Semiconductor wafer cassette
    1.
    发明授权
    Semiconductor wafer cassette 有权
    半导体晶片盒

    公开(公告)号:US06691876B2

    公开(公告)日:2004-02-17

    申请号:US10056357

    申请日:2002-01-25

    IPC分类号: A47G1908

    CPC分类号: H01L21/6732 H01L21/67326

    摘要: A semiconductor wafer cassette has a first side wall, a second side wall opposite the first side wall, a front surface, and a back surface opposite the front surface. A body defines an internal bay portion with slots for vertically receiving wafers, each slot of the internal bay portion having one support slab. The body also includes two parallel legs for supporting the cassette and a handle for handling the cassette.

    摘要翻译: 半导体晶片盒具有第一侧壁,与第一侧壁相对的第二侧壁,前表面和与前表面相对的后表面。 主体限定具有用于垂直接收晶片的槽的内部间隔部分,内部间隔部分的每个槽具有一个支撑板。 该主体还包括用于支撑盒的两个平行腿和用于处理盒的手柄。

    Method for Manufacturing Chip Package Structures
    2.
    发明申请
    Method for Manufacturing Chip Package Structures 审中-公开
    制造芯片封装结构的方法

    公开(公告)号:US20070155049A1

    公开(公告)日:2007-07-05

    申请号:US11559036

    申请日:2006-11-13

    申请人: Yu-Pin Tsai

    发明人: Yu-Pin Tsai

    IPC分类号: H01L21/00

    摘要: A wafer-level method for manufacturing a chip package structure is disclosed. A wafer comprises a first surface and a second surface opposite thereto. The first surface has chip units disposed thereon to define scribe lines. An adhesive material is disposed between the first surface and the transparent glass for adhering the wafer to a transparent glass and leaving no gap between the first surface and the transparent glass. The wafer is vertically cut from the second surface corresponding to each scribe line of the first surface to the encapsulation adhesive material for forming scribe grooves, and then the second surface is coated with an encapsulation material for filling the scribe grooves. After removing the adhesive material and the transparent glass, the encapsulation material in each of the scribe grooves is vertically cut from the first surface, so as to form chip package structures.

    摘要翻译: 公开了用于制造芯片封装结构的晶片级方法。 晶片包括第一表面和与其相对的第二表面。 第一表面具有设置在其上的芯片单元以限定划线。 粘合材料设置在第一表面和透明玻璃之间,用于将晶片粘附到透明玻璃上,并且在第一表面和透明玻璃之间不留下间隙。 将晶片从对应于第一表面的每个划线的第二表面垂直切割到用于形成划线槽的封装粘合剂材料,然后第二表面涂覆有用于填充划线槽的封装材料。 在去除粘合剂材料和透明玻璃之后,每个划线槽中的封装材料从第一表面垂直切割,以形成芯片封装结构。

    CIS Package and Method Thereof
    4.
    发明申请
    CIS Package and Method Thereof 审中-公开
    CIS封装及其方法

    公开(公告)号:US20060256222A1

    公开(公告)日:2006-11-16

    申请号:US11164891

    申请日:2005-12-09

    申请人: Yu-Pin Tsai

    发明人: Yu-Pin Tsai

    IPC分类号: H04N5/335

    摘要: A method of fabricating a CMOS image sensor (CIS) package includes: providing a transparent substrate, in which the transparent substrate includes a cavity; disposing an image sensor chip in the cavity and forming a plurality of bumps between the image sensor chip and the transparent substrate, in which the image sensor chip includes a light sensitive area; forming a barrier wall between the transparent substrate and the image sensor chip, in which the barrier wall further forms a circular pattern around the light sensitive area of the image sensor chip; and forming an underfill layer between the transparent substrate and the image sensor chip for forming a package structure.

    摘要翻译: 制造CMOS图像传感器(CIS)封装的方法包括:提供透明基板,其中所述透明基板包括空腔; 将图像传感器芯片设置在空腔中,并在图像传感器芯片和透明基板之间形成多个凸起,其中图像传感器芯片包括光敏区域; 在透明基板和图像传感器芯片之间形成阻挡壁,其中阻挡壁进一步在图像传感器芯片的感光区域周围形成圆形图案; 以及在所述透明基板和用于形成封装结构的图像传感器芯片之间形成底层填充层。

    Wafer laser-making method and die fabricated using the same
    5.
    发明授权
    Wafer laser-making method and die fabricated using the same 有权
    晶圆激光制造方法和使用其制造的模具

    公开(公告)号:US08728915B2

    公开(公告)日:2014-05-20

    申请号:US13225756

    申请日:2011-09-06

    摘要: A wafer laser-marking method is provided. First, a wafer having a first surface (an active surface) and a second surface (a back surface) opposite to each other is provided. Next, the wafer is thinned. Then, the thinned wafer is fixed on a non-UV tape such that the second surface of the wafer is attached to the tape. Finally, the laser marking step is performed, such that a laser light penetrates the non-UV tape and marks a pattern on the second surface of the wafer. According to the laser-marking method of the embodiment, the pattern is formed by the non-UV residuals left on the second surface of the wafer, and the components of the glue residuals at least include elements of silicon and carbon.

