公开(公告)号：US20240351113A1

公开(公告)日：2024-10-24

申请号：US18574999

申请日：2022-06-30

申请人： WALTER AG

发明人： Thorsten MANNS ,  Wiebeke JANSSEN

IPC分类号： B23B27/14 ,  C23C16/02 ,  C23C16/36 ,  C23C16/40 ,  C23C16/56

CPC分类号： B23B27/14 ,  C23C16/0272 ,  C23C16/36 ,  C23C16/403 ,  C23C16/56

摘要： A coated cutting tool consisting of a substrate and a multi-layered wear resistant hard coating and a process for manufacturing the same is provided. The layers of the hard coating are deposited by chemical vapour deposition (CVD) and include a TiCN layer with a multi-sublayer structure of alternating C-type and N-type sublayers and an overall fiber texture characterized by a texture coefficient TC (4 2 2) in the range from 3.0 to 5.5, an oxygen containing Ti or Ti+Al compound bonding layer, and an α-Al2O3 layer on top of the bonding layer with an overall fiber texture characterized by a texture coefficient TC (0 0 12)>5.

公开(公告)号：US12121976B2

公开(公告)日：2024-10-22

申请号：US17609255

申请日：2020-05-23

申请人： KYOCERA Corporation

发明人： Kou Ri

IPC分类号： B23B27/14 ,  C23C16/30 ,  C23C16/36 ,  C23C16/40

CPC分类号： B23B27/148 ,  C23C16/303 ,  C23C16/36 ,  C23C16/403

摘要： A coated tool includes a base and a coating layer. The coating layer includes a first layer including TiCN, a second layer including Al2O3, and a third layer including at least one of TiN and TiCN. Cl content included in the first, second and third layers is first, second and third Cl content. Each of the first Cl content and the third Cl content is larger than the second Cl content. The first Cl content is more than 0.2 atomic % and not more than 2 atomic %. The third Cl content is more than 0.2 atomic % and not more than 2 atomic %. A cutting tool of the present disclosure includes a holder which has a length from a first end to a second end and includes a pocket on a side of the first end; and the coated tool located in the pocket.

公开(公告)号：US12110597B2

公开(公告)日：2024-10-08

申请号：US17279374

申请日：2019-09-20

申请人： CORNING INCORPORATED

发明人： Thomas William Brew ,  Dennis Michael Brown ,  Brian James Miller ,  Obiefuna Chukwuemeka Okafor

IPC分类号： C23C28/04 ,  B21C25/02 ,  C23C16/02 ,  C23C16/36

CPC分类号： C23C28/044 ,  B21C25/025 ,  C23C16/0272 ,  C23C16/36 ,  C23C28/042

摘要： Methods of applying an inorganic material to a metal substrate that includes a metallic material having an austenite transformation temperature. The method includes depositing inorganic particles onto a surface of the metal substrate. In some embodiments, methods may include depositing inorganic particles at a deposition temperature that does not cause the metallic material to exceed the austenite transformation temperature. The inorganic particles deposited onto the surface of the metal substrate may form an abrasion-resistant coating on the surface of the metal substrate. The difference between the coefficient of thermal expansion of the metallic material and the coefficient of thermal expansion of the abrasion-resistant coating may be 10×10−6/degrees C. or less.

公开(公告)号：US12103089B2

公开(公告)日：2024-10-01

申请号：US17914741

申请日：2021-03-24

申请人： KYOCERA CORPORATION

发明人： Yuusaku Sugawa ,  Hayato Kubo ,  Kenji Kumai ,  Hiroyuki Kinjo

IPC分类号： B23B27/14 ,  C23C14/06 ,  C23C16/36 ,  C23C16/40 ,  C23C28/04

CPC分类号： B23B27/148 ,  C23C14/0641 ,  C23C16/36 ,  C23C16/403 ,  C23C28/042 ,  C23C28/044 ,  B23B2224/04 ,  B23B2224/32 ,  B23B2228/10

摘要： A coated tool includes a base and a coating layer on the base. The coating layer includes a first layer including Al2O3 particles, and a second layer on the first layer. The second layer includes, sequentially from the base, a first film, a second film in contact with the first film, and a third film in contact with the second film. The first to third films individually include Ti. The first film, the second film and the third film individually include at least one kind selected from C and N. The coated tool satisfies a relationship of a first N content>a third N content>a second N content, in which the first N content is an N content in the first film, the second N content is an N content in the second film, and the third N content is an N content in the third film.

公开(公告)号：US12060641B2

公开(公告)日：2024-08-13

申请号：US17577656

申请日：2022-01-18

申请人： Tokyo Electron Limited

发明人： Hirokazu Ueda ,  Hideki Yuasa ,  Yutaka Fujino ,  Yoshiyuki Kondo ,  Hiroyuki Ikuta

IPC分类号： C23C16/455 ,  C23C16/34 ,  C23C16/36 ,  C23C16/511 ,  H01J37/32 ,  H01L21/02

CPC分类号： C23C16/45536 ,  C23C16/345 ,  C23C16/36 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32449 ,  H01L21/02274 ,  H01J2237/332 ,  H01L21/02167 ,  H01L21/0217

摘要： A film forming method includes: placing a substrate on which a pattern, which includes a plurality of convex and concave portions, is formed on a stage disposed inside a chamber; and selectively forming a silicon-containing film on the plurality of convex portions of the pattern by applying a bias power to the stage and introducing microwaves into the chamber while supplying a processing gas containing a silicon-containing gas and a nitrogen-containing gas into the chamber to generate plasma, wherein the selectively forming the silicon-containing film includes a first film formation of forming a silicon-containing film around upper sides of the plurality of convex portions and a second film formation of forming a silicon-containing film on upper portions of the plurality of convex portions.

