Gas phase silicon etching with bromine trifluoride
    2.
    发明授权
    Gas phase silicon etching with bromine trifluoride 有权
    用三氟化硼气相硅蚀刻

    公开(公告)号:US06436229B2

    公开(公告)日:2002-08-20

    申请号:US09741403

    申请日:2000-12-19

    IPC分类号: B44C122

    摘要: An apparatus and method for gas-phase bromine trifluoride (BrF3) silicon isotropic room temperature etching system for both bulk and surface micromachining. The gas-phase BrF3 can be applied in a pulse mode and in a continuous flow mode. The etching rate in pulse mode is dependent on gas concentration, reaction pressure, pulse duration, pattern opening area and effective surface area.

    摘要翻译: 用于体相和表面微加工的气相溴化三氟化硼(BrF 3)硅各向同性室温蚀刻系统的装置和方法。 气相BrF3可以以脉冲模式和连续流动模式施加。 脉冲模式下的蚀刻速率取决于气体浓度,反应压力,脉冲持续时间,图案开口面积和有效表面积。

    SYSTEMS AND METHODS FOR CUSTOMIZING ADJUSTABLE INTRAOCULAR LENSES
    9.
    发明申请
    SYSTEMS AND METHODS FOR CUSTOMIZING ADJUSTABLE INTRAOCULAR LENSES 有权
    用于自定义可调节内窥镜的系统和方法

    公开(公告)号:US20140111765A1

    公开(公告)日:2014-04-24

    申请号:US14058634

    申请日:2013-10-21

    IPC分类号: G02C7/02 A61B3/10 A61F2/16

    摘要: The lens geometry and power of an intraocular lens is optimized to provide both distance and near vision correction for a patient. The optimization may be based on one or more measured accommodation-related parameters and one or more estimated accommodation-related parameters. An accommodative amplitude may be predicted based on the measured and estimated accommodation-related parameters, and the optimized the intraocular lens geometry and power established based thereon.

    摘要翻译: 优化眼内透镜的透镜几何形状和功率,以便为患者提供距离和近视矫正。 优化可以基于一个或多个测量的住宿相关参数和一个或多个估计的住宿相关参数。 可以基于测量和估计的调节相关参数来预测调节幅度,并且基于此建立的优化的眼内透镜几何形状和功率。