Reliable semiconductor packages
    3.
    发明授权

    公开(公告)号:US12100719B2

    公开(公告)日:2024-09-24

    申请号:US17352348

    申请日:2021-06-20

    CPC classification number: H01L27/14618 H01L27/14683

    Abstract: A semiconductor package and method for forming thereof are disclosed. The package includes a package substrate having a die region with a die attached thereto. An encapsulant is disposed to cover encapsulation region of the package substrate. A protective cover is disposed over the die and attached to the encapsulant by a cover adhesive. The protective cover is supported by a lower portion of step shaped inner encapsulant sidewalls.

    PLASMA DICED WAFERS AND METHODS THEREOF
    8.
    发明公开

    公开(公告)号:US20230154796A1

    公开(公告)日:2023-05-18

    申请号:US18056726

    申请日:2022-11-18

    CPC classification number: H01L21/78 H01L23/3171

    Abstract: Reliable plasma dicing of wafers to singulate it into individual dies is disclosed. Laser processing is employed to form mask openings in a passivation stack of a processed wafer. The patterned passivation stack serves as a plasma dicing mask for plasma dicing the wafer. The sidewalls of the mask openings may be flat or vertical sidewalls. In other cases, the sidewalls of the mask openings are slanted or chamfered sidewalls. The plasma dices the wafer using first and second plasma etch steps. The first plasma etch step etches to form scalloped sidewalls on the first portion of the die and the second plasma step etches to form flat or vertical sidewalls on a second portion of the die. The second portion of the die is the lower portion of the substrate or wafer. This prevents backside notching to improve reliability.

    System and Method of Cleaning and Inspecting Semiconductor Die Carrier

    公开(公告)号:US20230058682A1

    公开(公告)日:2023-02-23

    申请号:US17454514

    申请日:2021-11-11

    Abstract: A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

Patent Agency Ranking