Sputtering apparatus
    2.
    发明授权
    Sputtering apparatus 有权
    溅射装置

    公开(公告)号:US08900428B2

    公开(公告)日:2014-12-02

    申请号:US13344871

    申请日:2012-01-06

    Abstract: In one embodiment, a magnetron assembly comprises a plurality of magnets and a yoke configured to hold the plurality of magnets in at least four independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion. The outer portion substantially surrounds the perimeter of the inner portion. The magnets used to form the outer portion have a first polarity and the magnets used to form the inner portion having a second polarity. The outer portion of the pattern comprises a pair of elongated sections that are substantially parallel to one another. The outer portion of the pattern comprises a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections and wherein each turnaround section comprises a plurality of magnets having the first polarity. Other embodiments are described.

    Abstract translation: 在一个实施例中,磁控管组件包括多个磁体和配置成将多个磁体保持在至少四个独立的线性阵列中的磁轭。 多个磁铁布置在磁轭中,以形成包括外部部分和内部部分的图案。 外部部分基本上围绕内部的周边。 用于形成外部部分的磁体具有第一极性,并且用于形成具有第二极性的内部部分的磁体。 图案的外部部分包括基本上彼此平行的一对细长部分。 图案的外部部分包括一对转向部分,其中每个折回部分基本跨过该对细长部分的相应端部,并且其中每个周转部分包括具有第一极性的多个磁体。 描述其他实施例。

    SPUTTERING APPARATUS
    3.
    发明申请
    SPUTTERING APPARATUS 有权
    溅射装置

    公开(公告)号:US20140061029A1

    公开(公告)日:2014-03-06

    申请号:US14016693

    申请日:2013-09-03

    Abstract: One embodiment is directed to a magnetron assembly comprising a plurality of magnets, and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds the perimeter of the inner portion. The end portions of the linear array comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections of the outer portion. The magnets in each turnaround section are arranged to form at least two or more different curves in the magnetic field that are offset from each along the target rotation axis.

    Abstract translation: 一个实施例涉及包括多个磁体的磁控管组件,以及被配置为将多个磁体保持在至少四个直的,平行的独立线性阵列中的磁轭。 多个磁体布置在磁轭中以形成包括外部部分和内部部分的图案,其中外部部分基本上围绕内部部分的周边。 线性阵列的端部包括一对转向部分,其中每个转向部分基本上跨过外部部分的一对细长部分的相应端部。 每个转向部分中的磁体被布置成在磁场中形成至少两个或更多个沿着目标旋转轴线偏移的不同曲线。

    Sputtering apparatus
    4.
    再颁专利

    公开(公告)号:USRE46599E1

    公开(公告)日:2017-11-07

    申请号:US15365512

    申请日:2016-11-30

    Abstract: In one embodiment, a magnetron assembly comprises a plurality of magnets and a yoke configured to hold the plurality of magnets in at least four independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion. The outer portion substantially surrounds the perimeter of the inner portion. The magnets used to form the outer portion have a first polarity and the magnets used to form the inner portion having a second polarity. The outer portion of the pattern comprises a pair of elongated sections that are substantially parallel to one another. The outer portion of the pattern comprises a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections and wherein each turnaround section comprises a plurality of magnets having the first polarity. Other embodiments are described.

    Sputtering apparatus
    6.
    发明授权
    Sputtering apparatus 有权
    溅射装置

    公开(公告)号:US09312108B2

    公开(公告)日:2016-04-12

    申请号:US14263250

    申请日:2014-04-28

    Abstract: A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.

    Abstract translation: 用于旋转靶阴极的磁控管组件包括细长的支撑结构,可移动地定位在支撑结构下方的磁棒结构以及耦合到支撑结构的多个驱动模块。 驱动模块各自包括可操作地联接到磁棒结构的电动致动机构。 控制器和电池模块耦合到支撑结构并与驱动模块进行操作性通信。 控制器和电池模块包括电子控制器和至少一个可充电电池。 电池被配置成为每个电动致动机构和电子控制器通电。 一个或多个发电模块耦合到支撑结构并与电池电连通,使得从发电模块输出的电能为电池充电。

    Cylindrical magnetron target and spindle apparatus
    7.
    发明授权
    Cylindrical magnetron target and spindle apparatus 失效
    圆柱磁控管靶和主轴装置

    公开(公告)号:US06905579B2

    公开(公告)日:2005-06-14

    申请号:US10365232

    申请日:2003-02-13

    CPC classification number: H01J37/3423 H01J37/3405

    Abstract: A cylindrical magnetron target and spindle attachment apparatus for affixing a cylindrical magnetron target to a rotatable support spindle. The attachment apparatus includes a target and a spindle. The target defines a receiving portion. The spindle has a spindle plug. The spindle plug is disposed within the receiving portion of the target. The attachment apparatus increases the speed and ease of removing and installing cylindrical rotating targets onto a support spindle.

    Abstract translation: 一种用于将圆柱形磁控管靶固定到可旋转支撑心轴的圆柱形磁控管靶和心轴附接装置。 附件装置包括目标和主轴。 目标定义接收部分。 主轴具有主轴插头。 主轴插头设置在目标的接收部分内。 附接装置增加了将圆柱形旋转靶移除和安装到支撑心轴上的速度和容易性。

    Ion control for a plasma source
    9.
    发明授权
    Ion control for a plasma source 有权
    等离子体源的离子控制

    公开(公告)号:US09198274B2

    公开(公告)日:2015-11-24

    申请号:US13932632

    申请日:2013-07-01

    Abstract: One embodiment is directed to a plasma source comprising a cavity and at least first and second electrodes. The plasma source is configured to, during a first portion of each cycle, bias the first electrode as a cathode and use the second electrode as an anode, during a second portion of each cycle, apply an ion flush bias to the first and second electrodes, during a third portion of each cycle, bias the second electrode as a cathode and use the first electrode as an anode, and during a fourth portion of each cycle, apply an ion flush bias to the first and second electrodes. Other embodiments are disclosed.

    Abstract translation: 一个实施例涉及包括空腔和至少第一和第二电极的等离子体源。 等离子体源被配置为在每个周期的第一部分期间,将第一电极作为阴极偏置并且使用第二电极作为阳极,在每个周期的第二部分期间,向第一和第二电极施加离子冲洗偏压 在每个周期的第三部分期间,将第二电极偏置为阴极,并使用第一电极作为阳极,并且在每个周期的第四部分期间,对第一和第二电极施加离子冲洗偏压。 公开了其他实施例。

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