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55 条记录 (耗时 0.019 秒)

    Gas-timing method for depositing oxynitride films by reactive R.F. magnetron sputtering
    1.
    发明授权
    Gas-timing method for depositing oxynitride films by reactive R.F. magnetron sputtering 有权

    公开(公告)号：US08372250B2

    公开(公告)日：2013-02-12

    申请号：US11878270

    申请日：2007-07-23

    申请人： Jiti Nukeaw ,  Supanit Porntheeraphat ,  Apichart Sungthong

    发明人： Jiti Nukeaw ,  Supanit Porntheeraphat ,  Apichart Sungthong

    IPC分类号： C23C14/54

    CPC分类号： C23C14/0676 ,  C23C14/0073

    摘要： A gas-timing control method for depositing metal oxynitride and transition metal oxynitride (Mx(ON)y) films on glass and flexible substrates using reactive radio frequency magnetron sputtering, without substrate heating. A system includes a sputtering chamber, substrates, targets, three mass flow controllers controlled respective flow rates of argon, nitrogen and oxygen gases alternately and intermittently into the sputtering chamber, and a radio frequency generator with 13.56 MHz which irradiated in the sputtering chamber to decompose sputtering gases. The flow rate ratio of oxygen+nitrogen/argon is at least 0.02, the flow rate ratio of oxygen/nitrogen is at least 0.01, and the sequence timing of argon, nitrogen and oxygen gases alternately or mixed into the sputtering chamber at least 1 sec.

    Method for preparing alumna coating film having alpha-type crystal structure as primary structure
    2.
    发明授权
    Method for preparing alumna coating film having alpha-type crystal structure as primary structure 有权
    制备具有α型晶体结构作为主要结构的铝箔涂层的方法

    公开(公告)号：US07967957B2

    公开(公告)日：2011-06-28

    申请号：US10523815

    申请日：2003-08-08

    申请人： Toshimitsu Kohara ,  Hiroshi Tamagaki ,  Yoshimitsu Ikari

    发明人： Toshimitsu Kohara ,  Hiroshi Tamagaki ,  Yoshimitsu Ikari

    IPC分类号： C23C14/08

    CPC分类号： C23C14/0073 ,  C23C14/0036 ,  C23C14/081 ,  C23C14/3492 ,  H01J37/32752

    摘要： For forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, a method of producing α crystal structure-based alumina films efficiently includes as an early film formation, forming films under conditions suited for formation of α crystal structure alumina. For example the forming forms films of αcrystal structure alumina in a poisoning mode discharge condition only in an early stage of film formation.

    摘要翻译： 为了通过在含氧化气体的气氛中溅射铝金属靶而在基板​​上形成氧化铝膜，制造α晶体结构的氧化铝膜的方法有效地包括作为早期成膜，在适合于形成α晶体的条件下形成膜 结构氧化铝。 例如，只有在成膜的早期阶段才能在中毒模式放电条件下形成α型结构氧化铝的膜。

    Method for preparing alumna coating film having alpha-type crystal structure as primary structure
    3.
    发明申请
    Method for preparing alumna coating film having alpha-type crystal structure as primary structure 有权
    制备具有α型晶体结构作为主要结构的铝箔涂层的方法

    公开(公告)号：US20060006059A1

    公开(公告)日：2006-01-12

    申请号：US10523815

    申请日：2003-08-08

    申请人： Toshimitsu Kohara ,  Hiroshi Tamagaki ,  Yoshimitsu Ikari

    发明人： Toshimitsu Kohara ,  Hiroshi Tamagaki ,  Yoshimitsu Ikari

    IPC分类号： C23C14/32

    CPC分类号： C23C14/0073 ,  C23C14/0036 ,  C23C14/081 ,  C23C14/3492 ,  H01J37/32752

    摘要： For forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, a method of producing α crystal structure-based alumina films efficiently includes as an early film formation, forming films under conditions suited for formation of α crystal structure alumina. For example the forming forms films of α crystal structure alumina in a poisoning mode discharge condition only in an early stage of film formation.

    摘要翻译： 为了通过在含氧化气体的气氛中溅射铝金属靶而在基板​​上形成氧化铝膜，生产α晶体结构的氧化铝膜的方法有效地包括作为早期成膜，在适合于形成α晶体的条件下形成膜 结构氧化铝。 例如，只有在成膜的早期阶段，才会在中毒模式放电条件下形成α晶体结构氧化铝的膜。

    Rapid rate reactive sputtering of metallic compounds
    6.
    发明授权
    Rapid rate reactive sputtering of metallic compounds 失效
    金属化合物的快速反应溅射

    公开(公告)号：US4428812A

    公开(公告)日：1984-01-31

    申请号：US481954

    申请日：1983-04-04

    申请人： William D. Sproul

    发明人： William D. Sproul

    IPC分类号： C23C14/06 ,  C23C14/00 ,  C23C14/34 ,  C23C14/35 ,  C23C15/00

    CPC分类号： C23C14/0073

    摘要： A method of reactive sputtering of the nitride, oxide or carbide of titanium or similar materials onto a substrate from a target of the pure metal in a chamber utilizing an inert gas, such as argon, wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.

