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1356 条记录 (耗时 0.026 秒)

    Polyolefin resin composition and molded article using same
    1.
    发明授权
    Polyolefin resin composition and molded article using same 有权

    公开(公告)号：US12122898B2

    公开(公告)日：2024-10-22

    申请号：US16341316

    申请日：2017-10-04

    申请人： ADEKA CORPORATION

    发明人： Takashi Ayabe ,  Yuji Mitsuhashi ,  Akitomo Sato

    IPC分类号： C08K5/3435 ,  C08K5/13 ,  C08K5/134 ,  C08K5/3475

    CPC分类号： C08K5/3435 ,  C08K5/13 ,  C08K5/1345 ,  C08K5/3475

    摘要： Provided are: a polyolefin resin composition that is unlikely to be affected by an NOx gas; and a molded article using the same. The polyolefin resin composition includes, with respect to 100 parts by mass of a polyolefin resin (A): 0.001 to 5 parts by mass of a hindered amine compound (B) which has a nitrogen content of less than 4.0% by mass and a molecular weight of 500 or less; and 0.001 to 5 parts by mass of a phenolic antioxidant (C). The hindered amine compound (B) which has a nitrogen content of less than 4.0% by mass and a molecular weight of 500 or less preferably contains a compound represented by the following Formula (1), where R1 represents a hydrogen atom or a methyl group; and R2 represents a linear or branched alkyl group having 1 to 22 carbon atoms:

    Air-curable ethylene/alpha-olefin/diene interpolymer composition
    3.
    发明授权
    Air-curable ethylene/alpha-olefin/diene interpolymer composition 有权

    公开(公告)号：US11898026B2

    公开(公告)日：2024-02-13

    申请号：US16652123

    申请日：2017-11-08

    申请人： Dow Global Technologies LLC

    发明人： Bo Lyu ,  Yabin Sun ,  Tao Han ,  Jozef Van Dun ,  Colin LiPiShan

    IPC分类号： C08L23/16 ,  C08K5/14 ,  C08K5/3435

    CPC分类号： C08L23/16 ,  C08K5/14 ,  C08K5/3435 ,  C08L2312/02

    摘要： A composition comprises (A) an ethylene/alpha-olefin/diene interpolymer; (B) a peroxide comprising at least one peroxide bond; and (C) a bis-TEMPO compound having the Structure (I), wherein R1-4 are each independently H or a C1-C6 alkyl group; X is S, O, N, P, Se, a carbonyl group, a carboxyl group, an amide group, an azo group, an imino group, a carbamate group, a peroxy group, a phosphono group, a phosphate group, a sulfonyl group, a sulfinyl group, a sulfonate ester group, a sulfonate ester group, or combinations thereof; Y is a substitute or unsubstituted aliphatic alkyl group or aromatic alkyl group, a heterocyclic group, a siloxane group, an ethylene glycol group, an imide group, or combinations thereof; and n is greater than 1. The ratio of the molar amount of nitroxide groups of component (C) to the molar amount of the peroxide bonds of component (B) is from 0.100:1.000 to 2.000:1.000.

    Photoreactive composition, reaction product, and method of producing reaction product
    4.
    发明授权
    Photoreactive composition, reaction product, and method of producing reaction product 有权

    公开(公告)号：US11873380B2

    公开(公告)日：2024-01-16

    申请号：US17053431

    申请日：2019-05-07

    申请人： Tokyo University of Science Foundation

    发明人： Koji Arimitsu

    IPC分类号： C08K5/34 ,  C08K5/3435 ,  C07D295/192 ,  C07D307/88 ,  C08F20/32

    CPC分类号： C08K5/3435 ,  C07D295/192 ,  C07D307/88 ,  C08F20/32

    摘要： A photoreactive composition including a base-reactive compound, a photobase generator that is represented by the following Formula (1) and that generates a base when irradiated with light, and at least one compound selected from the group consisting of a polycyclic aromatic compound having a fused ring structure having two or more rings and a polycyclic aromatic compound having three or more aromatic rings and having a conjugated structure including any two or more of the three or more aromatic rings, in which the base-reactive compound is a compound having two or more groups that will have their polarity converted by the action of a base and that exhibit reactivity, in one molecule, or a compound having two or more groups that will react under the action of a base, in one molecule.