

    Developing solution and method of forming polyimide pattern by using the developing solution
    3.
    发明授权
    Developing solution and method of forming polyimide pattern by using the developing solution 有权
    通过使用显影液形成聚酰亚胺图案的方法和方法

    公开(公告)号:US06316170B2

    公开(公告)日:2001-11-13

    申请号:US09526470

    申请日:2000-03-15

    IPC分类号: G03F730

    摘要: Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10−14] of 5 to 8 within an aqueous solution of 25° C.

    摘要翻译: 公开了一种光敏聚酰亚胺的显影液,其由具有碱解离指数pKb [= -log(Kb)= - log(Kw / Ka)= 14-pKa)的胺化合物的水溶液组成,其中Kb为 碱解离常数,Ka是质子复合物的酸解离常数,pKa是质子络合物的酸解离指数= -log(Ka),Kw是水= 1×10-14]的离子积为5〜8 25℃的水溶液

    Method of forming polyimide film pattern
    4.
    发明授权
    Method of forming polyimide film pattern 失效
    形成聚酰亚胺薄膜图案的方法

    公开(公告)号:US5518864A

    公开(公告)日:1996-05-21

    申请号:US220058

    申请日:1994-03-30

    IPC分类号: G03F7/023 G03F7/038 G03F7/38

    CPC分类号: G03F7/0387 G03F7/0233

    摘要: Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R.sup.1 represents a tetravalent organic group, R.sup.2 represents a divalent organic group, and R.sup.3 and R.sup.4 represent a monovalent organic group, at least one of R.sup.3 and R.sup.4 being an organic group having at least on hydroxyl group bonded to an aromatic ring. A semiconductor substrate is coated with the photosensitive resin composition, followed by exposing the coated film to light through a patterning mask and subsequently applying a development and a heat treatment so as to form a polyimide film pattern. A baking treatment also be applied immediately after the exposure step. The photosensitive resin composition of the present invention performs the function of a positive or negative photoresist film and the function of a polyimide protective film on a semiconductor substrate.

    摘要翻译: 公开了含有具有下述通式(1)表示的重复单元的聚酰胺酸衍生物和感光性化合物(1)的感光性树脂组合物,其中R1表示四价有机基团,R2表示二价有机基团 并且R 3和R 4表示一价有机基团,R 3和R 4中的至少一个是至少具有与芳环键合的羟基的有机基团。 用感光性树脂组合物涂布半导体基板,然后通过图案化掩模使涂膜曝光,随后进行显影和热处理,以形成聚酰亚胺膜图案。 在曝光步骤之后立即施加烘烤处理。 本发明的感光性树脂组合物在半导体基板上具有正性或负性光致抗蚀剂膜的功能和聚酰亚胺保护膜的功能。

    Photosensitive resin composition for forming polyimide film pattern
comprising an o-quinone diazide photosensitive agent
    5.
    发明授权
    Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent 失效
    用于形成聚酰亚胺膜图案的光敏树脂组合物,其包含邻醌二叠氮化物感光剂

    公开(公告)号:US5348835A

    公开(公告)日:1994-09-20

    申请号:US766334

    申请日:1991-09-27

    IPC分类号: G03F7/023 G03F7/038 G03F7/30

    CPC分类号: G03F7/0387 G03F7/0233

    摘要: Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R.sup.1 represents a tetravalent organic group, R.sup.2 represents a divalent organic group, and R.sup.3 and R.sup.4 represent a monovalent organic group, at least one of R.sup.3 and R.sup.4 being an organic group having at least on hydroxyl group bonded to an aromatic ring. A semiconductor substrate is coated with the photosensitive resin composition, followed by exposing the coated film to light through a patterning mask and subsequently applying a development and a heat treatment so as to form a polyimide film pattern. A baking treatment also be applied immediately after the exposure step. The photosensitive resin composition of the present invention performs the function of a positive or negative photoresist film and the function of a polyimide protective film on a semiconductor substrate.

    摘要翻译: 公开了一种感光性树脂组合物,其含有具有下述通式(1)表示的重复单元的聚酰胺酸衍生物和感光性化合物:其中,R 1表示四价有机基团,R 2表示二价有机基团, R3和R4表示一价有机基团,R3和R4中的至少一个是至少具有与芳环键合的羟基的有机基团。 用感光性树脂组合物涂布半导体基板,然后通过图案化掩模将涂膜曝光,随后进行显影和热处理,以形成聚酰亚胺膜图案。 在曝光步骤之后立即施加烘烤处理。 本发明的感光性树脂组合物在半导体基板上具有正性或负性光致抗蚀剂膜的功能和聚酰亚胺保护膜的功能。

    LIGHT-EXTRACTION LAYER OF LIGHT-EMITTING DEVICE AND ORGANIC ELECTROLUMINESCENCE ELEMENT EMPLOYING THE SAME
    8.
    发明申请
    LIGHT-EXTRACTION LAYER OF LIGHT-EMITTING DEVICE AND ORGANIC ELECTROLUMINESCENCE ELEMENT EMPLOYING THE SAME 有权
    发光装置的光提取层和使用其的有机电致发光元件

    公开(公告)号:US20090224660A1

    公开(公告)日:2009-09-10

    申请号:US12346937

    申请日:2008-12-31

    IPC分类号: H01J1/63 G02B6/10

    摘要: The present invention provides a highly efficient light-extraction layer and an organic electroluminescence element excellent in light-extraction efficiency. The light-extraction layer of the present invention comprises a reflecting layer and a three-dimensional diffraction layer formed thereon. The diffraction layer comprises fine particles having a variation coefficient of the particle diameter of 10% or less and of a matrix having a refractive index different from that of the fine particles. The particles have a volume fraction of 50% or more based on the volume of the diffraction layer. The particles are arranged to form first areas having short-distance periodicity, and the first areas are disposed and adjacent to each other in random directions to form second areas. The organic electroluminescence element of the present invention comprises the above light-extraction layer.

    摘要翻译: 本发明提供了光提取效率优异的高效率的光提取层和有机电致发光元件。 本发明的光提取层包括反射层和在其上形成的三维衍射层。 衍射层包括具有10%以下的粒径变化系数的微粒和具有与微粒的折射率不同的折射率的基质。 基于衍射层的体积,粒子的体积分数为50%以上。 颗粒被布置成形成具有短距离周期的第一区域,并且第一区域在随机方向上彼此设置和相邻,以形成第二区域。 本发明的有机电致发光元件包含上述光提取层。