    摘要翻译： 一种利用惰性气体（如氩气）在室内从纯金属靶上将钛或类似材料的氮化物，氧化物或碳化物反应溅射到衬底上的方法，其中金属化合物的沉积速率基本上接近 纯金属的沉积速率。 反应气体以恒定的流量和快速的脉冲被引入邻近靶的室中，其中阀被交替地打开和关闭非常短的时间间隔。

    METHOD OF CONTROLLING LITHIUM UNIFORMITY
    7.
    发明申请
    METHOD OF CONTROLLING LITHIUM UNIFORMITY 审中-公开
    控制锂均匀性的方法

    公开(公告)号：US20120255855A1

    公开(公告)日：2012-10-11

    申请号：US13430005

    申请日：2012-03-26

    申请人： Erik Bjornard

    发明人： Erik Bjornard

    IPC分类号： C23C14/34 ,  C23C14/06

    CPC分类号： C23C14/185 ,  C23C14/0036 ,  C23C14/0042 ,  C23C14/0073 ,  C23C14/0089 ,  C23C14/0694 ,  C23C14/08 ,  C23C14/082 ,  C23C14/3492 ,  C23C14/541 ,  H01J37/3405 ,  H01J37/3426

    摘要： A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or rate of deposition of a metal or lithium in a sputter process by introducing a quantity of reactive gas over a specified area in the sputter chamber. This method is applicable to planar and rotating targets.

    摘要翻译： 提供了一种在基板上提供均匀的锂涂层的方法和装置。 在本发明的一个方面是一种通过在溅射室中的特定区域上引入一定量的反应气体来选择性地控制金属或锂在溅射过程中沉积的均匀性和/或速率的方法。 该方法适用于平面和旋转目标。

    REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM
    8.
    发明申请
    REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM 审中-公开
    透明导电膜的反应性溅射沉积

    公开(公告)号：US20080153280A1

    公开(公告)日：2008-06-26

    申请号：US11614461

    申请日：2006-12-21

    申请人： Yanping Li ,  Yan Ye ,  Yong-Kee Chae ,  Tae Kyung Won ,  Ankur Kadam ,  Shuran Sheng ,  Liwei Li

    发明人： Yanping Li ,  Yan Ye ,  Yong-Kee Chae ,  Tae Kyung Won ,  Ankur Kadam ,  Shuran Sheng ,  Liwei Li

    IPC分类号： H01L21/44

    CPC分类号： C23C14/086 ,  C23C14/0073 ,  H01L31/022466 ,  H01L31/1884 ,  Y02E10/50

    摘要： Methods for sputter depositing a transparent conductive oxide (TCO) layer are provided in the present invention. The transparent conductive oxide layer may be utilized as a back reflector in a photovoltaic device. In one embodiment, the method includes providing a substrate in a processing chamber, forming a first portion of a transparent conductive oxide layer on the substrate by a first sputter deposition step, and forming a second portion of the transparent conductive oxide layer by a second sputter deposition step.

    摘要翻译： 在本发明中提供溅射沉积透明导电氧化物（TCO）层的方法。 透明导电氧化物层可以用作光伏器件中的后反射器。 在一个实施例中，该方法包括在处理室中提供衬底，通过第一溅射沉积步骤在衬底上形成透明导电氧化物层的第一部分，以及通过第二溅射形成透明导电氧化物层的第二部分 沉积步骤。

    Low pressure coated article with polymeric basecoat having the appearance of stainless steel
    9.
    发明授权
    Low pressure coated article with polymeric basecoat having the appearance of stainless steel 失效
    具有不锈钢外观的聚合物底漆的低压涂层制品

    公开(公告)号：US06764775B2

    公开(公告)日：2004-07-20

    申请号：US10026036

    申请日：2001-12-19

    申请人： Guocun Chen

    发明人： Guocun Chen

    IPC分类号： B32B1504

    CPC分类号： C23C14/0015 ,  B05D5/067 ,  B32B15/08 ,  C23C14/0021 ,  C23C14/0073 ,  C23C28/00 ,  Y10T428/12535 ,  Y10T428/12542 ,  Y10T428/12549 ,  Y10T428/12576 ,  Y10T428/12583 ,  Y10T428/1259 ,  Y10T428/12611 ,  Y10T428/12806 ,  Y10T428/12812 ,  Y10T428/12826 ,  Y10T428/12847 ,  Y10T428/12993 ,  Y10T428/31511 ,  Y10T428/31551

    摘要： An article is coated with a multi-layer decorative and protective coating having the appearance of stainless steel. The coating comprises a polymeric basecoat layer on the surface of said article and vapor deposited on the polymeric basecoat layer a stack layer containing layers of refractory metal or refractory metal alloy alternating with layers containing the reaction products of refractory metal or refractory metal alloy, nitrogen and oxygen. Over the stack layer is vapor deposited at relatively low pressures a protective color layer comprised of the reaction products of refractory metal or refractory metal alloy, oxygen and nitrogen wherein the total nitrogen and oxygen content of these reaction products is from about 4 to about 32 atomic percent, with the nitrogen content being at least about 3 atomic percent.

    摘要翻译： 一件物品涂有不锈钢外观的多层装饰和保护涂层。 该涂层包括在所述制品的表面上的聚合物底涂层，并且蒸镀沉积在聚合物基础涂层上的堆叠层，该堆叠层包含难熔金属层或难熔金属合金层，该层与含有难熔金属或难熔金属合金的反应产物，氮和 氧。 在堆叠层上蒸镀淀积由难熔金属或难熔金属合金，氧和氮组成的保护色层，其中这些反应产物的总氮和氧含量为约4至约32原子 百分比，氮含量为至少约3原子％。