    摘要翻译: 提供了晶片激光打标方法。 首先,提供具有彼此相对的第一表面(活性表面)和第二表面(背面)的晶片。 接下来,晶片变薄。 然后,将薄的晶片固定在非UV带上,使得晶片的第二表面附接到带上。 最后,执行激光标记步骤,使得激光穿透非UV带并且在晶片的第二表面上标记图案。 根据本实施例的激光标记方法,图案由残留在晶片的第二表面上的非UV残余物形成,并且胶合残余物的成分至少包括硅和碳的元素。

    FABRICATING METHOD OF WAFER PROTECTION LAYERS
    7.
    发明申请
    FABRICATING METHOD OF WAFER PROTECTION LAYERS 有权
    防护层制作方法

    公开(公告)号:US20060057778A1

    公开(公告)日:2006-03-16

    申请号:US11162606

    申请日:2005-09-16

    申请人: Yu-Pin Tsai

    发明人: Yu-Pin Tsai

    IPC分类号: H01L21/78

    摘要: A fabricating method of wafer protection layers and a wafer structure are provided. The fabricating method includes providing a wafer first. The wafer includes pluralities of chips and has an active surface, a corresponding reverse surface and a plurality of pre-cut trenches on the active surface. On the active surface, pluralities of bumps are disposed. Next, a first curing-type protection layer and a pellicle are disposed over the active surface. Afterwards, the first curing-type protection layer is asked to contact the active surface. Besides, a second curing-type protection layer is disposed on the reverse surface. Afterward, the first and the second curing-type protection layer are cured. Finally, the wafer is cut through the pre-cut trenches to separate the chips from the wafer.

    摘要翻译: 提供了晶片保护层和晶片结构的制造方法。 制造方法包括首先提供晶片。 晶片包括多个芯片,并且在活性表面上具有活性表面,相应的反面和多个预切割沟槽。 在活性表面上设置有多个凸块。 接下来,在活性表面上设置第一固化型保护层和防护薄膜。 之后,要求第一固化型保护层与活性表面接触。 此外,第二固化型保护层设置在反面上。 之后,固化第一固化型保护层和第二固化型保护层。 最后,通过预切割沟槽切割晶片以将芯片与晶片分离。

    WAFER LASER-MARKING METHOD AND DIE FABRICATED USING THE SAME
    8.
    发明申请
    WAFER LASER-MARKING METHOD AND DIE FABRICATED USING THE SAME 审中-公开
    使用相同方法制作的波长激光标记方法和DIE

    公开(公告)号:US20100001416A1

    公开(公告)日:2010-01-07

    申请号:US12482131

    申请日:2009-06-10

    IPC分类号: H01L23/544 H01L21/304

    摘要: A wafer laser-marking method is provided. First, a wafer having a first surface (an active surface) and a second surface (a back surface) opposite to each other is provided. Next, the wafer is thinned. Then, the thinned wafer is fixed on a tape such that the second surface of the wafer is attached to the tape. Finally, the laser marking step is performed, such that a laser light penetrates the tape and marks a pattern on the second surface of the wafer. There are glue residuals remained in the laser-marking pattern of the die manufactured according to the laser-marking method of the invention, and the components of the glue residuals at least include elements of silicon, carbon and oxygen.

    摘要翻译: 提供了晶片激光打标方法。 首先,提供具有彼此相对的第一表面(活性表面)和第二表面(背面)的晶片。 接下来,晶片变薄。 然后,将薄的晶片固定在带上,使得晶片的第二表面附接到带上。 最后,执行激光标记步骤,使得激光穿透带并在晶片的第二表面上标记图案。 根据本发明的激光标记方法制造的模具的激光标记图案中残留有胶合残留物,并且胶残留物的成分至少包括硅,碳和氧的元素。

    Fabricating method of wafer protection layers
    9.
    发明授权
    Fabricating method of wafer protection layers 有权
    晶圆保护层的制造方法

    公开(公告)号:US07510909B2

    公开(公告)日:2009-03-31

    申请号:US11162606

    申请日:2005-09-16

    申请人: Yu-Pin Tsai

    发明人: Yu-Pin Tsai

    IPC分类号: H01L21/44 H01L21/48 H01L21/50

    摘要: A fabricating method of wafer protection layers and a wafer structure are provided. The fabricating method includes providing a wafer first. The wafer includes pluralities of chips and has an active surface, a corresponding reverse surface and a plurality of pre-cut trenches on the active surface. On the active surface, pluralities of bumps are disposed. Next, a first curing-type protection layer and a pellicle are disposed over the active surface. Afterwards, the first curing-type protection layer is asked to contact the active surface. Besides, a second curing-type protection layer is disposed on the reverse surface. Afterward, the first and the second curing-type protection layer are cured. Finally, the wafer is cut through the pre-cut trenches to separate the chips from the wafer.

    摘要翻译: 提供了晶片保护层和晶片结构的制造方法。 该制造方法包括首先提供晶片。 晶片包括多个芯片,并且在活性表面上具有活性表面,相应的反面和多个预切割沟槽。 在活性表面上设置有多个凸块。 接下来,在活性表面上设置第一固化型保护层和防护薄膜。 之后,要求第一固化型保护层与活性表面接触。 此外,第二固化型保护层设置在反面上。 之后,固化第一固化型保护层和第二固化型保护层。 最后,通过预切割沟槽切割晶片以将芯片与晶片分离。