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    COOLING BLOCK AND PLASMA REACTOR HAVING SAME
    2.
    发明公开
    COOLING BLOCK AND PLASMA REACTOR HAVING SAME 审中-公开

    公开(公告)号：US20230260762A1

    公开(公告)日：2023-08-17

    申请号：US18010551

    申请日：2020-07-29

    Applicant: NEW POWER PLASMA CO., LTD.

    Inventor： Dai Kyu CHOI ,  Eun Seok LIM

    IPC: H01J37/32

    CPC classification number: H01J37/32522 ,  H01J37/32669

    Abstract: Provided are a cooling block that can be easily manufactured by forming vertical or horizontal flow paths in an integrated single block body through drilling, and a plasma reaction device having same, and may include: an integrated block body; a first vertical flow path formed in a vertical shape by passing through the inside of the block body from one surface of the block body; a first horizontal flow path passing through one portion of the first vertical flow path; a second horizontal flow path passing through the other portion of the first vertical flow path; a second vertical flow path passing through the first horizontal flow path and the second horizontal flow path; a first sealing stopper provided at a first point so that a refrigerant, having passed through the first vertical flow path, can branch in two ways and then merge into the second vertical flow path; and a second sealing stopper provided at a second point.

    Substrate transfer equipment and high speed substrate processing system using the same
    4.
    发明授权
    Substrate transfer equipment and high speed substrate processing system using the same 有权
    基板转移设备和高速基板处理系统使用相同

    公开(公告)号：US09054146B2

    公开(公告)日：2015-06-09

    申请号：US12298972

    申请日：2007-05-01

    Applicant: Soon-Im Wi

    Inventor： Soon-Im Wi

    IPC: H01L21/677 ,  H01L21/687 ,  H01L21/67

    CPC classification number: H01L21/67742 ,  H01L21/67196 ,  H01L21/67745 ,  H01L21/68707 ,  Y10S414/139 ,  Y10S414/141 ,  Y10S901/30

    Abstract: There are provided a substrate transferring apparatus for continuously loading/unloading a plurality of substrates in and from a process chamber to reduce time spent on transferring the substrates and to improve productivity and a substrate processing system using the same. The substrate transfer apparatus is installed in the transfer chamber and transfers substrates between first and second process chambers which is positioned lateral sides of the transfer chamber and a load rock chamber. The substrate transfer apparatus includes a driving unit to supply a rotational force, a spindle connected to the driving unit, first swivel plate arms to load/unload substrate to/from first process chamber, and second swivel plate arms to load/unload substrate to/from second process chamber. Since substrates before and after being processed are rapidly exchanged during the simultaneous or continuous process of plural substrates, processing rate increases and overall productivity can be increased.

    Abstract translation: 提供了一种用于在处理室中和从处理室中连续地加载/卸载多个基板的基板转移装置，以减少用于转移基板的时间并提高生产率以及使用该基板处理系统的基板处理系统。 衬底传送装置安装在传送室中，并且在位于传送室的侧面的第一和第二处理室和负载岩石室之间传送衬底。 基板输送装置包括：提供旋转力的驱动单元，与驱动单元连接的主轴;第一旋转板臂，用于对第一处理室进行加载/卸载;第二旋转板臂，将基板装载到/ 从第二处理室。 由于在多个基板的同时或连续的过程中快速更换处理前后的基板，因此加工速度提高，总体生产率提高。

    Inductively coupled plasma reactor with multiple magnetic cores
    5.
    发明授权
    Inductively coupled plasma reactor with multiple magnetic cores 有权

    公开(公告)号：US08597464B2

    公开(公告)日：2013-12-03

    申请号：US11737648

    申请日：2007-04-19

    Applicant: Dae-Kyu Choi

    Inventor： Dae-Kyu Choi

    IPC: C23C16/00 ,  H01L21/306

    CPC classification number: H01J37/32009 ,  H01J37/321 ,  H01J37/32357

    Abstract: There is provided an inductively coupled plasma reactor. The inductively coupled plasma reactor is connected to a transformer with multiple magnetic cores and a primary winding, to transfer an electromotive force for plasma discharge to a plasma discharge chamber of a reactor body. Parts of magnetic core positioned in side the plasma discharge chamber are protected by being entirely covered by a core protecting tube. The primary winding is electrically connected to a power supply source providing radio frequency power. In the inductively coupled plasma reactor, since a number of magnetic core cross sectional parts are positioned inside the plasma discharge chamber, the efficiency of transferring the inductively coupled energy to be connected with plasma is very high.

    TWO WAY GATE VALVE AND SUBSTRATE PROCESSING SYSTEM HAVING THE SAME
    6.
    发明申请
    TWO WAY GATE VALVE AND SUBSTRATE PROCESSING SYSTEM HAVING THE SAME 有权
    两台门阀和底板加工系统

    公开(公告)号：US20130153806A1

    公开(公告)日：2013-06-20

    申请号：US13716881

    申请日：2012-12-17

    Applicant: NEW POWER PLASMA CO., LTD.

    Inventor： Dae-Kyu CHOI

    IPC: F16K3/00

    CPC classification number: F16K3/00 ,  H01L21/67126

    Abstract: A two way gate valve includes a valve chamber having a first entrance coupled with a first chamber, a second entrance coupled with a second chamber, and an openable and closable chamber cover; a moving module having a first sealing plate for sealing the first entrance, a second sealing plate for sealing the second entrance, and a moving module body to which the first and the second sealing plates are mounted; a push-pull module having a push-pull module body coupled with the moving module body such that the moving module body can linearly move, a first operating body for moving the moving module in a first entrance direction such that the first sealing plate seals the first entrance, and a second operating body for moving the moving module in a second entrance direction such that the second sealing plate seals the second entrance.

    Abstract translation: 双向闸阀包括具有与第一室联接的第一入口的阀室，与第二室耦合的第二入口和可开启和关闭的室盖; 移动模块，具有用于密封第一入口的第一密封板，用于密封第二入口的第二密封板以及安装有第一和第二密封板的移动模块体; 推挽模块，其具有与所述移动模块主体联接的推挽模块主体，使得所述移动模块体可以线性移动;第一操作体，用于沿第一入口方向移动所述移动模块，使得所述第一密封板将所述第一密封板密封 第一入口和第二操作体，用于沿第二入口方向移动移动模块，使得第二密封板密封第二入口。

    Capacitively coupled plasma reactor
    10.
    发明授权
    Capacitively coupled plasma reactor 有权
    电容耦合等离子体反应器

    公开(公告)号：US08018163B2

    公开(公告)日：2011-09-13

    申请号：US12114879

    申请日：2008-05-05

    Applicant: Soon-Im Wi

    Inventor： Soon-Im Wi

    IPC: H01J7/24

    CPC classification number: H01J37/32174 ,  H01J37/32091 ,  H01J37/32532

    Abstract: A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.

    Abstract translation: 电容耦合等离子体反应器包括等离子体反应器，电容耦合电极组件，其包括多个电容耦合电极以在等离子体反应器内部引发等离子体放电，提供射频电力的主电源以及分配电路， 从主电源提供的射频功率，并将接收的射频功率分配给多个电容耦合电极。

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