公开(公告)号：US12049695B2

公开(公告)日：2024-07-30

申请号：US16134410

申请日：2018-09-18

申请人： Versum Materials US, LLC

发明人： Raymond Nicholas Vrtis ,  William Robert Entley ,  Robert Gordon Ridgeway ,  Xinjian Lei ,  John Francis Lehmann ,  Manchao Xiao

IPC分类号： H01L21/02 ,  C23C16/34 ,  C23C16/36 ,  C23C16/40 ,  C23C16/48 ,  C23C16/50

CPC分类号： C23C16/401 ,  C23C16/345 ,  C23C16/36 ,  C23C16/48 ,  C23C16/50 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02219 ,  H01L21/02222 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/02326 ,  H01L21/02337 ,  H01L21/0234 ,  H01L21/02348

摘要： Compositions for forming a silicon-containing film such as without limitation a silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped silicon oxide film on at least a surface of a substrate having a surface feature. In one aspect, the composition comprises at least one compound is selected from the group consisting of a siloxane, a trisilylamine-based compound, and a cyclic trisilazane compound.

公开(公告)号：US12048966B2

公开(公告)日：2024-07-30

申请号：US17433995

申请日：2020-02-25

申请人： KYOCERA CORPORATION

发明人： Kou Ri ,  Tadashi Katsuma ,  Takumi Hashimoto

IPC分类号： B23B27/16 ,  C23C16/30 ,  C23C16/34 ,  C23C16/36 ,  C23C16/40

CPC分类号： B23B27/1611 ,  C23C16/308 ,  C23C16/34 ,  C23C16/36 ,  C23C16/403

摘要： An insert of the present disclosure includes a base. The base includes a first surface, a second surface connecting to the first surface, and a cutting edge located on at least a part of a ridgeline of the first surface and the second surface. A region within 2.0 mm from the cutting edge in the first surface is a surface region A. A region within 0.5 mm from the surface region A is a region A1. A region within 1.2 mm from the surface region A and the second surface to 2.0 mm from the surface region A and the second surface is a region A2. An area ratio of vacancies in the region A1 is 0.005-0.04 area %, and an area ratio of vacancies in the region A2 is 0.05-0.2 area %. A cutting tool includes a holder including a pocket and the insert located in the pocket.

公开(公告)号：US20240242961A1

公开(公告)日：2024-07-18

申请号：US18619708

申请日：2024-03-28

申请人： Kokusai Electric Corporation

发明人： Yoshitomo HASHIMOTO ,  Tatsuru Matsuoka

IPC分类号： H01L21/02 ,  C23C16/36 ,  C23C16/52

CPC分类号： H01L21/0214 ,  C23C16/36 ,  C23C16/52

摘要： There is provided a technique that includes (a) forming a first film having a first thickness on an underlayer by supplying a first process gas not including oxidizing gas to a substrate, wherein the first film contains silicon, carbon, and nitrogen and does not contain oxygen, and the underlayer is exposed on a surface of the substrate and is at least one selected from the group of a conductive metal-element-containing film and a nitride film; and (b) forming a second film having a second thickness larger than the first thickness on the first film by supplying a second process gas including oxidizing gas to the substrate, wherein the second film contains silicon, oxygen, and nitrogen, and wherein in (b), oxygen atoms derived from the oxidizing gas and diffuse from a surface of the first film toward the underlayer are absorbed by the first film and the first film is modified.

公开(公告)号：US11992883B2

公开(公告)日：2024-05-28

申请号：US17273736

申请日：2019-09-03

申请人： KYOCERA CORPORATION

发明人： Tadashi Katsuma

IPC分类号： B23B27/14 ,  B22F5/00 ,  C23C16/36 ,  C23C16/40

CPC分类号： B23B27/148 ,  B22F5/00 ,  C23C16/36 ,  C23C16/403 ,  B22F2005/001 ,  B22F2302/10 ,  B23B2228/10

摘要： A coated tool may include a base member including a first surface, and a coating layer located on the first surface. On the first surface, scattered island portions may include 70 area % or more of a binder phase and have an equivalent circle diameter of 10 μm or more. The coating layer may include a first layer including a titanium compound and located on the first surface, and a second layer including aluminum oxide and located on and in contact with the first layer. The coating layer may include a plurality of voids. An average value of widths of the voids in the direction along the boundary may be less than an average value of distances between the voids adjacent to each other.

公开(公告)号：US20240139825A1

公开(公告)日：2024-05-02

申请号：US18279625

申请日：2022-03-04

申请人： Sumitomo Electric Industries, Ltd.

发明人： Satoshi ONO ,  Anongsack PASEUTH ,  Katsumi OKAMURA

IPC分类号： B23B27/14 ,  C23C16/30 ,  C23C16/34 ,  C23C16/36 ,  C23C16/40

CPC分类号： B23B27/148 ,  C23C16/308 ,  C23C16/34 ,  C23C16/36 ,  C23C16/403 ,  B23B2228/105

摘要： A cutting tool comprising a base material and a coating disposed on the base material, wherein the coating comprises a hard particle layer; the hard particle layer is formed from a plurality of hard particles including titanium, silicon, carbon, and nitrogen; in the hard particles, a concentration of the silicon periodically changes along a first direction set in the hard particles; and an orientation of the hard particle layer is a (311) orientation.