LASER ABLATION RESISTANT COPPER FOIL
    2.
    发明申请
    LASER ABLATION RESISTANT COPPER FOIL 审中-公开
    激光消除铜箔

    公开(公告)号:WO2005081657A2

    公开(公告)日:2005-09-09

    申请号:PCT/US2004/015703

    申请日:2004-05-19

    Abstract: A copper foil (96) for lamination to a dielectric substrate (92) is coated with a laser ablation inhibiting layer (100) having an average surface roughness (R Z ) of less than 1.0 micron and an average nodule height of less than 1.2 micron that is effective to provide a lamination peel strength to FR-4 of at least 80.4 grams per millimeter (4.5 pounds per inch). The coated foil (96) further has a reflectivity value of at least 40. The coated foil (96) is typically laminated to a dielectric substrate (92), such as glass reinforced epoxy or polyimide and imaged into a plurality of circuit traces. Blind vias (98) may be drilled through the dielectric (92) terminating at an interface between the foil (96) and the dielectric (92). The coated foil (96) of the invention resists laser ablation, thereby resisting piercing (102) of the foil (96) by the laser during drilling.

    Abstract translation: 用于层叠到电介质基板(92)的铜箔(96)涂覆有平均表面粗糙度(RZ)小于1.0微米且平均结节高度小于1.2微米的激光消融抑制层(100),其中 对FR-4的层压剥离强度至少为80.4克/毫米(4.5磅/英寸)是有效的。 涂覆的箔(96)还具有至少40的反射率值。涂覆的箔(96)通常层压到电介质基底(92),例如玻璃增强的环氧树脂或聚酰亚胺并成像为多个电路迹线。 盲孔(98)可以穿过终止于箔(96)和电介质(92)之间的界面处的电介质(92)。 本发明的涂覆箔(96)抵抗激光烧蚀,从而在钻孔期间通过激光器抵抗箔(96)的刺穿(102)。

    SUPPORT LAYER FOR THIN COPPER FOIL
    3.
    发明申请
    SUPPORT LAYER FOR THIN COPPER FOIL 审中-公开
    支撑层用于薄铜箔

    公开(公告)号:WO2005042807A1

    公开(公告)日:2005-05-12

    申请号:PCT/US2004/034192

    申请日:2004-10-15

    Abstract: A composite material (20) useful for the manufacture of a circuit has a support layer (12'), a metal foil (16) layer having opposing first and second sides and a thickness of 15 microns or less and a release layer (14) effective to facilitate separation of the metal foil layer (16) from the support layer (12'), the release layer (14) disposed between and contacting both the support layer (12') and the metal foil layer (16). A reactive element containing layer (22), which may be the support layer (12'), effective to react with gaseous elements or compounds to form thermally stable compounds contacts the release layer (14). The composite material (20) is preferably subjected to a low temperature heat treatment. The combination of the low temperature heat treatment and the reactive element containing layer (22) results in reduced defects including blisters in the copper foil (16) during subsequent processing.

    Abstract translation: 可用于制造电路的复合材料(20)具有支撑层(12'),具有相对的第一和第二侧面以及15微米或更小的厚度的金属箔(16)层和释放层(14) 有效促进金属箔层(16)与支撑层(12')分离,释放层(14)设置在支撑层(12')和金属箔层(16)之间并与之接触。 有效地与气态元素或化合物反应以形成热稳定化合物的可反应元件容纳层(22)可以是支撑层(12')与释放层(14)接触。 复合材料(20)优选进行低温热处理。 低温热处理和含活性元素层(22)的组合导致在随后的处理期间包括铜箔(16)中的起泡的缺陷减少。

    CHROMIUM-FREE ANTITARNISH ADHESION PROMOTING TREATMENT COMPOSITION
    4.
    发明申请
    CHROMIUM-FREE ANTITARNISH ADHESION PROMOTING TREATMENT COMPOSITION 审中-公开
    无铬抗坏血酸粘合促进治疗组合物

    公开(公告)号:WO2005021836A2

    公开(公告)日:2005-03-10

    申请号:PCT/US2004/028188

    申请日:2004-08-31

    IPC: C23F

    Abstract: The present invention is directed to an aqueous, antitarnish and adhesion promoting treatment composition, comprising: zinc ions; metal ions selected from the group consisting of tungsten ions, molybdenum ions, cobalt ions, nickel ions, zirconium ions, titanium ions, manganese ions, vanadium ions, iron ions, tin ions, indium ions, silver ions, and combinations thereof; and optionally, an electrolyte that does not contain potassium or sodium ions; wherein the treatment composition is substantially free of chromium, and wherein the treatment composition forms a coating on a substrate or material that enhances adhesion of a polymer to the material. The present invention is also directed to materials coated with the above treatment composition, and methods of coating materials using the above composition.

    Abstract translation: 本发明涉及一种水性,抗磨损和粘附促进处理组合物,其包含:锌离子; 选自钨离子,钼离子,钴离子,镍离子,锆离子,钛离子,锰离子,钒离子,铁离子,锡离子,铟离子,银离子及其组合的金属离子; 和任选的不含钾或钠离子的电解质; 其中所述处理组合物基本上不含铬,并且其中所述处理组合物在增强聚合物与所述材料的粘附性的基材或材料上形成涂层。 本发明还涉及用上述处理组合物涂覆的材料,以及使用上述组合物涂覆材料的方法。

    PEEL STRENGTH ENHANCEMENT OF COPPER LAMINATES 102426-201
    6.
    发明申请
    PEEL STRENGTH ENHANCEMENT OF COPPER LAMINATES 102426-201 审中-公开
    铜箔层压板的强度提高102426-201

    公开(公告)号:WO2004053193A1

    公开(公告)日:2004-06-24

    申请号:PCT/US2003/038592

    申请日:2003-12-05

    Abstract: In one aspect, a copper foil (14, 60) for lamination to a dielectric substrate (62) includes a layer (64) deposited on a surface of the copper foil (14, 60). The layer (64) is formed from chromium and zinc ions or oxides and is treated with an aqueous solution containing at least 0.5% silane. In another aspect, a peel strength enhancement coating (64) is disposed between a copper foil (14, 60) laminate and a dielectric substrate (62). The peel strength enhancement coating (64) comprises a metal and metal oxide mixture containing a metal selected from groups 5B, 6B, and 7B of the periodic table of the elements. The effective thickness of the peel strength enhancement coating (64) is that thickness capable of providing less than or equal to 10% loss of peel strength, when measured in accordance with IPC-TM-650 Method 2.4.8.5 using a 1/8 inch wide test specimen, after being immersed in 4N HCl at about 60°C for 6 hours.

    Abstract translation: 一方面,用于层压到电介质基板(62)的铜箔(14,60)包括沉积在铜箔(14,60)的表面上的层(64)。 层(64)由铬和锌离子或氧化物形成,并用含有至少0.5%硅烷的水溶液处理。 另一方面,剥离强度增强涂层(64)设置在铜箔(14,60)层压体和电介质衬底(62)之间。 剥离强度增强涂层(64)包括含有选自元素周期表的5B,6B和7B族的金属的金属和金属氧化物混合物。 剥离强度增强涂层(64)的有效厚度是当根据IPC-TM-650方法2.4.8.5使用1/8英寸测量时能够提供小于或等于10%的剥离强度损失的厚度 在大约60℃下浸入4N HCl中6小时后,

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