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1.发明申请公开(公告)号：US20110174975A1
公开(公告)日：2011-07-21
申请号：US13079361
申请日：2011-04-04
IPC分类号： H01J37/304
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/15 , H01J2237/2826 , H01J2237/3045
摘要： In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.
摘要翻译： 在扫描带电粒子束的方法中，其可以将扫描位置定位在带电粒子束的扫描位置的可偏转范围内的适当位置，带电粒子束的扫描位置偏转到扫描内的多个目标物体 位置可偏转区域，并且基于偏转之后的扫描位置处的目标物体的偏移，校正扫描位置处的偏转量。
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2.发明授权公开(公告)号：US08338781B2
公开(公告)日：2012-12-25
申请号：US13079361
申请日：2011-04-04
IPC分类号： H01J37/304
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/15 , H01J2237/2826 , H01J2237/3045
摘要： In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.
摘要翻译： 在扫描带电粒子束的方法中，其可以将扫描位置定位在带电粒子束的扫描位置的可偏转范围内的适当位置，带电粒子束的扫描位置偏转到扫描内的多个目标物体 位置可偏转区域，并且基于偏转之后的扫描位置处的目标物体的偏移，校正扫描位置处的偏转量。
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3.发明授权公开(公告)号：US07935925B2
公开(公告)日：2011-05-03
申请号：US11889057
申请日：2007-08-08
IPC分类号： H01J37/304
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/15 , H01J2237/2826 , H01J2237/3045
摘要： In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.
摘要翻译： 在扫描带电粒子束的方法中，其可以将扫描位置定位在带电粒子束的扫描位置的可偏转范围内的适当位置，带电粒子束的扫描位置偏转到扫描内的多个目标物体 位置可偏转区域，并且基于偏转之后的扫描位置处的目标物体的偏移，校正扫描位置处的偏转量。
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4.发明申请公开(公告)号：US20080073528A1
公开(公告)日：2008-03-27
申请号：US11889057
申请日：2007-08-08
IPC分类号： G21K5/04
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/15 , H01J2237/2826 , H01J2237/3045
摘要： In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.
摘要翻译： 在扫描带电粒子束的方法中，其可以将扫描位置定位在带电粒子束的扫描位置的可偏转范围内的适当位置，带电粒子束的扫描位置偏转到扫描内的多个目标物体 位置可偏转区域，并且基于偏转之后的扫描位置处的目标物体的偏移，校正扫描位置处的偏转量。
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公开(公告)号：US20100038535A1
公开(公告)日：2010-02-18
申请号：US12560091
申请日：2009-09-15
申请人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
发明人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
CPC分类号： H01J37/28 , G01B15/00 , G01N23/225 , H01J2237/2814
摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
摘要翻译： 本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。 在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。
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6.发明申请公开(公告)号：US20080201091A1
公开(公告)日：2008-08-21
申请号：US12076355
申请日：2008-03-17
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译： 本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。
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公开(公告)号：US20080116376A1
公开(公告)日：2008-05-22
申请号：US12005387
申请日：2007-12-27
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/28
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample, based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译： 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器， 基于所述带电粒子束聚焦的信号，所述信号是从带电粒子检测器输出的信号中的装置，用于构成样品的表面部分的二维图像的装置。
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8.发明申请公开(公告)号：US20080042074A1
公开(公告)日：2008-02-21
申请号：US11841411
申请日：2007-08-20
申请人： MITSUGU SATO , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
发明人： MITSUGU SATO , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
IPC分类号： H01J3/14
CPC分类号： H01J37/153 , H01J2237/1506 , H01J2237/1534 , H01J2237/28
摘要： A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such than an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
摘要翻译： 当束相对于样品倾斜时，带电粒子束装置的分辨率几乎不降低。 主光束4的轨迹被偏转器偏转或者被可动孔径改变，使得光束入射到多个透镜6和7的轴上。 提供了一种用于控制光束的离轴轨迹的装置，例如当光束倾斜时由物镜7产生的像差可以被另一透镜6产生的像差消除。
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公开(公告)号：US07329868B2
公开(公告)日：2008-02-12
申请号：US11515732
申请日：2006-09-06
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/21
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译： 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器， 发射的带电粒子束，以及用于基于所述带电粒子束聚焦的信号来组合样品的表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。
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公开(公告)号：US07315024B2
公开(公告)日：2008-01-01
申请号：US11344529
申请日：2006-02-01
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译： 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。
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